GB1000970A - Method of treating semiconductor materials - Google Patents
Method of treating semiconductor materialsInfo
- Publication number
- GB1000970A GB1000970A GB1842/62A GB184262A GB1000970A GB 1000970 A GB1000970 A GB 1000970A GB 1842/62 A GB1842/62 A GB 1842/62A GB 184262 A GB184262 A GB 184262A GB 1000970 A GB1000970 A GB 1000970A
- Authority
- GB
- United Kingdom
- Prior art keywords
- crystal
- temperature
- minutes
- mixture
- atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title abstract 4
- 239000000463 material Substances 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000013078 crystal Substances 0.000 abstract 15
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 abstract 4
- 239000000203 mixture Substances 0.000 abstract 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 3
- 229910052785 arsenic Inorganic materials 0.000 abstract 3
- 239000000155 melt Substances 0.000 abstract 3
- 238000010438 heat treatment Methods 0.000 abstract 2
- 238000002844 melting Methods 0.000 abstract 2
- 230000008018 melting Effects 0.000 abstract 2
- 238000010791 quenching Methods 0.000 abstract 2
- 230000000171 quenching effect Effects 0.000 abstract 2
- 229920006395 saturated elastomer Polymers 0.000 abstract 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000000969 carrier Substances 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 238000002109 crystal growth method Methods 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 229910001873 dinitrogen Inorganic materials 0.000 abstract 1
- 239000005350 fused silica glass Substances 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 1
- 229910002804 graphite Inorganic materials 0.000 abstract 1
- 239000010439 graphite Substances 0.000 abstract 1
- 239000001307 helium Substances 0.000 abstract 1
- 229910052734 helium Inorganic materials 0.000 abstract 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000003921 oil Substances 0.000 abstract 1
- 238000009877 rendering Methods 0.000 abstract 1
- 238000001226 reprecipitation Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B17/00—Single-crystal growth onto a seed which remains in the melt during growth, e.g. Nacken-Kyropoulos method
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US83972A US3111433A (en) | 1961-01-23 | 1961-01-23 | Method for increasing the doping level of semiconductor materials |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1000970A true GB1000970A (en) | 1965-08-11 |
Family
ID=22181836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1842/62A Expired GB1000970A (en) | 1961-01-23 | 1962-01-18 | Method of treating semiconductor materials |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3111433A (en:Method) |
| BE (1) | BE610326A (en:Method) |
| DE (1) | DE1204049B (en:Method) |
| GB (1) | GB1000970A (en:Method) |
| NL (1) | NL270331A (en:Method) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3231436A (en) * | 1962-03-07 | 1966-01-25 | Nippon Electric Co | Method of heat treating semiconductor devices to stabilize current amplification factor characteristic |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB632980A (en) * | 1945-12-29 | 1949-12-05 | Western Electric Co | Methods of treating germanium material |
| NL87381C (en:Method) * | 1950-03-31 | |||
| US2669533A (en) * | 1951-01-03 | 1954-02-16 | Gen Electric | Method of making germanium hall plates |
| US2785096A (en) * | 1955-05-25 | 1957-03-12 | Texas Instruments Inc | Manufacture of junction-containing silicon crystals |
| US2798826A (en) * | 1956-05-09 | 1957-07-09 | Ampco Metal Inc | Method of heat treating nickel bearing aluminum bronze alloys |
| US3033714A (en) * | 1957-09-28 | 1962-05-08 | Sony Corp | Diode type semiconductor device |
| US3007819A (en) * | 1958-07-07 | 1961-11-07 | Motorola Inc | Method of treating semiconductor material |
| US2966434A (en) * | 1958-11-20 | 1960-12-27 | British Thomson Houston Co Ltd | Semi-conductor devices |
-
0
- NL NL270331D patent/NL270331A/xx unknown
-
1961
- 1961-01-23 US US83972A patent/US3111433A/en not_active Expired - Lifetime
- 1961-10-31 DE DEW30971A patent/DE1204049B/de active Pending
- 1961-11-14 BE BE610326A patent/BE610326A/fr unknown
-
1962
- 1962-01-18 GB GB1842/62A patent/GB1000970A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3111433A (en) | 1963-11-19 |
| BE610326A (fr) | 1962-03-01 |
| DE1204049B (de) | 1965-10-28 |
| NL270331A (en:Method) |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US2957789A (en) | Semiconductor devices and methods of preparing the same | |
| US4999082A (en) | Process for producing monocrystalline group II-IV or group III-V compounds and products thereof | |
| JPS56135969A (en) | Manufacture of semiconductor device | |
| GB1286024A (en) | Method of producing single semiconductor crystals | |
| GB838770A (en) | Improvements in method of growing semiconductor crystals | |
| US3607463A (en) | Method for growing tin-doped n-type epitaxial gallium arsenide from the liquid state | |
| GB1000970A (en) | Method of treating semiconductor materials | |
| US4299650A (en) | Minimization of strain in single crystals | |
| US3963540A (en) | Heat treatment of mercury cadmium telluride | |
| GB803830A (en) | Semiconductor comprising silicon and method of making it | |
| US3660312A (en) | Method of making doped group iii-v compound semiconductor material | |
| JPH0244798B2 (en:Method) | ||
| GB832248A (en) | Improvements in or relating to methods of treating single crystal silicon bodies | |
| ES270156A1 (es) | Metodo para ajustar una presiën de vapor de una sustancia en un espacio | |
| US3162526A (en) | Method of doping semiconductor materials | |
| GB727447A (en) | Formation of p-n junctions | |
| GB813841A (en) | Improvements in or relating to processes for producing zones having different impurity contents in semi-conductor crystals | |
| GB846720A (en) | Transistor crystals | |
| KR101865467B1 (ko) | 단결정성 실리콘 잉곳 및 웨이퍼를 형성하기 위한 방법 | |
| US3795547A (en) | Method of improving electrical characteristics of high purity germanium or silicon | |
| US3756955A (en) | S in gadoped with silicon or germanium method of producing a gallium arsenide crystal from a solution of gaa | |
| US2988464A (en) | Method of making transistor having thin base region | |
| GB1087268A (en) | A method of producing an homogeneous monocrystal | |
| JPH08188499A (ja) | GaAs単結晶の製造方法 | |
| US3168423A (en) | Method of producing monocrystalline wafers from the vaporous phase with alternative cooling and intermediate holding steps |