GB1042520A - Improvements relating to compositions for preparation of photosensitive films - Google Patents
Improvements relating to compositions for preparation of photosensitive filmsInfo
- Publication number
- GB1042520A GB1042520A GB4424263A GB4424263A GB1042520A GB 1042520 A GB1042520 A GB 1042520A GB 4424263 A GB4424263 A GB 4424263A GB 4424263 A GB4424263 A GB 4424263A GB 1042520 A GB1042520 A GB 1042520A
- Authority
- GB
- United Kingdom
- Prior art keywords
- acrylate
- copolymer
- polymer
- vinylidene chloride
- compositions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title abstract 3
- 229920001577 copolymer Polymers 0.000 abstract 6
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 abstract 4
- 229920000642 polymer Polymers 0.000 abstract 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N acrylic acid methyl ester Natural products COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 abstract 3
- 239000000178 monomer Substances 0.000 abstract 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 abstract 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 2
- 238000012644 addition polymerization Methods 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 abstract 2
- 239000006185 dispersion Substances 0.000 abstract 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 abstract 2
- 230000005855 radiation Effects 0.000 abstract 2
- WJGVWFOXHWYCHL-UHFFFAOYSA-N 1,1-dichloroethene;methyl prop-2-enoate Chemical compound ClC(Cl)=C.COC(=O)C=C WJGVWFOXHWYCHL-UHFFFAOYSA-N 0.000 abstract 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 abstract 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- 239000002202 Polyethylene glycol Substances 0.000 abstract 1
- 238000009835 boiling Methods 0.000 abstract 1
- 239000008199 coating composition Substances 0.000 abstract 1
- 125000004386 diacrylate group Chemical group 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 239000000975 dye Substances 0.000 abstract 1
- 238000007720 emulsion polymerization reaction Methods 0.000 abstract 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 abstract 1
- 239000000049 pigment Substances 0.000 abstract 1
- 229920001485 poly(butyl acrylate) polymer Polymers 0.000 abstract 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 abstract 1
- 229920000120 polyethyl acrylate Polymers 0.000 abstract 1
- 229920001223 polyethylene glycol Polymers 0.000 abstract 1
- 239000003505 polymerization initiator Substances 0.000 abstract 1
- 239000004926 polymethyl methacrylate Substances 0.000 abstract 1
- 229920002689 polyvinyl acetate Polymers 0.000 abstract 1
- 239000011118 polyvinyl acetate Substances 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
- 238000012719 thermal polymerization Methods 0.000 abstract 1
- 229920003176 water-insoluble polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US23738662A | 1962-11-13 | 1962-11-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1042520A true GB1042520A (en) | 1966-09-14 |
Family
ID=22893500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4424263A Expired GB1042520A (en) | 1962-11-13 | 1963-11-08 | Improvements relating to compositions for preparation of photosensitive films |
Country Status (3)
| Country | Link |
|---|---|
| BE (1) | BE639767A (enrdf_load_stackoverflow) |
| FR (1) | FR1381607A (enrdf_load_stackoverflow) |
| GB (1) | GB1042520A (enrdf_load_stackoverflow) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4264708A (en) | 1978-03-31 | 1981-04-28 | E. I. Du Pont De Nemours And Company | Radiation sensitive element having a thin photopolymerizable layer |
| US4278752A (en) | 1978-09-07 | 1981-07-14 | E. I. Du Pont De Nemours And Company | Flame retardant radiation sensitive element |
| US4308338A (en) | 1980-03-26 | 1981-12-29 | E. I. Du Pont De Nemours And Company | Methods of imaging photopolymerizable materials containing diester polyether |
| EP0049504A1 (en) * | 1980-10-06 | 1982-04-14 | E.I. Du Pont De Nemours And Company | Improved aqueous developable photopolymerizable elements |
| US4485167A (en) * | 1980-10-06 | 1984-11-27 | E. I. Du Pont De Nemours And Company | Aqueous developable photopolymerizable elements |
| US4517281A (en) * | 1980-10-06 | 1985-05-14 | E. I. Du Pont De Nemours And Company | Development process for aqueous developable photopolymerizable elements |
| US4539286A (en) * | 1983-06-06 | 1985-09-03 | Dynachem Corporation | Flexible, fast processing, photopolymerizable composition |
| US4610951A (en) * | 1983-06-06 | 1986-09-09 | Dynachem Corporation | Process of using a flexible, fast processing photopolymerizable composition |
| RU2170178C2 (ru) * | 1996-01-25 | 2001-07-10 | ЮСиБи С.А. | Пленка для печати |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2361680A1 (fr) * | 1976-08-11 | 1978-03-10 | Du Pont | Plaques d'impression planographiques et leur preparation |
| DE3374717D1 (en) * | 1982-03-16 | 1988-01-07 | Du Pont | Use of a negative acting photopolymerizable element as a solder mask |
-
0
- BE BE639767D patent/BE639767A/xx unknown
-
1963
- 1963-11-08 GB GB4424263A patent/GB1042520A/en not_active Expired
- 1963-11-12 FR FR953463A patent/FR1381607A/fr not_active Expired
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4264708A (en) | 1978-03-31 | 1981-04-28 | E. I. Du Pont De Nemours And Company | Radiation sensitive element having a thin photopolymerizable layer |
| US4278752A (en) | 1978-09-07 | 1981-07-14 | E. I. Du Pont De Nemours And Company | Flame retardant radiation sensitive element |
| US4308338A (en) | 1980-03-26 | 1981-12-29 | E. I. Du Pont De Nemours And Company | Methods of imaging photopolymerizable materials containing diester polyether |
| EP0049504A1 (en) * | 1980-10-06 | 1982-04-14 | E.I. Du Pont De Nemours And Company | Improved aqueous developable photopolymerizable elements |
| US4485167A (en) * | 1980-10-06 | 1984-11-27 | E. I. Du Pont De Nemours And Company | Aqueous developable photopolymerizable elements |
| US4517281A (en) * | 1980-10-06 | 1985-05-14 | E. I. Du Pont De Nemours And Company | Development process for aqueous developable photopolymerizable elements |
| US4539286A (en) * | 1983-06-06 | 1985-09-03 | Dynachem Corporation | Flexible, fast processing, photopolymerizable composition |
| US4610951A (en) * | 1983-06-06 | 1986-09-09 | Dynachem Corporation | Process of using a flexible, fast processing photopolymerizable composition |
| RU2170178C2 (ru) * | 1996-01-25 | 2001-07-10 | ЮСиБи С.А. | Пленка для печати |
| US7758965B2 (en) | 1996-01-25 | 2010-07-20 | Innovia Films Limited | Printable film |
| US8663760B2 (en) | 1996-01-25 | 2014-03-04 | Innovia Films Limited | Printable film |
| US8673415B2 (en) | 1996-01-25 | 2014-03-18 | Innovia Films Limited | Printable film |
| US8722162B2 (en) | 1996-01-25 | 2014-05-13 | Innovia Films Limited | Printable film |
Also Published As
| Publication number | Publication date |
|---|---|
| BE639767A (enrdf_load_stackoverflow) | |
| FR1381607A (fr) | 1964-12-14 |
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