GB1092607A - Improvements relating to a photosensitive material - Google Patents
Improvements relating to a photosensitive materialInfo
- Publication number
- GB1092607A GB1092607A GB1153265A GB1153265A GB1092607A GB 1092607 A GB1092607 A GB 1092607A GB 1153265 A GB1153265 A GB 1153265A GB 1153265 A GB1153265 A GB 1153265A GB 1092607 A GB1092607 A GB 1092607A
- Authority
- GB
- United Kingdom
- Prior art keywords
- support
- image
- silver
- sensitive
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title abstract 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract 3
- 229910052753 mercury Inorganic materials 0.000 abstract 3
- 229910052709 silver Inorganic materials 0.000 abstract 3
- 239000004332 silver Substances 0.000 abstract 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 abstract 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052751 metal Inorganic materials 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 239000000080 wetting agent Substances 0.000 abstract 2
- PTKWYSNDTXDBIZ-UHFFFAOYSA-N 9,10-dioxoanthracene-1,2-disulfonic acid Chemical class C1=CC=C2C(=O)C3=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C3C(=O)C2=C1 PTKWYSNDTXDBIZ-UHFFFAOYSA-N 0.000 abstract 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 abstract 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 abstract 1
- 229920001353 Dextrin Polymers 0.000 abstract 1
- 239000004375 Dextrin Substances 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- MKJXYGKVIBWPFZ-UHFFFAOYSA-L calcium lactate Chemical compound [Ca+2].CC(O)C([O-])=O.CC(O)C([O-])=O MKJXYGKVIBWPFZ-UHFFFAOYSA-L 0.000 abstract 1
- 229960002401 calcium lactate Drugs 0.000 abstract 1
- 239000001527 calcium lactate Substances 0.000 abstract 1
- 235000011086 calcium lactate Nutrition 0.000 abstract 1
- 229910017052 cobalt Inorganic materials 0.000 abstract 1
- 239000010941 cobalt Substances 0.000 abstract 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 238000002425 crystallisation Methods 0.000 abstract 1
- 230000008025 crystallization Effects 0.000 abstract 1
- 235000019425 dextrin Nutrition 0.000 abstract 1
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- 239000004310 lactic acid Substances 0.000 abstract 1
- 235000014655 lactic acid Nutrition 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 150000003378 silver Chemical class 0.000 abstract 1
- 229940100890 silver compound Drugs 0.000 abstract 1
- 150000003379 silver compounds Chemical class 0.000 abstract 1
- 239000000600 sorbitol Substances 0.000 abstract 1
- 235000010356 sorbitol Nutrition 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
- H05K3/106—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam by photographic methods
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/56—Diazo sulfonates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/62—Metal compounds reducible to metal
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/74—Applying photosensitive compositions to the base; Drying processes therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/775—Photosensitive materials characterised by the base or auxiliary layers the base being of paper
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Printing Plates And Materials Therefor (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL6403056A NL139829B (nl) | 1964-03-21 | 1964-03-21 | Werkwijze voor de vervaardiging van lichtgevoelig materiaal, aldus vervaardigd lichtgevoelig materiaal en daarmee vervaardigd voorwerp. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1092607A true GB1092607A (en) | 1967-11-29 |
Family
ID=19789624
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1153265A Expired GB1092607A (en) | 1964-03-21 | 1965-03-18 | Improvements relating to a photosensitive material |
Country Status (10)
| Country | Link |
|---|---|
| JP (1) | JPS5143769B1 (https=) |
| AT (1) | AT275317B (https=) |
| BE (1) | BE661411A (https=) |
| CH (1) | CH464687A (https=) |
| DE (1) | DE1572214B2 (https=) |
| DK (1) | DK111794B (https=) |
| ES (1) | ES310715A1 (https=) |
| GB (1) | GB1092607A (https=) |
| NL (1) | NL139829B (https=) |
| SE (1) | SE315497B (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3960564A (en) * | 1972-06-21 | 1976-06-01 | U.S. Philips Corporation | Physical development process utilizing a physical developer containing a specific reducing agent, a thiol compound |
| WO2006111698A1 (en) * | 2005-04-22 | 2006-10-26 | Eastman Kodak Company | Method of forming flexible electronic circuits |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL7316102A (nl) * | 1973-11-26 | 1975-05-28 | Philips Nv | Werkwijze voor de vervaardiging van een uit- wendig elektrische geleidend metaalpatroon. |
| JP3606047B2 (ja) * | 1998-05-14 | 2005-01-05 | セイコーエプソン株式会社 | 基板の製造方法 |
-
1964
- 1964-03-21 NL NL6403056A patent/NL139829B/xx unknown
-
1965
- 1965-03-18 SE SE355465A patent/SE315497B/xx unknown
- 1965-03-18 JP JP1545565A patent/JPS5143769B1/ja active Pending
- 1965-03-18 AT AT244465A patent/AT275317B/de active
- 1965-03-18 DK DK138665A patent/DK111794B/da unknown
- 1965-03-18 CH CH377465A patent/CH464687A/de unknown
- 1965-03-18 GB GB1153265A patent/GB1092607A/en not_active Expired
- 1965-03-18 ES ES0310715A patent/ES310715A1/es not_active Expired
- 1965-03-18 DE DE1965N0026407 patent/DE1572214B2/de active Granted
- 1965-03-19 BE BE661411A patent/BE661411A/xx unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3960564A (en) * | 1972-06-21 | 1976-06-01 | U.S. Philips Corporation | Physical development process utilizing a physical developer containing a specific reducing agent, a thiol compound |
| WO2006111698A1 (en) * | 2005-04-22 | 2006-10-26 | Eastman Kodak Company | Method of forming flexible electronic circuits |
| US7563564B2 (en) | 2005-04-22 | 2009-07-21 | Eastman Kodak Company | Method of forming flexible electronic circuits |
Also Published As
| Publication number | Publication date |
|---|---|
| SE315497B (https=) | 1969-09-29 |
| ES310715A1 (es) | 1965-06-01 |
| DK111794B (da) | 1968-10-07 |
| DE1572214B2 (de) | 1976-07-29 |
| CH464687A (de) | 1968-10-31 |
| JPS5143769B1 (https=) | 1976-11-24 |
| AT275317B (de) | 1969-10-27 |
| BE661411A (https=) | 1965-09-20 |
| DE1572214A1 (de) | 1970-04-09 |
| NL6403056A (https=) | 1965-09-22 |
| NL139829B (nl) | 1973-09-17 |
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