GB1087268A - A method of producing an homogeneous monocrystal - Google Patents

A method of producing an homogeneous monocrystal

Info

Publication number
GB1087268A
GB1087268A GB47506/64A GB4750664A GB1087268A GB 1087268 A GB1087268 A GB 1087268A GB 47506/64 A GB47506/64 A GB 47506/64A GB 4750664 A GB4750664 A GB 4750664A GB 1087268 A GB1087268 A GB 1087268A
Authority
GB
United Kingdom
Prior art keywords
substrate
chamber
ingots
temperature
monocrystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB47506/64A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1087268A publication Critical patent/GB1087268A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/017Clean surfaces
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/049Equivalence and options
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/065Gp III-V generic compounds-processing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/067Graded energy gap
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S257/00Active solid-state devices, e.g. transistors, solid-state diodes
    • Y10S257/912Charge transfer device using both electron and hole signal carriers

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
GB47506/64A 1963-12-23 1964-11-23 A method of producing an homogeneous monocrystal Expired GB1087268A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US332563A US3392066A (en) 1963-12-23 1963-12-23 Method of vapor growing a homogeneous monocrystal

Publications (1)

Publication Number Publication Date
GB1087268A true GB1087268A (en) 1967-10-18

Family

ID=23298791

Family Applications (1)

Application Number Title Priority Date Filing Date
GB47506/64A Expired GB1087268A (en) 1963-12-23 1964-11-23 A method of producing an homogeneous monocrystal

Country Status (6)

Country Link
US (1) US3392066A (xx)
CH (1) CH426740A (xx)
DE (1) DE1544200C3 (xx)
GB (1) GB1087268A (xx)
NL (1) NL147645B (xx)
SE (1) SE319750B (xx)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3462323A (en) * 1966-12-05 1969-08-19 Monsanto Co Process for the preparation of compound semiconductors
US4115163A (en) * 1976-01-08 1978-09-19 Yulia Ivanovna Gorina Method of growing epitaxial semiconductor films utilizing radiant heating
US4421576A (en) * 1981-09-14 1983-12-20 Rca Corporation Method for forming an epitaxial compound semiconductor layer on a semi-insulating substrate
CN114990358B (zh) * 2022-04-12 2023-02-03 中南大学 一种掺杂砷烯纳米片、及其制备方法和应用

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL252729A (xx) * 1959-06-18
NL275516A (xx) * 1961-03-02
US3148094A (en) * 1961-03-13 1964-09-08 Texas Instruments Inc Method of producing junctions by a relocation process
US3218205A (en) * 1962-07-13 1965-11-16 Monsanto Co Use of hydrogen halide and hydrogen in separate streams as carrier gases in vapor deposition of iii-v compounds

Also Published As

Publication number Publication date
CH426740A (de) 1966-12-31
NL6414015A (xx) 1965-06-24
DE1544200B2 (de) 1974-06-20
SE319750B (xx) 1970-01-26
DE1544200A1 (de) 1970-08-13
US3392066A (en) 1968-07-09
NL147645B (nl) 1975-11-17
DE1544200C3 (de) 1975-11-27

Similar Documents

Publication Publication Date Title
US3716424A (en) Method of preparation of lead sulfide pn junction diodes
US3956032A (en) Process for fabricating SiC semiconductor devices
US3634149A (en) Method of manufacturing aluminium nitride crystals for semiconductor devices
US3129061A (en) Process for producing an elongated unitary body of semiconductor material crystallizing in the diamond cubic lattice structure and the product so produced
US3520810A (en) Manufacture of single crystal semiconductors
US5716449A (en) Method of forming a compound semiconductor material
US3607463A (en) Method for growing tin-doped n-type epitaxial gallium arsenide from the liquid state
Lo et al. Ingot‐nucleated Pb1− x Sn x Te diode lasers
GB1087268A (en) A method of producing an homogeneous monocrystal
Nishizawa Stoichiometry control for growth of III–V crystals
GB1000731A (en) Semiconductor material
Abernathy et al. Growth and characterization of low defect GaAs by vertical Gradient Freeze
Kolomiets et al. The thermally stimulated conductivity in vitreous and crystalline As2Se3
US4028145A (en) Stoichiometric annealing of mercury cadmium telluride
US3785885A (en) Epitaxial solution growth of ternary iii-v compounds
US4185081A (en) Procedure for the synthesis of stoichiometric proportioned indium phosphide
US3694275A (en) Method of making light emitting diode
Bradford et al. PREPARATION OF VAPOR GROWN LEAD–TIN TELLURIDE FOR 8–14 MICROMETER PHOTODIODES
Bridenbaugh et al. Chemical vapor growth and properties of CuA¢ lS2
US3773553A (en) Silicon carbide junction diode
JPH0557239B2 (xx)
US3563816A (en) Method for the vapor growth of semiconductors
JPH06340498A (ja) SiC単結晶の成長方法
JPH0323287A (ja) 炭化ケイ素単結晶の液相エピタキシャル成長方法
Lent et al. The growth of semi-insulating gallium arsenide by the LEC process