GB1159704A - Method for Preparing a Semiconductor Surface for the Metallisation. - Google Patents
Method for Preparing a Semiconductor Surface for the Metallisation.Info
- Publication number
- GB1159704A GB1159704A GB29993/66A GB2999366A GB1159704A GB 1159704 A GB1159704 A GB 1159704A GB 29993/66 A GB29993/66 A GB 29993/66A GB 2999366 A GB2999366 A GB 2999366A GB 1159704 A GB1159704 A GB 1159704A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silicon
- july
- cleaned
- plating
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001465 metallisation Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 4
- 229910052710 silicon Inorganic materials 0.000 abstract 4
- 239000010703 silicon Substances 0.000 abstract 4
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 abstract 2
- 239000003638 chemical reducing agent Substances 0.000 abstract 2
- 239000003792 electrolyte Substances 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 229910052751 metal Inorganic materials 0.000 abstract 2
- 229910052759 nickel Inorganic materials 0.000 abstract 2
- 238000007747 plating Methods 0.000 abstract 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 abstract 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical class F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 1
- 235000019270 ammonium chloride Nutrition 0.000 abstract 1
- 230000006378 damage Effects 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 239000012153 distilled water Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 230000000873 masking effect Effects 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 abstract 1
- 229910052814 silicon oxide Inorganic materials 0.000 abstract 1
- 235000013024 sodium fluoride Nutrition 0.000 abstract 1
- 239000011775 sodium fluoride Substances 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3063—Electrolytic etching
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
- H01L21/2885—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR23963A FR1449882A (fr) | 1965-07-08 | 1965-07-08 | Nouvelle méthode de préparation de l'état de surface de semi-conducteurs |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1159704A true GB1159704A (en) | 1969-07-30 |
Family
ID=8584094
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB29993/66A Expired GB1159704A (en) | 1965-07-08 | 1966-07-04 | Method for Preparing a Semiconductor Surface for the Metallisation. |
Country Status (5)
| Country | Link |
|---|---|
| DE (1) | DE1496765A1 (cs) |
| FR (1) | FR1449882A (cs) |
| GB (1) | GB1159704A (cs) |
| NL (1) | NL6609525A (cs) |
| SE (1) | SE343606B (cs) |
-
1965
- 1965-07-08 FR FR23963A patent/FR1449882A/fr not_active Expired
-
1966
- 1966-07-04 GB GB29993/66A patent/GB1159704A/en not_active Expired
- 1966-07-06 SE SE9241/66A patent/SE343606B/xx unknown
- 1966-07-07 NL NL6609525A patent/NL6609525A/xx unknown
- 1966-07-08 DE DE19661496765 patent/DE1496765A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| SE343606B (cs) | 1972-03-13 |
| FR1449882A (fr) | 1966-05-06 |
| DE1496765A1 (de) | 1969-08-07 |
| NL6609525A (cs) | 1967-01-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1327376A (en) | Electrodeposition of copper | |
| GB1479563A (en) | Methods of anodizing articles | |
| US2873232A (en) | Method of jet plating | |
| US3726771A (en) | Process for chemical nickel plating of aluminum and its alloys | |
| GB836978A (en) | Electrodeposition of copper and copper alloys | |
| US3000085A (en) | Plating of sintered tungsten contacts | |
| GB1159704A (en) | Method for Preparing a Semiconductor Surface for the Metallisation. | |
| GB1270902A (en) | Continuously bronze plating aluminium wire or strip | |
| GB617689A (en) | Improvements relating to the electro deposition of nickel on nickel | |
| US3882000A (en) | Formation of composite oxides on III-V semiconductors | |
| US3061528A (en) | Gallium plating and methods therefor | |
| GB1297265A (cs) | ||
| GB810946A (en) | Electrolytic shaping of semiconductive bodies | |
| JPS5789499A (en) | Composite electrodeposition of boron nitride and metal | |
| GB1234793A (en) | Brightening and hardening additive for electrolytic silvering baths | |
| GB1142735A (en) | Process for electrodepositing metal on semiconductors | |
| US3600294A (en) | Electrocrystallizer | |
| GB1039797A (en) | Electro-deposition of a ternary alloy of nickel-iron and molybdenum | |
| US2931758A (en) | Electrochemical method, electrolyte therefor, and method for producing said electrolyte | |
| US2753299A (en) | Electroplating with antimony | |
| ES279178A1 (es) | Procedimiento para la obtenciën electrolitica de reservas, sobre una superficie conductora | |
| GB1133679A (en) | Process for the preparation of the surface of aluminium and its alloys for electroplating | |
| GB1296187A (cs) | ||
| US3506547A (en) | Nickel-iron electrolytes containing hydrolyzing metal ions and process of electro-depositing ferromagnetic films | |
| SU539851A1 (ru) | Способ электрохимической обработки стекла |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |