GB1242474A - Improvements in or relating to field effect transistors - Google Patents
Improvements in or relating to field effect transistorsInfo
- Publication number
- GB1242474A GB1242474A GB4016769A GB4016769A GB1242474A GB 1242474 A GB1242474 A GB 1242474A GB 4016769 A GB4016769 A GB 4016769A GB 4016769 A GB4016769 A GB 4016769A GB 1242474 A GB1242474 A GB 1242474A
- Authority
- GB
- United Kingdom
- Prior art keywords
- sub
- layer
- igfet
- aug
- semi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005669 field effect Effects 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 239000000463 material Substances 0.000 abstract 4
- 239000004065 semiconductor Substances 0.000 abstract 3
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 239000002800 charge carrier Substances 0.000 abstract 1
- 229910052698 phosphorus Inorganic materials 0.000 abstract 1
- 239000011574 phosphorus Substances 0.000 abstract 1
- 238000000197 pyrolysis Methods 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 239000010936 titanium Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
Abstract
1,242,474. Semi-conductor devices. SIEMENS A.G. 12 Aug., 1969 [13 Aug., 1968], No. 40167/69. Heading H1K. In an IGFET the insulating layer under the control electrode 6 comprises a plurality of sub-layers, that sub-layer 711 nearest the control electrode consisting of silicon nitride and that sub-layer nearest the surface of the semiconductor material 1 consisting of silicon dioxide, the silicon dioxide sub-layer being free from doping materials in a zone 7 adjacent the surface of the semi-conductor material but being doped in a zone 7<SP>1</SP> adjacent the silicon nitride sub-layer with a material such as phosphorus, titanium, or boron which inhibits the mobility of free charge carriers in the layers. The sublayers are preferably produced by pyrolysis. An IGFET with two separate gate electrodes insulated in this way is also described.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19681764824 DE1764824A1 (en) | 1968-08-13 | 1968-08-13 | Field effect transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1242474A true GB1242474A (en) | 1971-08-11 |
Family
ID=5698149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4016769A Expired GB1242474A (en) | 1968-08-13 | 1969-08-12 | Improvements in or relating to field effect transistors |
Country Status (7)
Country | Link |
---|---|
AT (1) | AT305374B (en) |
CH (1) | CH495632A (en) |
DE (1) | DE1764824A1 (en) |
FR (1) | FR2015567B1 (en) |
GB (1) | GB1242474A (en) |
NL (1) | NL6911991A (en) |
SE (1) | SE345764B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5028566A (en) * | 1987-04-10 | 1991-07-02 | Air Products And Chemicals, Inc. | Method of forming silicon dioxide glass films |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT7826422A0 (en) * | 1977-09-22 | 1978-08-02 | Rca Corp | PLANAR SILICON ON SAPPHIRE (SOS) INTEGRATED CIRCUIT AND METHOD FOR THE MANUFACTURE THEREOF. |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1449089A (en) * | 1964-07-09 | 1966-08-12 | Rca Corp | Semiconductor devices |
FR1530106A (en) * | 1966-08-12 | 1968-06-21 | Ibm | Advanced semiconductor devices and suitable manufacturing processes |
GB1208030A (en) * | 1967-06-28 | 1970-10-07 | Hitachi Ltd | A semiconductor device |
-
1968
- 1968-08-13 DE DE19681764824 patent/DE1764824A1/en active Pending
-
1969
- 1969-08-05 FR FR6926843A patent/FR2015567B1/fr not_active Expired
- 1969-08-06 NL NL6911991A patent/NL6911991A/xx unknown
- 1969-08-11 AT AT774069A patent/AT305374B/en active
- 1969-08-11 CH CH1211269A patent/CH495632A/en not_active IP Right Cessation
- 1969-08-12 GB GB4016769A patent/GB1242474A/en not_active Expired
- 1969-08-13 SE SE1127669A patent/SE345764B/xx unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5028566A (en) * | 1987-04-10 | 1991-07-02 | Air Products And Chemicals, Inc. | Method of forming silicon dioxide glass films |
Also Published As
Publication number | Publication date |
---|---|
AT305374B (en) | 1973-02-26 |
DE1764824A1 (en) | 1971-11-04 |
SE345764B (en) | 1972-06-05 |
CH495632A (en) | 1970-08-31 |
NL6911991A (en) | 1970-02-17 |
FR2015567A1 (en) | 1970-04-30 |
FR2015567B1 (en) | 1974-10-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1435589A (en) | Field effect transistors | |
ES2004607A6 (en) | Process for manufacturing semiconductor devices. | |
GB1465244A (en) | Deep depletion insulated gate field effect transistors | |
GB1170682A (en) | Improvements in Planar Semiconductor Devices | |
GB1396198A (en) | Transistors | |
GB1153428A (en) | Improvements in Semiconductor Devices. | |
JPS56125868A (en) | Thin-film semiconductor device | |
GB1095412A (en) | ||
GB1094068A (en) | Semiconductive devices and methods of producing them | |
GB1139749A (en) | Improvements in or relating to semiconductor devices | |
GB1388772A (en) | Semiconductor devices and a method of producing the same | |
GB1012124A (en) | Improvements in or relating to semiconductor devices | |
GB1242896A (en) | Semiconductor device and method of fabrication | |
GB1234119A (en) | ||
GB1447675A (en) | Semiconductor devices | |
GB1400541A (en) | Field effect transistors | |
GB1148417A (en) | Integrated circuit structures including controlled rectifiers or their structural equivalents and method of making the same | |
JPS6468966A (en) | Field-effect transistor and manufacture thereof | |
GB1309346A (en) | Transistor | |
GB1242474A (en) | Improvements in or relating to field effect transistors | |
JPS55151363A (en) | Mos semiconductor device and fabricating method of the same | |
GB1380466A (en) | Gate protective device for insulated gate fieldeffect transistors | |
GB1200757A (en) | Uhf amplifier | |
GB1376900A (en) | Semiconductor devices | |
GB1422287A (en) | Insulated gate transistor |