GB1197271A - Process for the Purification of Finely Divided Oxides - Google Patents
Process for the Purification of Finely Divided OxidesInfo
- Publication number
- GB1197271A GB1197271A GB2766/68A GB276668A GB1197271A GB 1197271 A GB1197271 A GB 1197271A GB 2766/68 A GB2766/68 A GB 2766/68A GB 276668 A GB276668 A GB 276668A GB 1197271 A GB1197271 A GB 1197271A
- Authority
- GB
- United Kingdom
- Prior art keywords
- oxide
- oxides
- steam
- purification
- finely divided
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000746 purification Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 239000000203 mixture Substances 0.000 abstract 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 abstract 2
- 229910004298 SiO 2 Inorganic materials 0.000 abstract 2
- 239000007789 gas Substances 0.000 abstract 2
- 229910010413 TiO 2 Inorganic materials 0.000 abstract 1
- 230000001174 ascending effect Effects 0.000 abstract 1
- 150000001805 chlorine compounds Chemical class 0.000 abstract 1
- 239000006185 dispersion Substances 0.000 abstract 1
- 238000005485 electric heating Methods 0.000 abstract 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 239000010931 gold Substances 0.000 abstract 1
- 230000005484 gravity Effects 0.000 abstract 1
- 230000007062 hydrolysis Effects 0.000 abstract 1
- 238000006460 hydrolysis reaction Methods 0.000 abstract 1
- 239000011261 inert gas Substances 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/006—Combinations of treatments provided for in groups C09C3/04 - C09C3/12
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/145—After-treatment of oxides or hydroxides, e.g. pulverising, drying, decreasing the acidity
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
- C01G23/075—Evacuation and cooling of the gaseous suspension containing the oxide; Desacidification and elimination of gases occluded in the separated oxide
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/04—Physical treatment, e.g. grinding, treatment with ultrasonic vibrations
- C09C3/043—Drying, calcination
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/06—Treatment with inorganic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/08—Treatment with low-molecular-weight non-polymer organic compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/90—Other properties not specified above
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/10—Process efficiency
- Y02P20/129—Energy recovery, e.g. by cogeneration, H2recovery or pressure recovery turbines
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Silicon Compounds (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DED0052080 | 1967-01-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1197271A true GB1197271A (en) | 1970-07-01 |
Family
ID=7053890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2766/68A Expired GB1197271A (en) | 1967-01-21 | 1968-01-18 | Process for the Purification of Finely Divided Oxides |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS4813832B1 (enrdf_load_stackoverflow) |
| BE (1) | BE709670A (enrdf_load_stackoverflow) |
| DE (1) | DE1642994A1 (enrdf_load_stackoverflow) |
| FR (1) | FR1554066A (enrdf_load_stackoverflow) |
| GB (1) | GB1197271A (enrdf_load_stackoverflow) |
| NL (1) | NL6800730A (enrdf_load_stackoverflow) |
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0123669A3 (de) * | 1983-03-24 | 1987-12-02 | VOEST-ALPINE Aktiengesellschaft | Verfahren zum Abtrennen von Boraten von aus Meerwasser erhaltenem Magnesiumhydroxid sowie Vorrichtung zur Durchführung dieses Verfahrens |
| EP0129015A3 (de) * | 1983-06-10 | 1988-09-07 | Degussa Aktiengesellschaft | Pyrogen hergestelltes Siliciumdioxid, Verfahren zu seiner Herstellung und Verwendung |
| EP0709340A1 (en) * | 1994-10-27 | 1996-05-01 | Shin-Etsu Chemical Co., Ltd. | Method for purifying fine particulate silica |
| US5707599A (en) * | 1996-02-13 | 1998-01-13 | Santiam Electroactive Materials | Process for purifying tantalum oxide and other metal oxides |
| US5855860A (en) * | 1994-10-27 | 1999-01-05 | Shin-Etsu Chemical Co., Ltd. | Method for porifying fine particulate silica |
| WO2005019107A1 (en) * | 2003-08-20 | 2005-03-03 | Degussa Ag | Purification of finely divided, pyrogenically prepared metal oxide particles |
| CN100447083C (zh) * | 2003-08-20 | 2008-12-31 | 德古萨股份公司 | 细碎的热解制备的金属氧化物颗粒的净化 |
| WO2017103170A1 (de) * | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Wasserdampfbehandlung von siliziumdioxidpulver bei der herstellung von quarzglas |
| US10618833B2 (en) | 2015-12-18 | 2020-04-14 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a synthetic quartz glass grain |
| US10676388B2 (en) | 2015-12-18 | 2020-06-09 | Heraeus Quarzglas Gmbh & Co. Kg | Glass fibers and pre-forms made of homogeneous quartz glass |
| US10730780B2 (en) | 2015-12-18 | 2020-08-04 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
| WO2021121557A1 (de) | 2019-12-17 | 2021-06-24 | Wacker Chemie Ag | Wirbelschichtreaktor zur steuerung der verweilzeitverteilung in kontinuierlich betriebenen wirbelschichten |
| US11053152B2 (en) | 2015-12-18 | 2021-07-06 | Heraeus Quarzglas Gmbh & Co. Kg | Spray granulation of silicon dioxide in the preparation of quartz glass |
| US11236002B2 (en) | 2015-12-18 | 2022-02-01 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of an opaque quartz glass body |
| US11299417B2 (en) | 2015-12-18 | 2022-04-12 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a melting crucible of refractory metal |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| US11492285B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies from silicon dioxide granulate |
| US11492282B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies with dew point monitoring in the melting oven |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL111763A (en) | 1993-11-25 | 1998-08-16 | Sumitomo Chemical Co | Method for alpha-alumina powder production |
| WO2009017212A1 (ja) * | 2007-07-27 | 2009-02-05 | Toho Titanium Co., Ltd. | 低ハロゲン酸化チタン粉末の製造方法及び低ハロゲン酸化チタン粉末 |
| CN109205629B (zh) * | 2018-11-21 | 2023-11-14 | 浙江富士特硅材料有限公司 | 一种环流式气相法白炭黑脱酸系统 |
-
1967
- 1967-01-21 DE DE19671642994 patent/DE1642994A1/de active Pending
-
1968
- 1968-01-17 NL NL6800730A patent/NL6800730A/xx unknown
- 1968-01-18 FR FR1554066D patent/FR1554066A/fr not_active Expired
- 1968-01-18 GB GB2766/68A patent/GB1197271A/en not_active Expired
- 1968-01-19 BE BE709670D patent/BE709670A/xx not_active IP Right Cessation
- 1968-01-22 JP JP43003674A patent/JPS4813832B1/ja active Pending
Cited By (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0123669A3 (de) * | 1983-03-24 | 1987-12-02 | VOEST-ALPINE Aktiengesellschaft | Verfahren zum Abtrennen von Boraten von aus Meerwasser erhaltenem Magnesiumhydroxid sowie Vorrichtung zur Durchführung dieses Verfahrens |
| EP0129015A3 (de) * | 1983-06-10 | 1988-09-07 | Degussa Aktiengesellschaft | Pyrogen hergestelltes Siliciumdioxid, Verfahren zu seiner Herstellung und Verwendung |
| EP0709340A1 (en) * | 1994-10-27 | 1996-05-01 | Shin-Etsu Chemical Co., Ltd. | Method for purifying fine particulate silica |
| US5855860A (en) * | 1994-10-27 | 1999-01-05 | Shin-Etsu Chemical Co., Ltd. | Method for porifying fine particulate silica |
| US5707599A (en) * | 1996-02-13 | 1998-01-13 | Santiam Electroactive Materials | Process for purifying tantalum oxide and other metal oxides |
| WO2005019107A1 (en) * | 2003-08-20 | 2005-03-03 | Degussa Ag | Purification of finely divided, pyrogenically prepared metal oxide particles |
| CN100447083C (zh) * | 2003-08-20 | 2008-12-31 | 德古萨股份公司 | 细碎的热解制备的金属氧化物颗粒的净化 |
| US7785560B2 (en) | 2003-08-20 | 2010-08-31 | Evonik Degussa Gmbh | Purification of finely divided, pyrogenically prepared metal oxide particles |
| US10676388B2 (en) | 2015-12-18 | 2020-06-09 | Heraeus Quarzglas Gmbh & Co. Kg | Glass fibers and pre-forms made of homogeneous quartz glass |
| US10618833B2 (en) | 2015-12-18 | 2020-04-14 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a synthetic quartz glass grain |
| WO2017103170A1 (de) * | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Wasserdampfbehandlung von siliziumdioxidpulver bei der herstellung von quarzglas |
| US10730780B2 (en) | 2015-12-18 | 2020-08-04 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
| US11053152B2 (en) | 2015-12-18 | 2021-07-06 | Heraeus Quarzglas Gmbh & Co. Kg | Spray granulation of silicon dioxide in the preparation of quartz glass |
| US11236002B2 (en) | 2015-12-18 | 2022-02-01 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of an opaque quartz glass body |
| US11299417B2 (en) | 2015-12-18 | 2022-04-12 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a melting crucible of refractory metal |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| US11492285B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies from silicon dioxide granulate |
| US11492282B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies with dew point monitoring in the melting oven |
| US11708290B2 (en) | 2015-12-18 | 2023-07-25 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
| WO2021121557A1 (de) | 2019-12-17 | 2021-06-24 | Wacker Chemie Ag | Wirbelschichtreaktor zur steuerung der verweilzeitverteilung in kontinuierlich betriebenen wirbelschichten |
Also Published As
| Publication number | Publication date |
|---|---|
| FR1554066A (enrdf_load_stackoverflow) | 1968-12-09 |
| DE1642994A1 (de) | 1971-06-03 |
| BE709670A (enrdf_load_stackoverflow) | 1968-05-30 |
| JPS4813832B1 (enrdf_load_stackoverflow) | 1973-05-01 |
| NL6800730A (enrdf_load_stackoverflow) | 1968-07-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PE20 | Patent expired after termination of 20 years |