GB1141551A - A method of coating metallic filaments - Google Patents

A method of coating metallic filaments

Info

Publication number
GB1141551A
GB1141551A GB3799866A GB3799866A GB1141551A GB 1141551 A GB1141551 A GB 1141551A GB 3799866 A GB3799866 A GB 3799866A GB 3799866 A GB3799866 A GB 3799866A GB 1141551 A GB1141551 A GB 1141551A
Authority
GB
United Kingdom
Prior art keywords
electrode
filament
deposited
sic
vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3799866A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Publication of GB1141551A publication Critical patent/GB1141551A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • C23C16/545Apparatus specially adapted for continuous coating for coating elongated substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
GB3799866A 1966-01-24 1966-08-24 A method of coating metallic filaments Expired GB1141551A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US52254666A 1966-01-24 1966-01-24

Publications (1)

Publication Number Publication Date
GB1141551A true GB1141551A (en) 1969-01-29

Family

ID=24081286

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3799866A Expired GB1141551A (en) 1966-01-24 1966-08-24 A method of coating metallic filaments

Country Status (4)

Country Link
BE (1) BE693026A (enrdf_load_stackoverflow)
FR (1) FR1508794A (enrdf_load_stackoverflow)
GB (1) GB1141551A (enrdf_load_stackoverflow)
NL (1) NL6701010A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2118212A (en) * 1982-03-29 1983-10-26 Energy Conversion Devices Inc Glow-discharge deposition apparatus including a non-horizontally disposed cathode for depositing amorphous layers
FR2659089A1 (fr) * 1990-03-05 1991-09-06 Northrop Corp Procede et appareil de depot chimique en phase vapeur, en continu, d'une couche superieure sur un substrat.
DE4439056A1 (de) * 1994-11-02 1996-05-09 Dresden Vakuumtech Gmbh Einrichtung zur chemischen Abscheidung auf Fasern und Verfahren zur Anwendung der Einrichtung
DE4335573C2 (de) * 1993-10-19 2002-10-17 Eberhard Kohl Vorrichtung zur Durchführung einer CVD-Beschichtung

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2118212A (en) * 1982-03-29 1983-10-26 Energy Conversion Devices Inc Glow-discharge deposition apparatus including a non-horizontally disposed cathode for depositing amorphous layers
FR2659089A1 (fr) * 1990-03-05 1991-09-06 Northrop Corp Procede et appareil de depot chimique en phase vapeur, en continu, d'une couche superieure sur un substrat.
GB2241711A (en) * 1990-03-05 1991-09-11 Northrop Corp Continuous open chemical vapour deposition
GB2241711B (en) * 1990-03-05 1993-09-22 Northrop Corp Method and apparatus for carbon coating and boron-doped carbon coating
DE4335573C2 (de) * 1993-10-19 2002-10-17 Eberhard Kohl Vorrichtung zur Durchführung einer CVD-Beschichtung
DE4439056A1 (de) * 1994-11-02 1996-05-09 Dresden Vakuumtech Gmbh Einrichtung zur chemischen Abscheidung auf Fasern und Verfahren zur Anwendung der Einrichtung

Also Published As

Publication number Publication date
NL6701010A (enrdf_load_stackoverflow) 1967-07-25
BE693026A (enrdf_load_stackoverflow) 1967-07-24
FR1508794A (fr) 1968-01-05

Similar Documents

Publication Publication Date Title
US3637434A (en) Vapor deposition apparatus
KR880003403A (ko) 화학적 기상 성장법과 그장치
GB1364898A (en) Method for depositing refractory metal
GB1278361A (en) Improvements in or relating to the manufacture of hollow bodies of semiconducting material
KR950703073A (ko) 결정성 질화규소의 저온 화학적 증기증착 방법(molybdenum enhanced lowtemperature deposition of crystalline silicon nitride)
US3120451A (en) Pyrolytic method for precipitating silicon semiconductor material
GB1142080A (en) Deposition chamber for manufacture of refractory coated filaments
GB1141551A (en) A method of coating metallic filaments
US5573742A (en) Method for the preparation of high purity aluminum nitride
GB1347369A (en) Production of hollow bodies of semiconductor material
GB1260233A (en) Improvements in or relating to the epitaxial deposition of crystalline material from the gas phase
US3279946A (en) Hydrogen chloride treatment of semiconductor coating chamber
SE302914B (enrdf_load_stackoverflow)
GB1136881A (en) Vapour growth of silicon crystals and apparatus for producing the same
GB1013094A (en) Process for the deposition of a thin layer of a very pure brittle material in crystalline form
GB1229128A (enrdf_load_stackoverflow)
GB1518564A (en) Method for the low pressure pyrolytic deposition of silicon nitride
GB1440357A (en) Method for making amorphous semiconductor films
ES327660A1 (es) Procedimiento para revestir articulos de grafito contra la corrosion.
GB1324292A (en) Methods and devices for effecting surface deposits
EP0396333B1 (en) Process for depositing a silicon carbide coating on a filament
US3463666A (en) Monocrystalline beta silicon carbide on sapphire
GB1237952A (enrdf_load_stackoverflow)
Fedoseev et al. Effect of hydrogen on diamond growth from a gaseous phase
Causley et al. Vacuum ultraviolet absorption spectra of dichlorosilane, dichloromethylsilane and dichlorodimethylsilane