FR3091021B1 - Thyristor vertical - Google Patents

Thyristor vertical Download PDF

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Publication number
FR3091021B1
FR3091021B1 FR1873566A FR1873566A FR3091021B1 FR 3091021 B1 FR3091021 B1 FR 3091021B1 FR 1873566 A FR1873566 A FR 1873566A FR 1873566 A FR1873566 A FR 1873566A FR 3091021 B1 FR3091021 B1 FR 3091021B1
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FR
France
Prior art keywords
thyristor
region
vertical
vertical thyristor
trigger
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1873566A
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English (en)
Other versions
FR3091021A1 (fr
Inventor
Samuel Menard
Lionel Jaouen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics Tours SAS
Original Assignee
STMicroelectronics Tours SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics Tours SAS filed Critical STMicroelectronics Tours SAS
Priority to FR1873566A priority Critical patent/FR3091021B1/fr
Priority to US16/706,201 priority patent/US11362204B2/en
Priority to CN201911319805.1A priority patent/CN111354781B/zh
Priority to CN201922298435.XU priority patent/CN211929493U/zh
Publication of FR3091021A1 publication Critical patent/FR3091021A1/fr
Application granted granted Critical
Publication of FR3091021B1 publication Critical patent/FR3091021B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/74Thyristor-type devices, e.g. having four-zone regenerative action
    • H01L29/749Thyristor-type devices, e.g. having four-zone regenerative action with turn-on by field effect
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/083Anode or cathode regions of thyristors or gated bipolar-mode devices
    • H01L29/0834Anode regions of thyristors or gated bipolar-mode devices, e.g. supplementary regions surrounding anode regions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0684Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
    • H01L29/0692Surface layout
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/083Anode or cathode regions of thyristors or gated bipolar-mode devices
    • H01L29/0839Cathode regions of thyristors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1012Base regions of thyristors
    • H01L29/102Cathode base regions of thyristors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42308Gate electrodes for thyristors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/74Thyristor-type devices, e.g. having four-zone regenerative action

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Thyristors (AREA)

Abstract

Thyristor vertical La présente description concerne un thyristor (200) comprenant un empilement vertical de première (101), deuxième (103), troisième (105) et quatrième (107) régions semiconductrices de types de conductivité alternés, dans lequel la quatrième région (107) est interrompue dans une zone de gâchette (115) du thyristor, et dans un couloir continu (201) s'étendant depuis ladite zone de gâchette en direction d'un bord latéral de la quatrième région. Figure pour l'abrégé : Fig. 4
FR1873566A 2018-12-20 2018-12-20 Thyristor vertical Active FR3091021B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR1873566A FR3091021B1 (fr) 2018-12-20 2018-12-20 Thyristor vertical
US16/706,201 US11362204B2 (en) 2018-12-20 2019-12-06 Vertical thyristor
CN201911319805.1A CN111354781B (zh) 2018-12-20 2019-12-19 垂直晶闸管
CN201922298435.XU CN211929493U (zh) 2018-12-20 2019-12-19 晶闸管

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1873566A FR3091021B1 (fr) 2018-12-20 2018-12-20 Thyristor vertical

Publications (2)

Publication Number Publication Date
FR3091021A1 FR3091021A1 (fr) 2020-06-26
FR3091021B1 true FR3091021B1 (fr) 2021-01-08

Family

ID=66286519

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1873566A Active FR3091021B1 (fr) 2018-12-20 2018-12-20 Thyristor vertical

Country Status (3)

Country Link
US (1) US11362204B2 (fr)
CN (2) CN211929493U (fr)
FR (1) FR3091021B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3091021B1 (fr) * 2018-12-20 2021-01-08 St Microelectronics Tours Sas Thyristor vertical

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2254880B1 (fr) * 1973-12-12 1978-11-10 Alsthom Cgee
US4180416A (en) * 1978-09-27 1979-12-25 International Business Machines Corporation Thermal migration-porous silicon technique for forming deep dielectric isolation
FR2516704B1 (fr) * 1981-11-13 1985-09-06 Thomson Csf Thyristor a faible courant de gachette immunise par rapport aux declenchements
FR2697674B1 (fr) * 1992-10-29 1995-01-13 Sgs Thomson Microelectronics Thyristor et assemblage de thyristors à cathode commune.
JP3850054B2 (ja) * 1995-07-19 2006-11-29 三菱電機株式会社 半導体装置
US6693310B1 (en) * 1995-07-19 2004-02-17 Mitsubishi Denki Kabushiki Kaisha Semiconductor device and manufacturing method thereof
FR2818806B1 (fr) * 2000-12-21 2003-03-21 St Microelectronics Sa Commutateur electronique bidirectionnel bistable a commande par implusions
JP4618629B2 (ja) * 2004-04-21 2011-01-26 三菱電機株式会社 誘電体分離型半導体装置
EP1746661A1 (fr) * 2005-07-22 2007-01-24 ABB Technology AG Dispositif semi-conducteur de puissance
DE102006001252B4 (de) * 2006-01-10 2012-01-26 Infineon Technologies Ag Bipolares Leistungshalbleiterbauelement mit einem p-Emitter und höher dotierten Zonen in dem p-Emitter und Herstellungsverfahren
US7531888B2 (en) * 2006-11-30 2009-05-12 Fairchild Semiconductor Corporation Integrated latch-up free insulated gate bipolar transistor
US7956418B2 (en) * 2007-05-29 2011-06-07 Mediatek Inc. ESD protection devices
US8815654B2 (en) * 2007-06-14 2014-08-26 International Business Machines Corporation Vertical current controlled silicon on insulator (SOI) device such as a silicon controlled rectifier and method of forming vertical SOI current controlled devices
DE102007057728B4 (de) * 2007-11-30 2014-04-30 Infineon Technologies Ag Verfahren zur Herstellung eines Halbleiterbauelements mit einer Kurzschlusstruktur
US10566462B2 (en) * 2009-07-30 2020-02-18 Infineon Technologies Austria Ag Bipolar semiconductor device and manufacturing method
US8120074B2 (en) * 2009-10-29 2012-02-21 Infineon Technologies Austria Ag Bipolar semiconductor device and manufacturing method
US8120108B2 (en) * 2010-01-27 2012-02-21 Texas Instruments Incorporated High voltage SCRMOS in BiCMOS process technologies
FR2974447A1 (fr) * 2011-04-22 2012-10-26 St Microelectronics Tours Sas Structure d'amorcage et composant de protection comprenant une telle structure d'amorcage
US8569117B2 (en) * 2011-10-10 2013-10-29 Pakal Technologies Llc Systems and methods integrating trench-gated thyristor with trench-gated rectifier
JP6053415B2 (ja) * 2012-09-19 2016-12-27 三菱電機株式会社 半導体装置
US8835975B1 (en) * 2013-05-10 2014-09-16 Ixys Corporation Ultra-fast breakover diode
FR3011124A1 (fr) * 2013-09-26 2015-03-27 St Microelectronics Tours Sas Composant scr a caracteristiques stables en temperature
US9523815B2 (en) * 2014-03-31 2016-12-20 Stmicroelectronics Sa ESD protection thyristor adapted to electro-optical devices
US20150333068A1 (en) * 2014-05-14 2015-11-19 Globalfoundries Singapore Pte. Ltd. Thyristor random access memory
US9318587B2 (en) * 2014-05-30 2016-04-19 Alpha And Omega Semiconductor Incorporated Injection control in semiconductor power devices
EP3195363B1 (fr) * 2014-09-15 2018-04-18 ABB Schweiz AG Procédé de fabrication d'un dispositif à semi-conducteurs comprenant une plaquette mince à semi-conducteurs
EP3304600B1 (fr) * 2015-05-29 2018-10-17 ABB Schweiz AG Thyristor à étalement de plasma amélioré
FR3049768B1 (fr) * 2016-03-31 2018-07-27 Stmicroelectronics (Tours) Sas Composant de puissance protege contre les surchauffes
US9741839B1 (en) * 2016-06-21 2017-08-22 Powerex, Inc. Gate structure of thyristor
FR3091021B1 (fr) * 2018-12-20 2021-01-08 St Microelectronics Tours Sas Thyristor vertical

Also Published As

Publication number Publication date
CN111354781A (zh) 2020-06-30
US11362204B2 (en) 2022-06-14
US20200203516A1 (en) 2020-06-25
FR3091021A1 (fr) 2020-06-26
CN111354781B (zh) 2024-06-21
CN211929493U (zh) 2020-11-13

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