GB1055079A - Moisture resistant planographic plates - Google Patents

Moisture resistant planographic plates

Info

Publication number
GB1055079A
GB1055079A GB36643/64A GB3664364A GB1055079A GB 1055079 A GB1055079 A GB 1055079A GB 36643/64 A GB36643/64 A GB 36643/64A GB 3664364 A GB3664364 A GB 3664364A GB 1055079 A GB1055079 A GB 1055079A
Authority
GB
United Kingdom
Prior art keywords
moisture resistant
planographic plates
naphthol
planographic
plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB36643/64A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of GB1055079A publication Critical patent/GB1055079A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
GB36643/64A 1963-09-06 1964-09-07 Moisture resistant planographic plates Expired GB1055079A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US307025A US3300309A (en) 1963-09-06 1963-09-06 Moisture-resistant planographic plates and methods of producing same

Publications (1)

Publication Number Publication Date
GB1055079A true GB1055079A (en) 1967-01-11

Family

ID=23187917

Family Applications (1)

Application Number Title Priority Date Filing Date
GB36643/64A Expired GB1055079A (en) 1963-09-06 1964-09-07 Moisture resistant planographic plates

Country Status (6)

Country Link
US (1) US3300309A (OSRAM)
BE (1) BE652748A (OSRAM)
DE (1) DE1447916B2 (OSRAM)
GB (1) GB1055079A (OSRAM)
NL (2) NL6410224A (OSRAM)
SE (1) SE313997B (OSRAM)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL156092B (nl) * 1968-03-25 1978-03-15 Polychrome Corp Werkwijze voor de vervaardiging van een lithografische drukplaat.
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
US3891516A (en) * 1970-08-03 1975-06-24 Polychrome Corp Process of electrolyically anodizing a mechanically grained aluminum base and article made thereby
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
JPS5539825B2 (OSRAM) * 1972-05-12 1980-10-14
US3997349A (en) * 1974-06-17 1976-12-14 Minnesota Mining And Manufacturing Company Light-sensitive development-free driographic printing plate
US4230492A (en) * 1978-01-17 1980-10-28 The Richardson Company Aryl sulfonic acid based stabilizers for presensitized planographic plates
US4299907A (en) * 1978-08-10 1981-11-10 Polychrome Corporation Storage stable photosensitive diazo lithographic printing plates
US4414315A (en) * 1979-08-06 1983-11-08 Howard A. Fromson Process for making lithographic printing plate
US4401743A (en) * 1980-04-30 1983-08-30 Minnesota Mining And Manufacturing Company Aqueous developable photosensitive composition and printing plate
US4326020A (en) * 1980-09-10 1982-04-20 Polychrome Corporation Method of making positive acting diazo lithographic printing plate
US4499170A (en) * 1983-06-17 1985-02-12 Richardson Graphics Company Lithographic plates and photoresists having stabilized photosensitive diazo resin with theophylline derivative
US5066568A (en) * 1985-08-05 1991-11-19 Hoehst Celanese Corporation Method of developing negative working photographic elements
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
US5122442A (en) * 1989-07-28 1992-06-16 Hoechst Celanese Corporation Method for forming an image from a high speed screen printing composition on a screen mesh
US5232813A (en) * 1990-01-31 1993-08-03 Fuji Photo Film Co., Ltd. Ps plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer
CN1037552C (zh) * 1991-03-21 1998-02-25 北京大学 一种负性感光印刷版及其制法
US5942368A (en) * 1996-04-23 1999-08-24 Konica Corporation Pigment dispersion composition
JP3567402B2 (ja) * 1996-06-12 2004-09-22 コニカミノルタホールディングス株式会社 平版印刷版用支持体の製造方法、その製造方法で得られる平版印刷版用支持体及びその支持体を用いた感光性平版印刷版
US20130172476A1 (en) 2010-07-02 2013-07-04 Dic Corporation Fluorine-based surfactant, and coating composition and resist composition each using the same
US9359547B2 (en) 2013-01-31 2016-06-07 Halliburton Energy Services, Inc. Wellbore servicing compositions and methods of making and using same
WO2021131726A1 (ja) 2019-12-25 2021-07-01 Dic株式会社 重合体及び当該重合体を含むコーティング組成物
EP4209524A4 (en) 2020-09-03 2024-09-25 DIC Corporation POLYMER, COATING COMPOSITION, RESIST COMPOSITION AND ARTICLES
JP7288234B2 (ja) 2020-12-17 2023-06-07 Dic株式会社 化合物、レベリング剤、コーティング組成物、レジスト組成物及び物品
TW202311331A (zh) 2021-05-18 2023-03-16 日商Ｄｉｃ股份有限公司 含矽酮鏈的聚合物、塗敷組成物、抗蝕劑組成物及物品
TW202336058A (zh) 2022-03-08 2023-09-16 日商Ｄｉｃ股份有限公司 化合物、該化合物的製造方法、調平劑、塗敷組成物、抗蝕劑組成物、硬化物及物品
WO2024024440A1 (ja) 2022-07-29 2024-02-01 Dic株式会社 シリコーン含有共重合体、レベリング剤、コーティング組成物、レジスト組成物、カラーフィルター及びシリコーン含有共重合体の製造方法
WO2024024441A1 (ja) 2022-07-29 2024-02-01 Dic株式会社 シリコーン含有共重合体、レベリング剤、コーティング組成物、レジスト組成物、カラーフィルター及びシリコーン含有共重合体の製造方法
TW202419491A (zh) 2022-11-10 2024-05-16 日商Ｄｉｃ股份有限公司 抗蝕劑組成物及其硬化物
TW202419466A (zh) 2022-11-14 2024-05-16 日商Ｄｉｃ股份有限公司 隨機共聚物及其製造方法、包含該共聚物的塗敷組成物、抗蝕劑組成物以及物品
TW202440690A (zh) 2023-04-06 2024-10-16 日商Ｄｉｃ股份有限公司 共聚物、塗敷組成物、塗膜、抗蝕劑組成物、硬化物及物品

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE857739C (de) * 1950-08-13 1952-12-01 Kalle & Co Ag Verfahren zum Fixieren von Druckformen, die mit Hilfe von Diazoverbindungen hergestellt sind
DE1183919B (de) * 1958-12-29 1964-12-23 Polychrome Corp Verfahren zur Herstellung einer vorsensibilisierten Flachdruckplatte mit metallischer Grundschicht unter Verwendung einer Haftschicht
NL259610A (OSRAM) * 1959-12-30
BE624581A (OSRAM) * 1961-11-11
US3169864A (en) * 1962-05-15 1965-02-16 Minnesota Mining & Mfg Photosensitive materials comprising diazonium salts of bisphenol esters

Also Published As

Publication number Publication date
SE313997B (OSRAM) 1969-08-25
BE652748A (OSRAM) 1964-12-31
NL128965C (OSRAM)
NL6410224A (OSRAM) 1965-03-08
DE1447916A1 (de) 1968-11-14
US3300309A (en) 1967-01-24
DE1447916B2 (de) 1976-11-04

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