GB1243178A - Improvements relating to "hall effect" devices - Google Patents
Improvements relating to "hall effect" devicesInfo
- Publication number
- GB1243178A GB1243178A GB6023/68A GB602368A GB1243178A GB 1243178 A GB1243178 A GB 1243178A GB 6023/68 A GB6023/68 A GB 6023/68A GB 602368 A GB602368 A GB 602368A GB 1243178 A GB1243178 A GB 1243178A
- Authority
- GB
- United Kingdom
- Prior art keywords
- drains
- semi
- conductor
- hall effect
- devices
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005355 Hall effect Effects 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 4
- 229910052751 metal Inorganic materials 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 230000001419 dependent effect Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 229910052814 silicon oxide Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/07—Hall effect devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Ceramic Engineering (AREA)
- Computer Hardware Design (AREA)
- Hall/Mr Elements (AREA)
Abstract
1,243,178. Semi-conductor devices. PLESSEY CO. Ltd. 23 Dec., 1968 [22 Sept., 1967; 7 Feb., 1968], Nos. 43259/67 and 6023/68. Heading H1K. A Hall effect device comprises a MOSFET having a source 2, a metal gate 6 insulated from the semi-conductor body 1 by an insulating layer 5, and two or more drains 3, 4 the device being arranged so that an appropriate voltage applied to the gate electrode establishes an inversion channel below the oxide layer 5 between the source and the drains, wherein the current flow in that inversion channel, being dependent upon any magnetic field acting on the semi-conductor body, produces a voltage differential between the drains proportional to such a magnetic field due to the deflection of the current by the field preferentially towards one of the drains. The device is used to measure magnetic fields. The semi-conductor material is silicon, the insulating layer is of silicon oxide and the metal gate is of aluminium.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB4325967 | 1967-09-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1243178A true GB1243178A (en) | 1971-08-18 |
Family
ID=10427974
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB6023/68A Expired GB1243178A (en) | 1967-09-22 | 1967-09-22 | Improvements relating to "hall effect" devices |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1243178A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4048648A (en) * | 1976-06-30 | 1977-09-13 | International Business Machines Corporation | High carrier velocity fet magnetic sensor |
US7440227B2 (en) | 2005-02-28 | 2008-10-21 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic head having a hall effect sensor and circuit for detecting recorded bits from magnetic recording media |
CN107367679A (en) * | 2017-06-19 | 2017-11-21 | 武汉嘉仪通科技有限公司 | Hall effect test system |
CN111416035A (en) * | 2020-03-26 | 2020-07-14 | 中国科学院微电子研究所 | Nonvolatile Hall sensor and manufacturing method and testing method thereof |
-
1967
- 1967-09-22 GB GB6023/68A patent/GB1243178A/en not_active Expired
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4048648A (en) * | 1976-06-30 | 1977-09-13 | International Business Machines Corporation | High carrier velocity fet magnetic sensor |
US7440227B2 (en) | 2005-02-28 | 2008-10-21 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic head having a hall effect sensor and circuit for detecting recorded bits from magnetic recording media |
CN107367679A (en) * | 2017-06-19 | 2017-11-21 | 武汉嘉仪通科技有限公司 | Hall effect test system |
CN111416035A (en) * | 2020-03-26 | 2020-07-14 | 中国科学院微电子研究所 | Nonvolatile Hall sensor and manufacturing method and testing method thereof |
CN111416035B (en) * | 2020-03-26 | 2023-02-07 | 中国科学院微电子研究所 | Nonvolatile Hall sensor and manufacturing method and testing method thereof |
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