GB1138556A - Method of vapour depositing a material in the form of a pattern - Google Patents

Method of vapour depositing a material in the form of a pattern

Info

Publication number
GB1138556A
GB1138556A GB46294/66A GB4629466A GB1138556A GB 1138556 A GB1138556 A GB 1138556A GB 46294/66 A GB46294/66 A GB 46294/66A GB 4629466 A GB4629466 A GB 4629466A GB 1138556 A GB1138556 A GB 1138556A
Authority
GB
United Kingdom
Prior art keywords
substrate
layer
pattern
evaporated
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB46294/66A
Inventor
Thomas Meirion Jackson
Peter Gordon Eldridge
Brian Vivian Knight
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB33047/66A external-priority patent/GB1138084A/en
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB46294/66A priority Critical patent/GB1138556A/en
Priority to FR124635A priority patent/FR94315E/en
Publication of GB1138556A publication Critical patent/GB1138556A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Metallurgy (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

1,138,556. Semi-conductor devices. STANDARD TELEPHONES & CABLES Ltd. 17 Oct., 1966, No. 46294/66. Addition to 1,138,084. Heading H1K. [Also in Division C7] In a vapour deposition process of forming a pattern of a first material such as Cd on a first substrate, e.g. cellular Si, the first material is evaporated from a layer of said material on a second substrate in juxtaposition to said first substrate by focusing a converging beam of intense radiant energy, e.g. a laser beam, on to the second substrate which consists of a film of a second material, such as Ta, which has a higher melting point than the boiling point of the first material, supported on a base such as glass, the required pattern being formed by relative movement of the substrates with respect to the focus of the radiant beam. As shown in the Figure infra-red radiation from a laser is directed and focused via mirror 1 and compound lens 7 on to the layer 5 of Ta on glass sheet 4. The heat generated in the Ta layer is conducted to the contiguous Cd layer 6 which is evaporated and condensed on the first substrate 3 located on the co-ordinate table 2 which is moved during deposition to produce the required pattern. The deposited pattern forms the interconnections between the devices in an integrated circuit.
GB46294/66A 1966-07-22 1966-10-17 Method of vapour depositing a material in the form of a pattern Expired GB1138556A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB46294/66A GB1138556A (en) 1966-07-22 1966-10-17 Method of vapour depositing a material in the form of a pattern
FR124635A FR94315E (en) 1966-07-22 1967-10-17 Laser deposition process.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB33047/66A GB1138084A (en) 1966-07-22 1966-07-22 Method of vapour depositing a material in the form of a pattern
GB46294/66A GB1138556A (en) 1966-07-22 1966-10-17 Method of vapour depositing a material in the form of a pattern

Publications (1)

Publication Number Publication Date
GB1138556A true GB1138556A (en) 1969-01-01

Family

ID=10440656

Family Applications (1)

Application Number Title Priority Date Filing Date
GB46294/66A Expired GB1138556A (en) 1966-07-22 1966-10-17 Method of vapour depositing a material in the form of a pattern

Country Status (2)

Country Link
FR (1) FR94315E (en)
GB (1) GB1138556A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2030145A1 (en) * 1969-01-15 1970-10-30 Ibm
EP0002738A1 (en) * 1977-12-21 1979-07-11 International Business Machines Corporation Method for applying a layer of a material to a surface of a platelike workpiece by means of a laser beam
GB2155042A (en) * 1984-02-21 1985-09-18 Hughes Technology Pty Ltd Laser induced ion beam generator
EP0322479A1 (en) * 1985-01-17 1989-07-05 Vyskumny a vyvojovy ustav sklársky Vyskumná a vyvojová organizácia Method and apparatus for the selective creation of a decor on hollow axially symmetrical articles by means of a laser beam

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2030145A1 (en) * 1969-01-15 1970-10-30 Ibm
EP0002738A1 (en) * 1977-12-21 1979-07-11 International Business Machines Corporation Method for applying a layer of a material to a surface of a platelike workpiece by means of a laser beam
GB2155042A (en) * 1984-02-21 1985-09-18 Hughes Technology Pty Ltd Laser induced ion beam generator
EP0322479A1 (en) * 1985-01-17 1989-07-05 Vyskumny a vyvojovy ustav sklársky Vyskumná a vyvojová organizácia Method and apparatus for the selective creation of a decor on hollow axially symmetrical articles by means of a laser beam

Also Published As

Publication number Publication date
FR94315E (en) 1969-08-01

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