FR3055969B1 - Methode de determination de la deflexion d'un faisceau d'electrons resultant d'un champ electrique et/ou d'un champ magnetique - Google Patents

Methode de determination de la deflexion d'un faisceau d'electrons resultant d'un champ electrique et/ou d'un champ magnetique Download PDF

Info

Publication number
FR3055969B1
FR3055969B1 FR1658594A FR1658594A FR3055969B1 FR 3055969 B1 FR3055969 B1 FR 3055969B1 FR 1658594 A FR1658594 A FR 1658594A FR 1658594 A FR1658594 A FR 1658594A FR 3055969 B1 FR3055969 B1 FR 3055969B1
Authority
FR
France
Prior art keywords
magnetic field
determination
electric field
sample
determining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1658594A
Other languages
English (en)
Other versions
FR3055969A1 (fr
Inventor
Benedikt HAAS
David Cooper
Jean Luc Rouviere
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA, Commissariat a lEnergie Atomique et aux Energies Alternatives CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR1658594A priority Critical patent/FR3055969B1/fr
Priority to FR1753992A priority patent/FR3055970B1/fr
Priority to US15/703,557 priority patent/US10593511B2/en
Publication of FR3055969A1 publication Critical patent/FR3055969A1/fr
Application granted granted Critical
Publication of FR3055969B1 publication Critical patent/FR3055969B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20058—Measuring diffraction of electrons, e.g. low energy electron diffraction [LEED] method or reflection high energy electron diffraction [RHEED] method
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/2055—Analysing diffraction patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/06—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a liquid
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
    • G01R29/08—Measuring electromagnetic field characteristics
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/266—Measurement of magnetic- or electric fields in the object; Lorentzmicroscopy
    • H01J37/268—Measurement of magnetic- or electric fields in the object; Lorentzmicroscopy with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/295—Electron or ion diffraction tubes
    • H01J37/2955—Electron or ion diffraction tubes using scanning ray
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2614—Holography or phase contrast, phase related imaging in general, e.g. phase plates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2804—Scattered primary beam
    • H01J2237/2805—Elastic scattering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

Méthode de détermination d'un champ électrique local et/ou d'un champ magnétique local dans un échantillon et/ou de la constante diélectrique d'un matériau et/ou de l'angle entre les surfaces d'entrée et de sortie de l'échantillon, comportant les étapes : - illumination de l'échantillon par un faisceau d'électrons en mode précession au moyen d'un dispositif d'illumination, - établissement d'un cliché de diffraction, - détermination du décalage du disque correspondant au faisceau transmis du au champ électrique et/ou du champ magnétique, par comparaison du cliché de diffraction et d'un cliché de diffraction de référence, - détermination d'un angle de déflexion du faisceau transmis, - détermination de la valeur du champ électrique local et/ou du champ magnétique local de l'échantillon et/ou détermination de la constante diélectrique de matériaux et/ou détermination de l'angle entre les surfaces d'entrée et de sortie de l'échantillon.
FR1658594A 2016-09-14 2016-09-14 Methode de determination de la deflexion d'un faisceau d'electrons resultant d'un champ electrique et/ou d'un champ magnetique Active FR3055969B1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR1658594A FR3055969B1 (fr) 2016-09-14 2016-09-14 Methode de determination de la deflexion d'un faisceau d'electrons resultant d'un champ electrique et/ou d'un champ magnetique
FR1753992A FR3055970B1 (fr) 2016-09-14 2017-05-05 Methode de determination de la deflexion d'un faisceau d'electrons resultant d'un champ electrique et/ou d'un champ magnetique
US15/703,557 US10593511B2 (en) 2016-09-14 2017-09-13 Method of determining the deflection of an electron beam resulting from an electric field and/or a magnetic field

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1658594 2016-09-14
FR1658594A FR3055969B1 (fr) 2016-09-14 2016-09-14 Methode de determination de la deflexion d'un faisceau d'electrons resultant d'un champ electrique et/ou d'un champ magnetique

Publications (2)

Publication Number Publication Date
FR3055969A1 FR3055969A1 (fr) 2018-03-16
FR3055969B1 true FR3055969B1 (fr) 2020-02-07

Family

ID=57960522

Family Applications (2)

Application Number Title Priority Date Filing Date
FR1658594A Active FR3055969B1 (fr) 2016-09-14 2016-09-14 Methode de determination de la deflexion d'un faisceau d'electrons resultant d'un champ electrique et/ou d'un champ magnetique
FR1753992A Active FR3055970B1 (fr) 2016-09-14 2017-05-05 Methode de determination de la deflexion d'un faisceau d'electrons resultant d'un champ electrique et/ou d'un champ magnetique

Family Applications After (1)

Application Number Title Priority Date Filing Date
FR1753992A Active FR3055970B1 (fr) 2016-09-14 2017-05-05 Methode de determination de la deflexion d'un faisceau d'electrons resultant d'un champ electrique et/ou d'un champ magnetique

Country Status (2)

Country Link
US (1) US10593511B2 (fr)
FR (2) FR3055969B1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110542700B (zh) * 2018-05-28 2022-01-28 中国科学院上海微系统与信息技术研究所 一种低能电子衍射仪
JP7193694B2 (ja) * 2018-07-26 2022-12-21 国立研究開発法人理化学研究所 電子顕微鏡およびそれを用いた試料観察方法
CN109166781A (zh) * 2018-09-11 2019-01-08 镇江乐华电子科技有限公司 扫描透射电子显微成像方法和系统
JP7083869B2 (ja) * 2020-07-20 2022-06-13 日本電子株式会社 画像処理方法および画像処理装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2351063B1 (fr) 2008-11-06 2016-01-27 Nanomegas SPRL Procédé et dispositif pour l'analyse de structure cristalline à haut rendement par la diffraction d'électrons
US8076640B2 (en) * 2009-08-27 2011-12-13 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V. Method and device for measuring electron diffraction of a sample
EP2413345B1 (fr) * 2010-07-29 2013-02-20 Carl Zeiss NTS GmbH Système d'irradiation par particules chargées
FR2965617B1 (fr) 2010-10-04 2015-08-07 Commissariat Energie Atomique Procede pour faciliter la localisation de taches de diffraction
US9274070B2 (en) 2012-03-08 2016-03-01 Appfive, Llc System and process for measuring strain in materials at high spatial resolution
EP2642279B1 (fr) * 2012-03-19 2015-07-01 Universidad de Barcelona Procédé et système pour améliorer les signaux de pic caractéristique dans la microscopie électronique analytique
FR3030043B1 (fr) 2014-12-12 2017-12-22 Commissariat Energie Atomique Procede d'etude d'une zone d'un objet pour en determiner une epaisseur massique et une composition en utilisant un faisceau d'electrons et des mesures d'intensite d'un rayonnement x

Also Published As

Publication number Publication date
US10593511B2 (en) 2020-03-17
FR3055969A1 (fr) 2018-03-16
FR3055970A1 (fr) 2018-03-16
FR3055970B1 (fr) 2020-06-26
US20180076005A1 (en) 2018-03-15

Similar Documents

Publication Publication Date Title
FR3055969B1 (fr) Methode de determination de la deflexion d'un faisceau d'electrons resultant d'un champ electrique et/ou d'un champ magnetique
EP2779209B1 (fr) Dispositif de determination de la masse d'une particule en suspension ou en solution dans un fluide
CN102121902B (zh) 一种在线拉曼光谱仪校正装置及其校正方法
WO2019075476A3 (fr) Procédés, systèmes et kits pour essais « en enclos »
Jordan et al. Shock response of polymethylmethacrylate
RU2017113013A (ru) Двухрежимный спектрометр ионной подвижности
FR3022998B1 (fr) Systeme et ensemble de cytometrie en flux, dispositif d’analyse comprenant un tel ensemble de cytometrie et ensemble comprenant un tel systeme de cytometrie
WO2014144725A3 (fr) Anticorps monoclonal de mélatonine, détection, procédés et utilisations de celui-ci
WO2015140411A3 (fr) Système de mesure et procédé de mesure d'échantillon
WO2019002656A3 (fr) Appareil pour déterminer la puissance optique de lentilles et procédé de mesure
EP4220125A3 (fr) Appareil d'analyse
EP3128303A3 (fr) Surveillance de processus spectrale in situ
EP4300101A3 (fr) Peptides antigéniques et leurs utilisations pour diagnostiquer et traiter l'autisme
CN207407823U (zh) 一种大视场样本厚度测量装置
CN105223148A (zh) 多量程气体检测装置及方法
GB2535063A (en) Desktop hyperspectral spectra collection of geological material
CN103868604A (zh) 基于分子电离探测的飞秒激光脉冲宽度测量装置
WO2019150606A8 (fr) Appareil de mesure
CN203824653U (zh) 一种基于分子电离探测的飞秒激光脉冲宽度测量仪
WO2014108528A3 (fr) Dispositif de mesure de polarisation, appareil de lithographie, agencement de mesure et procédé de mesure de polarisation
MX2016017048A (es) Inmunoensayo reactivo y colaborativo potenciado por enzimas (ceer) usando citometria de flujo.
Knust et al. Video-based and interference-free axial force detection and analysis for optical tweezers
WO2015004358A1 (fr) Dispositif pour compenser la dérive d'un déphasage d'un modulateur d'état de polarisation d'un faisceau lumineux
RU2618597C2 (ru) Способ аспирационной оптической спектрометрии аэрозоля
RU2560142C1 (ru) Способ аспирационной оптической спектрометрии дисперсной среды

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 2

PLSC Publication of the preliminary search report

Effective date: 20180316

PLFP Fee payment

Year of fee payment: 3

PLFP Fee payment

Year of fee payment: 4

PLFP Fee payment

Year of fee payment: 5

PLFP Fee payment

Year of fee payment: 6

PLFP Fee payment

Year of fee payment: 7

PLFP Fee payment

Year of fee payment: 8