GB0905571D0 - Method and apparatus for producing three dimensional nano and micro scale structures - Google Patents

Method and apparatus for producing three dimensional nano and micro scale structures

Info

Publication number
GB0905571D0
GB0905571D0 GBGB0905571.6A GB0905571A GB0905571D0 GB 0905571 D0 GB0905571 D0 GB 0905571D0 GB 0905571 A GB0905571 A GB 0905571A GB 0905571 D0 GB0905571 D0 GB 0905571D0
Authority
GB
United Kingdom
Prior art keywords
producing
dimensional nano
scale structures
micro scale
micro
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB0905571.6A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SEC DEP FOR INNOVATION UNIVERS
University of Surrey
Original Assignee
SEC DEP FOR INNOVATION UNIVERS
University of Surrey
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SEC DEP FOR INNOVATION UNIVERS, University of Surrey filed Critical SEC DEP FOR INNOVATION UNIVERS
Priority to GBGB0905571.6A priority Critical patent/GB0905571D0/en
Publication of GB0905571D0 publication Critical patent/GB0905571D0/en
Priority to US13/260,430 priority patent/US20120067718A1/en
Priority to PCT/GB2010/000599 priority patent/WO2010112827A2/en
Priority to EP10725231.4A priority patent/EP2415066B1/en
Priority to JP2012502763A priority patent/JP5647220B2/ja
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/286—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2583—Tubes for localised analysis using electron or ion beams characterised by their application using tunnel effects, e.g. STM, AFM
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H01J2237/30483—Scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3114—Machining
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Sampling And Sample Adjustment (AREA)
GBGB0905571.6A 2009-03-31 2009-03-31 Method and apparatus for producing three dimensional nano and micro scale structures Ceased GB0905571D0 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
GBGB0905571.6A GB0905571D0 (en) 2009-03-31 2009-03-31 Method and apparatus for producing three dimensional nano and micro scale structures
US13/260,430 US20120067718A1 (en) 2009-03-31 2010-03-29 Method and apparatus for producing three dimensional nano and micro scale structures
PCT/GB2010/000599 WO2010112827A2 (en) 2009-03-31 2010-03-29 Method and apparatus for producing three dimensional nano and micro scale structures
EP10725231.4A EP2415066B1 (en) 2009-03-31 2010-03-29 Method and apparatus for producing three dimensional nano and micro scale structures
JP2012502763A JP5647220B2 (ja) 2009-03-31 2010-03-29 マイクロ及びナノスケールの３次元構造の製造方法並びに製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0905571.6A GB0905571D0 (en) 2009-03-31 2009-03-31 Method and apparatus for producing three dimensional nano and micro scale structures

Publications (1)

Publication Number Publication Date
GB0905571D0 true GB0905571D0 (en) 2009-05-13

Family

ID=40672060

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB0905571.6A Ceased GB0905571D0 (en) 2009-03-31 2009-03-31 Method and apparatus for producing three dimensional nano and micro scale structures

Country Status (5)

Country Link
US (1) US20120067718A1 (enExample)
EP (1) EP2415066B1 (enExample)
JP (1) JP5647220B2 (enExample)
GB (1) GB0905571D0 (enExample)
WO (1) WO2010112827A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8618518B2 (en) 2011-03-15 2013-12-31 Avago Technologies General Ip (Singapore) Pte. Ltd. Apparatus and method for forming a solid immersion lens using a binary bitmap milling pattern
US8937019B2 (en) 2012-04-03 2015-01-20 Varian Semiconductor Equipment Associates, Inc. Techniques for generating three dimensional structures
US10465293B2 (en) * 2012-08-31 2019-11-05 Fei Company Dose-based end-pointing for low-kV FIB milling TEM sample preparation
US9932664B2 (en) 2012-11-06 2018-04-03 Purdue Research Foundation Methods for directed irradiation synthesis with ion and thermal beams
CN105264635B (zh) * 2012-12-31 2018-11-20 Fei 公司 用于利用带电粒子束的倾斜或掠射研磨操作的基准设计
US9057670B2 (en) * 2013-05-30 2015-06-16 International Business Machines Corporation Transmission electron microscope sample fabrication
US11004656B2 (en) 2014-10-15 2021-05-11 Gatan, Inc. Methods and apparatus for determining, using, and indicating ion beam working properties

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09283496A (ja) * 1996-04-18 1997-10-31 Hitachi Ltd 荷電粒子ビーム照射によるパターン形成方法及びその装置
US7072267B2 (en) * 2001-11-26 2006-07-04 William Monford Wood Image and data storage by focused ion beam recordation and method thereof
JP4304947B2 (ja) * 2002-09-26 2009-07-29 株式会社日立製作所 磁気記録媒体とそれを用いた磁気メモリ装置、磁気記録方法、信号再生方法
JP2004226079A (ja) * 2003-01-20 2004-08-12 Seiko Instruments Inc 表面あるいは断面加工観察方法及びその装置
KR100709514B1 (ko) * 2003-02-28 2007-04-20 도쿠리쓰교세이호징 가가쿠 기주쓰 신코 기코 Ｆｉｂ-ｃｖｄ에 의한 3차원 마이크로 구조물 제조 방법 및3차원 마이크로 구조물의 묘화 시스템
US6838683B1 (en) * 2003-06-18 2005-01-04 Intel Corporation Focused ion beam microlathe
JP2005177878A (ja) * 2003-12-16 2005-07-07 Masao Murakawa 微細３次元凸形状体の作成方法
US7254884B2 (en) * 2004-09-20 2007-08-14 Hitachi Global Storage Technologies Netherlands B.V. Method for fabricating a pole tip in a magnetic transducer using feed-forward and feedback
KR20070093053A (ko) * 2004-11-15 2007-09-17 크레던스 시스템스 코포레이션 집속 이온 빔 데이터 분석에 관한 시스템 및 방법
US7427753B2 (en) * 2005-06-16 2008-09-23 Applied Materials, Israel, Ltd. Method of cross-section milling with focused ion beam (FIB) device
JP2007069329A (ja) * 2005-09-08 2007-03-22 Japan Science & Technology Agency 微小立体構造操作具の作製方法及びそれによって作製される微小立体構造操作具
JP4676339B2 (ja) * 2006-01-10 2011-04-27 株式会社日立ハイテクノロジーズ 荷電ビーム装置及び試料作製・観察方法
GB2438241A (en) 2006-05-16 2007-11-21 Secretary Trade Ind Brit Machining of microstructures
JP4388101B2 (ja) * 2007-06-19 2009-12-24 株式会社日立ハイテクノロジーズ 荷電粒子線加工装置
JP2008270072A (ja) * 2007-04-24 2008-11-06 Sii Nanotechnology Inc 荷電粒子ビーム装置

Also Published As

Publication number Publication date
WO2010112827A3 (en) 2010-12-02
US20120067718A1 (en) 2012-03-22
JP5647220B2 (ja) 2014-12-24
EP2415066A2 (en) 2012-02-08
JP2012522346A (ja) 2012-09-20
EP2415066B1 (en) 2013-08-21
WO2010112827A2 (en) 2010-10-07

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Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)