GB0427418D0 - Heat-treating methods and systems - Google Patents
Heat-treating methods and systemsInfo
- Publication number
- GB0427418D0 GB0427418D0 GBGB0427418.9A GB0427418A GB0427418D0 GB 0427418 D0 GB0427418 D0 GB 0427418D0 GB 0427418 A GB0427418 A GB 0427418A GB 0427418 D0 GB0427418 D0 GB 0427418D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- systems
- heat
- treating methods
- treating
- methods
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/12—Heating of the reaction chamber
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
- F27B17/0025—Especially adapted for treating semiconductor wafers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D19/00—Arrangements of controlling devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
- H01L21/2686—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation using incoherent radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D19/00—Arrangements of controlling devices
- F27D2019/0003—Monitoring the temperature or a characteristic of the charge and using it as a controlling value
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
- F27D99/0001—Heating elements or systems
- F27D99/0006—Electric heating elements or system
- F27D2099/0026—Electric heating elements or system with a generator of electromagnetic radiations
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- High Energy & Nuclear Physics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Furnace Details (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/729,747 US6594446B2 (en) | 2000-12-04 | 2000-12-04 | Heat-treating methods and systems |
PCT/CA2001/000776 WO2002047143A1 (en) | 2000-12-04 | 2001-05-30 | Heat-treating methods and systems |
GB0312620A GB2387273B (en) | 2000-12-04 | 2001-12-04 | Heat-treating methods and systems |
Publications (3)
Publication Number | Publication Date |
---|---|
GB0427418D0 true GB0427418D0 (en) | 2005-01-19 |
GB2406710A GB2406710A (en) | 2005-04-06 |
GB2406710B GB2406710B (en) | 2005-06-22 |
Family
ID=34276804
Family Applications (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0427414A Ceased GB2406709A (en) | 2000-12-04 | 2001-12-04 | Heat-treating methods and systems |
GB0427423A Expired - Fee Related GB2406711B (en) | 2000-12-04 | 2001-12-04 | Heat-treating methods and systems |
GB0427426A Withdrawn GB2406725A (en) | 2000-12-04 | 2001-12-04 | Heat-treating methods and systems |
GB0427418A Expired - Fee Related GB2406710B (en) | 2000-12-04 | 2001-12-04 | Heat-treating methods and systems |
GB0427424A Withdrawn GB2406712A (en) | 2000-12-04 | 2001-12-04 | Heat-treating methods and systems |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0427414A Ceased GB2406709A (en) | 2000-12-04 | 2001-12-04 | Heat-treating methods and systems |
GB0427423A Expired - Fee Related GB2406711B (en) | 2000-12-04 | 2001-12-04 | Heat-treating methods and systems |
GB0427426A Withdrawn GB2406725A (en) | 2000-12-04 | 2001-12-04 | Heat-treating methods and systems |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0427424A Withdrawn GB2406712A (en) | 2000-12-04 | 2001-12-04 | Heat-treating methods and systems |
Country Status (1)
Country | Link |
---|---|
GB (5) | GB2406709A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7781947B2 (en) | 2004-02-12 | 2010-08-24 | Mattson Technology Canada, Inc. | Apparatus and methods for producing electromagnetic radiation |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4325006A (en) * | 1979-08-01 | 1982-04-13 | Jersey Nuclear-Avco Isotopes, Inc. | High pulse repetition rate coaxial flashlamp |
JPS5870536A (en) * | 1981-10-22 | 1983-04-27 | Fujitsu Ltd | Laser annealing method |
JPS58106836A (en) * | 1981-12-18 | 1983-06-25 | Hitachi Ltd | Laser annealing device |
EP0105230A3 (en) * | 1982-09-30 | 1986-01-15 | General Electric Company | Triggering and cooling apparatus for laser flashlamps |
JPS59211221A (en) * | 1983-05-17 | 1984-11-30 | Nippon Denso Co Ltd | Heat treatment of ion implanted semiconductor |
GB2199693B (en) * | 1986-12-02 | 1990-08-15 | Noblelight Ltd | Improvements in and relating to flash lamps |
JP2605090B2 (en) * | 1988-03-28 | 1997-04-30 | 東京エレクトロン株式会社 | Beam annealing equipment |
EP0608503B1 (en) * | 1989-02-14 | 1997-05-28 | Seiko Epson Corporation | A semiconductor device and its manufacturing method |
JP3190653B2 (en) * | 1989-05-09 | 2001-07-23 | ソニー株式会社 | Annealing method and annealing device |
JPH04355911A (en) * | 1991-03-27 | 1992-12-09 | Fujitsu Ltd | Manufacturing device for semiconductor device |
JP3466633B2 (en) * | 1991-06-12 | 2003-11-17 | ソニー株式会社 | Annealing method for polycrystalline semiconductor layer |
US5387557A (en) * | 1991-10-23 | 1995-02-07 | F. T. L. Co., Ltd. | Method for manufacturing semiconductor devices using heat-treatment vertical reactor with temperature zones |
JPH07245274A (en) * | 1994-03-02 | 1995-09-19 | Tokyo Electron Ltd | Heat treatment device |
US5561735A (en) * | 1994-08-30 | 1996-10-01 | Vortek Industries Ltd. | Rapid thermal processing apparatus and method |
JP3440579B2 (en) * | 1994-10-05 | 2003-08-25 | ソニー株式会社 | Heat treatment method |
WO1997001863A1 (en) * | 1995-06-26 | 1997-01-16 | Seiko Epson Corporation | Method of formation of crystalline semiconductor film, method of production of thin-film transistor, method of production of solar cell, and active matrix type liquid crystal device |
US5777437A (en) * | 1996-07-01 | 1998-07-07 | Lumenx Technologies Inc. | Annular chamber flashlamp including a surrounding, packed powder reflective material |
CN1130756C (en) * | 1998-02-13 | 2003-12-10 | 精工爱普生株式会社 | Method for producing semiconductor device and heat treating apparatus |
-
2001
- 2001-12-04 GB GB0427414A patent/GB2406709A/en not_active Ceased
- 2001-12-04 GB GB0427423A patent/GB2406711B/en not_active Expired - Fee Related
- 2001-12-04 GB GB0427426A patent/GB2406725A/en not_active Withdrawn
- 2001-12-04 GB GB0427418A patent/GB2406710B/en not_active Expired - Fee Related
- 2001-12-04 GB GB0427424A patent/GB2406712A/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
GB0427423D0 (en) | 2005-01-19 |
GB2406711A (en) | 2005-04-06 |
GB2406725A (en) | 2005-04-06 |
GB0427426D0 (en) | 2005-01-19 |
GB2406711B (en) | 2005-06-08 |
GB2406710A (en) | 2005-04-06 |
GB2406712A (en) | 2005-04-06 |
GB2406710B (en) | 2005-06-22 |
GB2406709A (en) | 2005-04-06 |
GB0427424D0 (en) | 2005-01-19 |
GB0427414D0 (en) | 2005-01-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU2001267174A1 (en) | Heat-treating methods and systems | |
GB0028079D0 (en) | System and method | |
GB0006721D0 (en) | Assessment methods and systems | |
EP1368909A4 (en) | Location system and methods | |
EG23122A (en) | Pyrrolcarboxamides and pyrrolcarbothioamides | |
AU9667901A (en) | Mycoattractants and mycopesticides | |
GB0022736D0 (en) | Optimization method and system | |
GB2368951B (en) | Authentication methods and systems | |
GB2376073B (en) | Fluid-gauging systems and methods | |
GB2352523B (en) | Fluid-gauging systems and methods | |
IL160392A0 (en) | Vcd-on-demand system and method | |
GB2387273B (en) | Heat-treating methods and systems | |
GB0106604D0 (en) | Comminications system and method | |
EP1187347A4 (en) | Receiving device and receiving method | |
GB0019500D0 (en) | System and method | |
GB0014643D0 (en) | Methods and assemblies | |
GB0019067D0 (en) | Telecommunications systems and methods | |
GB2406711B (en) | Heat-treating methods and systems | |
GB0013007D0 (en) | Characterization system and method | |
GB0019068D0 (en) | Telecommunications systems and methods | |
AU5018101A (en) | Microlicensing system and method | |
PL340162A1 (en) | Ureametric method and system | |
GB0028694D0 (en) | System and method | |
GB0018863D0 (en) | Telecommunications systems and methods | |
HU0002418D0 (en) | Motor-sprayer with diving-pump and system |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20051204 |