GB1293716A - The use of electron beams for examining surface structure - Google Patents

The use of electron beams for examining surface structure

Info

Publication number
GB1293716A
GB1293716A GB22775/71A GB2277571A GB1293716A GB 1293716 A GB1293716 A GB 1293716A GB 22775/71 A GB22775/71 A GB 22775/71A GB 2277571 A GB2277571 A GB 2277571A GB 1293716 A GB1293716 A GB 1293716A
Authority
GB
United Kingdom
Prior art keywords
specimen
volts
produced
secondary electrons
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB22775/71A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Siemens Corp
Original Assignee
Siemens AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG, Siemens Corp filed Critical Siemens AG
Publication of GB1293716A publication Critical patent/GB1293716A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24495—Signal processing, e.g. mixing of two or more signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
GB22775/71A 1970-03-10 1971-04-19 The use of electron beams for examining surface structure Expired GB1293716A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2011193A DE2011193C3 (de) 1970-03-10 1970-03-10 Vorrichtung für die Elektronen-Rastermikroskopie und die Elektronenstrahl-Mikroanalyse

Publications (1)

Publication Number Publication Date
GB1293716A true GB1293716A (en) 1972-10-25

Family

ID=5764619

Family Applications (1)

Application Number Title Priority Date Filing Date
GB22775/71A Expired GB1293716A (en) 1970-03-10 1971-04-19 The use of electron beams for examining surface structure

Country Status (5)

Country Link
US (1) US3714424A (enExample)
CH (1) CH520332A (enExample)
DE (1) DE2011193C3 (enExample)
FR (1) FR2084337A5 (enExample)
GB (1) GB1293716A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801879A (en) * 1985-06-17 1989-01-31 Texas Instruments Incorporated Electron beam testing of integrated circuits

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2903077C2 (de) * 1979-01-26 1986-07-17 Siemens AG, 1000 Berlin und 8000 München Verfahren zur berührungslosen Potentialmessung an einem elektronischen Bauelement und Anordnung zur Durchführung des Verfahrens
DE2921151C2 (de) * 1979-05-25 1982-12-02 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Vorrichtung zum Nachweis von in einem Abtast-Elektronenstrahlmikroskop von einer Probe ausgehenden Rückstreuelektronen
JPS5932145A (ja) * 1982-08-16 1984-02-21 Hitachi Ltd 電位検出装置
JPS607049A (ja) * 1983-06-24 1985-01-14 Hitachi Ltd 電位測定装置
DE3602366A1 (de) * 1986-01-27 1987-07-30 Siemens Ag Verfahren und anordnung zum nachweis der auf einer probe von einem primaeren korpuskularstrahl ausgeloesten sekundaerkorpuskeln
US5866904A (en) * 1990-10-12 1999-02-02 Hitachi, Ltd. Scanning electron microscope and method for dimension measuring by using the same
US5412210A (en) * 1990-10-12 1995-05-02 Hitachi, Ltd. Scanning electron microscope and method for production of semiconductor device by using the same
US5594245A (en) * 1990-10-12 1997-01-14 Hitachi, Ltd. Scanning electron microscope and method for dimension measuring by using the same
US5412211A (en) * 1993-07-30 1995-05-02 Electroscan Corporation Environmental scanning electron microscope
US6633034B1 (en) * 2000-05-04 2003-10-14 Applied Materials, Inc. Method and apparatus for imaging a specimen using low profile electron detector for charged particle beam imaging apparatus including electrostatic mirrors
WO2010148423A1 (en) * 2009-06-22 2010-12-29 The University Of Western Australia An imaging detector for a scanning charged particle microscope
US9190241B2 (en) * 2013-03-25 2015-11-17 Hermes-Microvision, Inc. Charged particle beam apparatus
US10236156B2 (en) 2015-03-25 2019-03-19 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US11933668B2 (en) * 2020-02-03 2024-03-19 Rohde & Schwarz Gmbh & Co. Kg Sampling assembly and testing instrument

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3535516A (en) * 1966-10-17 1970-10-20 Hitachi Ltd Electron microscope employing a modulated scanning beam and a phase sensitive detector to improve the signal to noise ratio

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801879A (en) * 1985-06-17 1989-01-31 Texas Instruments Incorporated Electron beam testing of integrated circuits

Also Published As

Publication number Publication date
US3714424A (en) 1973-01-30
DE2011193C3 (de) 1974-03-28
CH520332A (de) 1972-03-15
FR2084337A5 (enExample) 1971-12-17
DE2011193A1 (de) 1971-09-23
DE2011193B2 (de) 1973-08-23

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees