GB1291038A - A process for etching chromium - Google Patents
A process for etching chromiumInfo
- Publication number
- GB1291038A GB1291038A GB2890571A GB2890571A GB1291038A GB 1291038 A GB1291038 A GB 1291038A GB 2890571 A GB2890571 A GB 2890571A GB 2890571 A GB2890571 A GB 2890571A GB 1291038 A GB1291038 A GB 1291038A
- Authority
- GB
- United Kingdom
- Prior art keywords
- etching
- ferric
- sulphate
- ions
- chromium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011651 chromium Substances 0.000 title abstract 5
- 238000005530 etching Methods 0.000 title abstract 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title abstract 3
- 229910052804 chromium Inorganic materials 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 2
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 abstract 2
- 239000011521 glass Substances 0.000 abstract 2
- 229910021653 sulphate ion Inorganic materials 0.000 abstract 2
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 abstract 1
- 229910001447 ferric ion Inorganic materials 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Weting (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US6914270A | 1970-09-02 | 1970-09-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1291038A true GB1291038A (en) | 1972-09-27 |
Family
ID=22087015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2890571A Expired GB1291038A (en) | 1970-09-02 | 1971-06-21 | A process for etching chromium |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE2143522A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2101771A5 (enrdf_load_stackoverflow) |
| GB (1) | GB1291038A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3920081A1 (de) * | 1989-06-20 | 1991-01-03 | Foerster Inst Dr Friedrich | Suchspulenanordnung |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3583583D1 (de) * | 1984-11-17 | 1991-08-29 | Daikin Ind Ltd | Aetzzusammensetzung. |
-
1971
- 1971-06-21 GB GB2890571A patent/GB1291038A/en not_active Expired
- 1971-07-06 FR FR7126001A patent/FR2101771A5/fr not_active Expired
- 1971-08-31 DE DE19712143522 patent/DE2143522A1/de active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3920081A1 (de) * | 1989-06-20 | 1991-01-03 | Foerster Inst Dr Friedrich | Suchspulenanordnung |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2101771A5 (enrdf_load_stackoverflow) | 1972-03-31 |
| DE2143522A1 (de) | 1972-03-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1332702A (en) | Photomasks | |
| GB1241661A (en) | Method for the preparation of printing plates | |
| GB1249360A (en) | Lead assembly and method of making the same | |
| GB1430044A (en) | Etching palladium films | |
| FR2101771A5 (enrdf_load_stackoverflow) | ||
| GB1066366A (en) | Process for the production of printing plates | |
| GB1039475A (en) | Light-sensitive material for use in the production of printing plates | |
| GB1320560A (en) | Etchants for silica | |
| GB1043250A (en) | Improvements in and relating to methods of producing visible images copy media | |
| GB928079A (en) | Method of fabricating small elements of thin magnetic film | |
| JPS522121A (en) | Information input system | |
| GB1330755A (en) | Photographci development of silver salts | |
| JPS5258374A (en) | Improvement in sensitivity of positive type photo resist | |
| JPS5351971A (en) | Manufacture for semiconductor | |
| JPS52173A (en) | X-ray etching mask | |
| JPS5264877A (en) | Production of semiconductor device | |
| JPS5619045A (en) | Electron beam sensitive inorganic resist | |
| JPS53105982A (en) | Micropattern formation method | |
| JPS52105777A (en) | Microscopic diagram transcribing device | |
| JPS57176040A (en) | Preparation of photomask | |
| JPS5267270A (en) | Photo etching method | |
| JPS5346281A (en) | Mask for semiconductor device and production of semiconductor device using the same | |
| JPS5212137A (en) | Process for preparation of alpha-diketons | |
| JPS51128267A (en) | Pattern forming system for metal oxide film | |
| JPS5354974A (en) | Electron beam exposure system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |