GB0415891D0 - Nanoscale fet - Google Patents

Nanoscale fet

Info

Publication number
GB0415891D0
GB0415891D0 GBGB0415891.1A GB0415891A GB0415891D0 GB 0415891 D0 GB0415891 D0 GB 0415891D0 GB 0415891 A GB0415891 A GB 0415891A GB 0415891 D0 GB0415891 D0 GB 0415891D0
Authority
GB
United Kingdom
Prior art keywords
source
channel region
drain
region
regions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB0415891.1A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Priority to GBGB0415891.1A priority Critical patent/GB0415891D0/en
Publication of GB0415891D0 publication Critical patent/GB0415891D0/en
Priority to PCT/IB2005/052313 priority patent/WO2006008703A2/en
Priority to AT05759916T priority patent/ATE524831T1/de
Priority to CNB2005800239721A priority patent/CN100521237C/zh
Priority to JP2007520958A priority patent/JP2008507127A/ja
Priority to US11/632,738 priority patent/US7838368B2/en
Priority to EP05759916A priority patent/EP1771888B1/en
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/30Devices controlled by electric currents or voltages
    • H10D48/32Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H10D48/36Unipolar devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/117Shapes of semiconductor bodies
    • H10D62/118Nanostructure semiconductor bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/117Shapes of semiconductor bodies
    • H10D62/118Nanostructure semiconductor bodies
    • H10D62/119Nanowire, nanosheet or nanotube semiconductor bodies
    • H10D62/121Nanowire, nanosheet or nanotube semiconductor bodies oriented parallel to substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/85Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/962Quantum dots and lines
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/762Nanowire or quantum wire, i.e. axially elongated structure having two dimensions of 100 nm or less
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/813Of specified inorganic semiconductor composition, e.g. periodic table group IV-VI compositions
    • Y10S977/815Group III-V based compounds, e.g. AlaGabIncNxPyAsz
    • Y10S977/818III-P based compounds, e.g. AlxGayIn2P
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/902Specified use of nanostructure
    • Y10S977/932Specified use of nanostructure for electronic or optoelectronic application
    • Y10S977/936Specified use of nanostructure for electronic or optoelectronic application in a transistor or 3-terminal device
    • Y10S977/938Field effect transistors, FETS, with nanowire- or nanotube-channel region

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Film Transistor (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Element Separation (AREA)
GBGB0415891.1A 2004-07-16 2004-07-16 Nanoscale fet Ceased GB0415891D0 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GBGB0415891.1A GB0415891D0 (en) 2004-07-16 2004-07-16 Nanoscale fet
PCT/IB2005/052313 WO2006008703A2 (en) 2004-07-16 2005-07-12 Nanoscale fet
AT05759916T ATE524831T1 (de) 2004-07-16 2005-07-12 Nanoskaliger inp fet
CNB2005800239721A CN100521237C (zh) 2004-07-16 2005-07-12 纳米尺度fet
JP2007520958A JP2008507127A (ja) 2004-07-16 2005-07-12 ナノスケールfet
US11/632,738 US7838368B2 (en) 2004-07-16 2005-07-12 Nanoscale fet
EP05759916A EP1771888B1 (en) 2004-07-16 2005-07-12 NANOSCALE InP FET

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0415891.1A GB0415891D0 (en) 2004-07-16 2004-07-16 Nanoscale fet

Publications (1)

Publication Number Publication Date
GB0415891D0 true GB0415891D0 (en) 2004-08-18

Family

ID=32893646

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB0415891.1A Ceased GB0415891D0 (en) 2004-07-16 2004-07-16 Nanoscale fet

Country Status (7)

Country Link
US (1) US7838368B2 (https=)
EP (1) EP1771888B1 (https=)
JP (1) JP2008507127A (https=)
CN (1) CN100521237C (https=)
AT (1) ATE524831T1 (https=)
GB (1) GB0415891D0 (https=)
WO (1) WO2006008703A2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7858918B2 (en) * 2007-02-05 2010-12-28 Ludwig Lester F Molecular transistor circuits compatible with carbon nanotube sensors and transducers
US7838809B2 (en) 2007-02-17 2010-11-23 Ludwig Lester F Nanoelectronic differential amplifiers and related circuits having carbon nanotubes, graphene nanoribbons, or other related materials
US8389387B2 (en) * 2009-01-06 2013-03-05 Brookhaven Science Associates, Llc Segmented nanowires displaying locally controllable properties
US8890115B2 (en) * 2009-01-06 2014-11-18 Brookhaven Science Associates, Llc Stable and metastable nanowires displaying locally controllable properties
DE112011106006B4 (de) * 2011-12-23 2021-01-14 Intel Corp. Nanodrahtstrukturen mit Rundumkontakten und zugehöriges Herstellungsverfahren
EP2741337B1 (en) * 2012-12-07 2018-04-11 IMEC vzw Semiconductor heterostructure field effect transistor and method for making thereof
WO2014179340A2 (en) * 2013-04-29 2014-11-06 The University Of North Carolina At Chapel Hill Methods and systems for chemically encoding high-resolution shapes in silicon nanowires
US9741811B2 (en) 2014-12-15 2017-08-22 Samsung Electronics Co., Ltd. Integrated circuit devices including source/drain extension regions and methods of forming the same
CN105990413B (zh) 2015-02-06 2020-11-17 联华电子股份有限公司 具有纳米线结构的半导体结构与制造方法
CN105789442B (zh) * 2016-05-23 2018-12-18 京东方科技集团股份有限公司 一种薄膜晶体管、其制作方法及相应装置
US11004985B2 (en) * 2016-05-30 2021-05-11 Samsung Electronics Co., Ltd. Semiconductor device having multi-thickness nanowire
CN119545838B (zh) * 2024-11-26 2025-09-16 北京智芯微电子科技有限公司 环栅场效应晶体管及其制备方法、芯片和电子设备

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6798000B2 (en) * 2000-07-04 2004-09-28 Infineon Technologies Ag Field effect transistor
GB2382718B (en) * 2000-07-18 2004-03-24 Lg Electronics Inc Field effect transistor using horizontally grown carbon nanotubes
GB2364933B (en) * 2000-07-18 2002-12-31 Lg Electronics Inc Method of horizontally growing carbon nanotubes
CA2442985C (en) * 2001-03-30 2016-05-31 The Regents Of The University Of California Methods of fabricating nanostructures and nanowires and devices fabricated therefrom
US20050161659A1 (en) * 2002-03-28 2005-07-28 Yanmar Agricultural Equiptment Co. Nanowire and electronic device
US7115916B2 (en) * 2002-09-26 2006-10-03 International Business Machines Corporation System and method for molecular optical emission
JP5226174B2 (ja) * 2002-11-05 2013-07-03 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ ナノ構造体、そのようなナノ構造体を有する電子機器およびナノ構造体を調製する方法
US7180107B2 (en) * 2004-05-25 2007-02-20 International Business Machines Corporation Method of fabricating a tunneling nanotube field effect transistor

Also Published As

Publication number Publication date
JP2008507127A (ja) 2008-03-06
CN100521237C (zh) 2009-07-29
WO2006008703A3 (en) 2006-06-22
CN1985378A (zh) 2007-06-20
ATE524831T1 (de) 2011-09-15
US7838368B2 (en) 2010-11-23
EP1771888A2 (en) 2007-04-11
US20070262397A1 (en) 2007-11-15
WO2006008703A2 (en) 2006-01-26
EP1771888B1 (en) 2011-09-14

Similar Documents

Publication Publication Date Title
TW200501420A (en) Double-gate transistor with enhanced carrier mobility
GB0415891D0 (en) Nanoscale fet
TW200633212A (en) Semiconductor device including field-effect transistor
TW200739905A (en) Nanowire tunneling transistor
EP2887402A3 (en) Iii-nitride bidirectional switches
EP2367205A3 (en) Vertical junction field effect transistors and methods of producing the same
DE602006013456D1 (de) Transistor mit verbessertem spitzenprofil und herstellungsverfahren dafür
TW200501411A (en) Structure and method for forming the gate electrode in a multiple-gate transistor
TW200504359A (en) Single-electron transistor, field-effect transistor, sensor, method for producing sensor, and sensing method
EP1411554A4 (en) FIELD EFFECT TRANSISTOR COMPRISING A CHANNEL CONSISTING OF CARBON NANOTUBES
SG10201408141WA (en) Floating body field-effect transistors, and methods of forming floating body field-effect transistors
ATE527686T1 (de) Prozess für soi-einrichtungen mit ultradünnem körper, die epi-siliziumspitzen enthalten, und dadurch hergestellte artikel
WO2009018395A3 (en) Self-aligned t-gate carbon nanotube field effect transistor devices and method for forming the same
TW200644240A (en) Self-aligned process for nanotube/nanowire FETs
TW200637000A (en) High electron mobility transistor
EP1521298A3 (en) Method of making a high-voltage field-effect transistor
ATE531081T1 (de) Transistoren auf nirtridbasis mit seitlich aufgewachsener aktivregion und herstellungsverfahren dafür
TW200625602A (en) Independently accessed double-gate and tri-gate transistors in same process flow
EP2083449A3 (en) Device for Controlling Electrical Conduction Across a Semiconductor Body
EP1764838A3 (en) Spin transistor using spin-orbit coupling induced magnetic field
Garg et al. Improving the scalability of SOI-based tunnel FETs using ground plane in buried oxide
WO2005093841A3 (en) Trench insulated gate field effect transistor
GB2453495A (en) A transistor having a strained channel region including a performance enhancing material composition
WO2002078090A3 (en) Field-effect transistor structure and method of manufacture
TW200723530A (en) Carbon nano tube field effect transistor

Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)