GB0001959D0 - Photoresist composition having excellent resistance to post exposure delay effect - Google Patents
Photoresist composition having excellent resistance to post exposure delay effectInfo
- Publication number
- GB0001959D0 GB0001959D0 GB0001959A GB0001959A GB0001959D0 GB 0001959 D0 GB0001959 D0 GB 0001959D0 GB 0001959 A GB0001959 A GB 0001959A GB 0001959 A GB0001959 A GB 0001959A GB 0001959 D0 GB0001959 D0 GB 0001959D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- photoresist composition
- excellent resistance
- post exposure
- delay effect
- exposure delay
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990005604A KR20000056355A (en) | 1999-02-19 | 1999-02-19 | Photoresist composition having superior characteristics in the presence of high concentration of amine |
Publications (2)
Publication Number | Publication Date |
---|---|
GB0001959D0 true GB0001959D0 (en) | 2000-03-22 |
GB2347429A GB2347429A (en) | 2000-09-06 |
Family
ID=19574624
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0001959A Withdrawn GB2347429A (en) | 1999-02-19 | 2000-01-28 | Photoresist in a non-Newtonian solvent |
Country Status (8)
Country | Link |
---|---|
JP (1) | JP2000241964A (en) |
KR (1) | KR20000056355A (en) |
CN (1) | CN1264060A (en) |
DE (1) | DE10007429A1 (en) |
FR (1) | FR2790114A1 (en) |
GB (1) | GB2347429A (en) |
IT (1) | IT1319833B1 (en) |
NL (1) | NL1014417C2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100583095B1 (en) * | 2000-06-30 | 2006-05-24 | 주식회사 하이닉스반도체 | Photoresist composition containing photo radical generator with photo acid generator |
TWI366067B (en) | 2003-09-10 | 2012-06-11 | Fujifilm Corp | Photosensitive composition and pattern forming method using the same |
KR100713237B1 (en) * | 2005-12-26 | 2007-05-02 | 제일모직주식회사 | Hardmask composition coated under photoresist having good stock stability |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2320717A (en) * | 1940-04-13 | 1943-06-01 | Pennsylvania Ind Chemical Corp | Terpene coating |
US2320718A (en) * | 1940-04-13 | 1943-06-01 | Pennsylvania Ind Chemical Corp | Rubber compound |
JP3139088B2 (en) * | 1991-04-26 | 2001-02-26 | 住友化学工業株式会社 | Positive resist composition |
TW304235B (en) * | 1992-04-29 | 1997-05-01 | Ocg Microelectronic Materials | |
KR950012148A (en) * | 1993-10-28 | 1995-05-16 | 미우라 아끼라 | Photoresist composition |
JP2715881B2 (en) * | 1993-12-28 | 1998-02-18 | 日本電気株式会社 | Photosensitive resin composition and pattern forming method |
US5879857A (en) * | 1997-02-21 | 1999-03-09 | Lucent Technologies Inc. | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
US5843624A (en) * | 1996-03-08 | 1998-12-01 | Lucent Technologies Inc. | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
KR100265597B1 (en) * | 1996-12-30 | 2000-09-15 | 김영환 | Arf photosensitive resin and manufacturing method thereof |
KR100220953B1 (en) * | 1996-12-31 | 1999-10-01 | 김영환 | Arf photoresist substituted with amide or imide |
US5876897A (en) * | 1997-03-07 | 1999-03-02 | Clariant Finance (Bvi) Limited | Positive photoresists containing novel photoactive compounds |
JP3819531B2 (en) * | 1997-05-20 | 2006-09-13 | 富士通株式会社 | Resist composition and resist pattern forming method |
KR100557368B1 (en) * | 1998-01-16 | 2006-03-10 | 제이에스알 가부시끼가이샤 | Radiation Sensitive Resin Composition |
KR19990081722A (en) * | 1998-04-30 | 1999-11-15 | 김영환 | Carboxyl group-containing alicyclic derivatives and preparation method thereof |
KR100376983B1 (en) * | 1998-04-30 | 2003-08-02 | 주식회사 하이닉스반도체 | Photoresist polymer and method for forming micropattern by using the same |
KR100376984B1 (en) * | 1998-04-30 | 2003-07-16 | 주식회사 하이닉스반도체 | Photoresist polymer and method for forming micropattern by using the same |
KR100419028B1 (en) * | 1998-05-13 | 2004-07-19 | 주식회사 하이닉스반도체 | Oxabicyclo compounds useful as photoreactive monomer of photoresist polymer, preparation method thereof, photoresist polymer containing the same, and method for preparing photoresist micro-pattern using the same |
KR100271420B1 (en) * | 1998-09-23 | 2001-03-02 | 박찬구 | Chemically Amplified Positive Photoresist Composition |
KR100274119B1 (en) * | 1998-10-08 | 2001-03-02 | 박찬구 | Polymer for preparing radiation-sensitive resist and resist composition containing same |
-
1999
- 1999-02-19 KR KR1019990005604A patent/KR20000056355A/en not_active Application Discontinuation
-
2000
- 2000-01-28 GB GB0001959A patent/GB2347429A/en not_active Withdrawn
- 2000-02-01 JP JP2000024182A patent/JP2000241964A/en active Pending
- 2000-02-11 IT IT2000TO000137 patent/IT1319833B1/en active
- 2000-02-17 CN CN 00102769 patent/CN1264060A/en active Pending
- 2000-02-18 FR FR0002044A patent/FR2790114A1/en active Pending
- 2000-02-18 NL NL1014417A patent/NL1014417C2/en not_active IP Right Cessation
- 2000-02-18 DE DE2000107429 patent/DE10007429A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
NL1014417C2 (en) | 2001-11-13 |
FR2790114A1 (en) | 2000-08-25 |
ITTO20000137A1 (en) | 2001-08-11 |
NL1014417A1 (en) | 2000-08-22 |
IT1319833B1 (en) | 2003-11-03 |
DE10007429A1 (en) | 2000-11-23 |
JP2000241964A (en) | 2000-09-08 |
KR20000056355A (en) | 2000-09-15 |
CN1264060A (en) | 2000-08-23 |
GB2347429A (en) | 2000-09-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |