GB1205320A - Improvements in or relating to the production of semiconductor devices - Google Patents
Improvements in or relating to the production of semiconductor devicesInfo
- Publication number
- GB1205320A GB1205320A GB50752/68A GB5075268A GB1205320A GB 1205320 A GB1205320 A GB 1205320A GB 50752/68 A GB50752/68 A GB 50752/68A GB 5075268 A GB5075268 A GB 5075268A GB 1205320 A GB1205320 A GB 1205320A
- Authority
- GB
- United Kingdom
- Prior art keywords
- nitride
- mesa
- silicon
- semi
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 abstract 4
- 150000004767 nitrides Chemical class 0.000 abstract 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 3
- 229910052710 silicon Inorganic materials 0.000 abstract 3
- 239000010703 silicon Substances 0.000 abstract 3
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 2
- 239000013078 crystal Substances 0.000 abstract 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 abstract 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes)
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes) consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
- H01L21/76221—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO with a plurality of successive local oxidation steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6900167 | 1967-10-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1205320A true GB1205320A (en) | 1970-09-16 |
Family
ID=13389909
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB50752/68A Expired GB1205320A (en) | 1967-10-28 | 1968-10-25 | Improvements in or relating to the production of semiconductor devices |
Country Status (4)
Country | Link |
---|---|
DE (1) | DE1805707B2 (enrdf_load_stackoverflow) |
FR (1) | FR1594694A (enrdf_load_stackoverflow) |
GB (1) | GB1205320A (enrdf_load_stackoverflow) |
NL (1) | NL6815286A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2449332A1 (fr) * | 1979-02-13 | 1980-09-12 | Itt | Methode de protection de zones de contact sur des dispositifs a semi-conducteurs |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL159817B (nl) * | 1966-10-05 | 1979-03-15 | Philips Nv | Werkwijze ter vervaardiging van een halfgeleiderinrichting. |
GB1332931A (en) * | 1970-01-15 | 1973-10-10 | Mullard Ltd | Methods of manufacturing a semiconductor device |
US4002511A (en) * | 1975-04-16 | 1977-01-11 | Ibm Corporation | Method for forming masks comprising silicon nitride and novel mask structures produced thereby |
IT1080473B (it) * | 1977-07-25 | 1985-05-16 | Ducati Elettrotecnica Spa | Condensatore elettrico autorigene rante con dielettrico misto |
JPS5955052A (ja) * | 1982-09-24 | 1984-03-29 | Hitachi Ltd | 半導体集積回路装置の製造方法 |
DE3312076A1 (de) * | 1983-04-02 | 1984-10-04 | O.D.A.M. - Office de Distribution d'Appareils Médicaux, Wissembourg | Kondensator hoher energiedichte und verfahren zu seiner herstellung |
-
1968
- 1968-10-25 GB GB50752/68A patent/GB1205320A/en not_active Expired
- 1968-10-25 NL NL6815286A patent/NL6815286A/xx unknown
- 1968-10-28 FR FR1594694D patent/FR1594694A/fr not_active Expired
- 1968-10-28 DE DE19681805707 patent/DE1805707B2/de active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2449332A1 (fr) * | 1979-02-13 | 1980-09-12 | Itt | Methode de protection de zones de contact sur des dispositifs a semi-conducteurs |
Also Published As
Publication number | Publication date |
---|---|
DE1805707B2 (de) | 1972-03-16 |
DE1805707A1 (de) | 1969-08-21 |
NL6815286A (enrdf_load_stackoverflow) | 1969-05-01 |
FR1594694A (enrdf_load_stackoverflow) | 1970-07-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3649386A (en) | Method of fabricating semiconductor devices | |
US3197681A (en) | Semiconductor devices with heavily doped region to prevent surface inversion | |
US3761327A (en) | Planar silicon gate mos process | |
GB1381602A (en) | Integrated circuit structure and method for making integrated circuit structure | |
GB1144328A (en) | Solid-state circuit consisting of a semiconductor body with active components, passive components, and conducting paths | |
GB1435590A (en) | Process for the fabrication of a semiconductor structure | |
GB1382082A (en) | Methods of manufacturing semiconductor devices | |
GB1060303A (en) | Semiconductor element and device and method of fabricating the same | |
GB1161343A (en) | Method of Making Shaped Epitaxial Deposits | |
GB1437112A (en) | Semiconductor device manufacture | |
GB1444386A (en) | Integrated circuit fabrication processes | |
GB1388486A (en) | Semiconductor device manufacture | |
GB1338358A (en) | Semiconductor devices | |
GB1517242A (en) | Integrated circuits | |
GB1339095A (en) | Fabrication of monolithic integrated circuits | |
GB1428713A (en) | Method of manufactruing a semiconductor device | |
GB1449559A (en) | Production of a semiconductor device | |
US3427212A (en) | Method for making field effect transistor | |
GB1440643A (en) | Method of producint a mis structure | |
GB1520718A (en) | Field effect trasistors | |
GB1205320A (en) | Improvements in or relating to the production of semiconductor devices | |
GB1364676A (en) | Semiconductor integrated device | |
GB1271815A (en) | Improvements in or relating to methods of making semiconductor devices | |
US3600642A (en) | Mos structure with precisely controlled channel length and method | |
GB1073135A (en) | Semiconductor current limiter |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
PE20 | Patent expired after termination of 20 years |