GB1042520A - Improvements relating to compositions for preparation of photosensitive films - Google Patents

Improvements relating to compositions for preparation of photosensitive films

Info

Publication number
GB1042520A
GB1042520A GB4424263A GB4424263A GB1042520A GB 1042520 A GB1042520 A GB 1042520A GB 4424263 A GB4424263 A GB 4424263A GB 4424263 A GB4424263 A GB 4424263A GB 1042520 A GB1042520 A GB 1042520A
Authority
GB
United Kingdom
Prior art keywords
acrylate
copolymer
polymer
vinylidene chloride
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4424263A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of GB1042520A publication Critical patent/GB1042520A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)

Abstract

A composition comprises an aqueous dispersion of a water-insoluble polymer which is capable of coalescing to form a continuous film on drying, a surface-active agent, a non-gaseous ethylenically unsaturated compound containing at least two terminal ethylenic groups, having a boiling point above 100 DEG C. at normal atmospheric pressure and capable of forming a high polymer by free-radical initiated, chain-propagating, addition polymerization, and a free-radical generating, addition polymerization initiator activatable by actinic radiation. The polymer is preferably present in a 10 to 60% by weight concentration in the dispersion and the unsaturated compound is also preferably present in an amount of 10 to 60% by weight. The polymers are preferably made by the emulsion polymerization of one or more ethylenically unsaturated monomers. Exemplified are vinylidene chloride methyl acrylate/itaconic acid copolymer, butadiene/acrylonitrile rubber, polyvinyl acetate, butyl methacrylate/itaconic acid copolymer, acrylonitrile/vinylidene chloride copolymer (plasticized by dibutyl phthalate), polyethyl acrylate, acrylic acid/acrylate copolymer, butadiene/styrene rubber, polybutyl acrylate, poly-2-ethylhexyl acrylate, vinylidene chloride/methyl acrylate copolymer, polymethyl methacrylate and methyl acrylate/butyl acrylate copolymer. Monomers exemplified are polyethylene glycol (300) diacrylate, thriethylene glycol diacrylate, and methylene bis-acrylamide. The coating compositions are preferably applied to backings, dried and exposed to radiation to polymerize in the solid state. The monomer and polymer are preferably compatible. The compositions may contain other substances such as thermal polymerization inhibitors, dyes, pigments and other materials used in photography.
GB4424263A 1962-11-13 1963-11-08 Improvements relating to compositions for preparation of photosensitive films Expired GB1042520A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23738662A 1962-11-13 1962-11-13

Publications (1)

Publication Number Publication Date
GB1042520A true GB1042520A (en) 1966-09-14

Family

ID=22893500

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4424263A Expired GB1042520A (en) 1962-11-13 1963-11-08 Improvements relating to compositions for preparation of photosensitive films

Country Status (3)

Country Link
BE (1) BE639767A (en)
FR (1) FR1381607A (en)
GB (1) GB1042520A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4264708A (en) 1978-03-31 1981-04-28 E. I. Du Pont De Nemours And Company Radiation sensitive element having a thin photopolymerizable layer
US4278752A (en) 1978-09-07 1981-07-14 E. I. Du Pont De Nemours And Company Flame retardant radiation sensitive element
US4308338A (en) 1980-03-26 1981-12-29 E. I. Du Pont De Nemours And Company Methods of imaging photopolymerizable materials containing diester polyether
EP0049504A1 (en) * 1980-10-06 1982-04-14 E.I. Du Pont De Nemours And Company Improved aqueous developable photopolymerizable elements
US4485167A (en) * 1980-10-06 1984-11-27 E. I. Du Pont De Nemours And Company Aqueous developable photopolymerizable elements
US4517281A (en) * 1980-10-06 1985-05-14 E. I. Du Pont De Nemours And Company Development process for aqueous developable photopolymerizable elements
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
US7758965B2 (en) 1996-01-25 2010-07-20 Innovia Films Limited Printable film

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2361680A1 (en) * 1976-08-11 1978-03-10 Du Pont Planographic printing block - consisting of carrier coated with polymer layer contg. image of hydrophilic or oleophilic zones
EP0089041B1 (en) * 1982-03-16 1987-11-25 E.I. Du Pont De Nemours And Company Use of a negative acting photopolymerizable element as a solder mask

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4264708A (en) 1978-03-31 1981-04-28 E. I. Du Pont De Nemours And Company Radiation sensitive element having a thin photopolymerizable layer
US4278752A (en) 1978-09-07 1981-07-14 E. I. Du Pont De Nemours And Company Flame retardant radiation sensitive element
US4308338A (en) 1980-03-26 1981-12-29 E. I. Du Pont De Nemours And Company Methods of imaging photopolymerizable materials containing diester polyether
EP0049504A1 (en) * 1980-10-06 1982-04-14 E.I. Du Pont De Nemours And Company Improved aqueous developable photopolymerizable elements
US4485167A (en) * 1980-10-06 1984-11-27 E. I. Du Pont De Nemours And Company Aqueous developable photopolymerizable elements
US4517281A (en) * 1980-10-06 1985-05-14 E. I. Du Pont De Nemours And Company Development process for aqueous developable photopolymerizable elements
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
US7758965B2 (en) 1996-01-25 2010-07-20 Innovia Films Limited Printable film
US8663760B2 (en) 1996-01-25 2014-03-04 Innovia Films Limited Printable film
US8673415B2 (en) 1996-01-25 2014-03-18 Innovia Films Limited Printable film
US8722162B2 (en) 1996-01-25 2014-05-13 Innovia Films Limited Printable film

Also Published As

Publication number Publication date
BE639767A (en)
FR1381607A (en) 1964-12-14

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