FR3014877B1 - Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure - Google Patents

Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure

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Publication number
FR3014877B1
FR3014877B1 FR1362735A FR1362735A FR3014877B1 FR 3014877 B1 FR3014877 B1 FR 3014877B1 FR 1362735 A FR1362735 A FR 1362735A FR 1362735 A FR1362735 A FR 1362735A FR 3014877 B1 FR3014877 B1 FR 3014877B1
Authority
FR
France
Prior art keywords
block copolymer
styrene
methyl methacrylate
block
copolymer film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1362735A
Other languages
English (en)
French (fr)
Other versions
FR3014877A1 (fr
Inventor
Christophe Navarro
Celia Nicolet
Xavier Chevalier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arkema France SA
Original Assignee
Arkema France SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France SA filed Critical Arkema France SA
Priority to FR1362735A priority Critical patent/FR3014877B1/fr
Priority to TW103143326A priority patent/TWI548657B/zh
Priority to EP14827509.2A priority patent/EP3083488A1/fr
Priority to CN201480068975.6A priority patent/CN105829239A/zh
Priority to US15/105,245 priority patent/US10011675B2/en
Priority to KR1020167019169A priority patent/KR101840960B1/ko
Priority to JP2016539329A priority patent/JP2017501270A/ja
Priority to PCT/FR2014/053329 priority patent/WO2015092241A1/fr
Priority to SG11201604475WA priority patent/SG11201604475WA/en
Publication of FR3014877A1 publication Critical patent/FR3014877A1/fr
Application granted granted Critical
Publication of FR3014877B1 publication Critical patent/FR3014877B1/fr
Priority to JP2019091140A priority patent/JP2019173019A/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/08—Heat treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2353/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/945—Special, e.g. metal
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S524/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S524/905—Etch masking compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/915—Polymer from monoethylenic cyclic hydrocarbon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Composite Materials (AREA)
  • Thermal Sciences (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
FR1362735A 2013-12-17 2013-12-17 Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure Active FR3014877B1 (fr)

Priority Applications (10)

Application Number Priority Date Filing Date Title
FR1362735A FR3014877B1 (fr) 2013-12-17 2013-12-17 Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
TW103143326A TWI548657B (zh) 2013-12-17 2014-12-11 使用建基於苯乙烯及甲基丙烯酸甲酯之奈米結構嵌段共聚物以使嵌段共聚物膜奈米結構化之方法，及具奈米結構之嵌段共聚物膜
CN201480068975.6A CN105829239A (zh) 2013-12-17 2014-12-15 用于对使用基于苯乙烯和基于甲基丙烯酸甲酯的未经结构化的嵌段共聚物的嵌段共聚物膜进行纳米结构化的工艺、以及经纳米结构化的嵌段共聚物膜
US15/105,245 US10011675B2 (en) 2013-12-17 2014-12-15 Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film
KR1020167019169A KR101840960B1 (ko) 2013-12-17 2014-12-15 스티렌 및 메틸 메타크릴레이트 기재의 비구조화 블록 코폴리머를 사용하는 블록 코폴리머 필름의 나노구조화 방법, 및 나노구조화 블록 코폴리머 필름
JP2016539329A JP2017501270A (ja) 2013-12-17 2014-12-15 スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム
EP14827509.2A EP3083488A1 (fr) 2013-12-17 2014-12-15 Procédé de nanostructuration d'un film de copolymère a blocs a partir d'un copolymère a blocs non structure a base de styrène et de methacrylate de méthyle, et film de copolymère a blocs nanostructure
PCT/FR2014/053329 WO2015092241A1 (fr) 2013-12-17 2014-12-15 Procédé de nanostructuration d'un film de copolymère a blocs a partir d'un copolymère a blocs non structure a base de styrène et de methacrylate de méthyle, et film de copolymère a blocs nanostructure
SG11201604475WA SG11201604475WA (en) 2013-12-17 2014-12-15 Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film
JP2019091140A JP2019173019A (ja) 2013-12-17 2019-05-14 スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1362735A FR3014877B1 (fr) 2013-12-17 2013-12-17 Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure

Publications (2)

Publication Number Publication Date
FR3014877A1 FR3014877A1 (fr) 2015-06-19
FR3014877B1 true FR3014877B1 (fr) 2017-03-31

Family

ID=50289951

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1362735A Active FR3014877B1 (fr) 2013-12-17 2013-12-17 Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure

Country Status (9)

Country Link
US (1) US10011675B2 (cg-RX-API-DMAC7.html)
EP (1) EP3083488A1 (cg-RX-API-DMAC7.html)
JP (2) JP2017501270A (cg-RX-API-DMAC7.html)
KR (1) KR101840960B1 (cg-RX-API-DMAC7.html)
CN (1) CN105829239A (cg-RX-API-DMAC7.html)
FR (1) FR3014877B1 (cg-RX-API-DMAC7.html)
SG (1) SG11201604475WA (cg-RX-API-DMAC7.html)
TW (1) TWI548657B (cg-RX-API-DMAC7.html)
WO (1) WO2015092241A1 (cg-RX-API-DMAC7.html)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3029921B1 (fr) * 2014-12-16 2018-06-29 Arkema France Procede de controle de la synthese d'un copolymere a blocs contenant au moins un bloc apolaire et au moins un bloc polaire et utilisation d'un tel copolymere a blocs dans des applications de nano-lithographie par auto-assemblage direct.
FR3045643A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs
FR3045645B1 (fr) * 2015-12-18 2019-07-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs
FR3045644A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs
FR3045642A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs
US11155666B2 (en) * 2016-11-30 2021-10-26 Lg Chem, Ltd. Block copolymer
CN112358643B (zh) * 2020-11-10 2022-09-30 浙江工业大学 一种基于嵌段共聚物本体聚合的均孔膜制备方法
US20240002571A1 (en) * 2020-12-17 2024-01-04 Merck Patent Gmbh Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2679237B1 (fr) 1991-07-19 1994-07-22 Atochem Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques.
FR2735480B1 (fr) 1995-06-15 1997-07-18 Atochem Elf Sa Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide
US6835778B2 (en) * 1995-08-29 2004-12-28 Chevron Phillips Chemical Company Lp Conjugated diene/monovinylarene block copolymers blends
US7255920B2 (en) * 2004-07-29 2007-08-14 3M Innovative Properties Company (Meth)acrylate block copolymer pressure sensitive adhesives
JP5457027B2 (ja) * 2006-05-16 2014-04-02 日本曹達株式会社 ブロックコポリマー
US7964107B2 (en) * 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
US8425982B2 (en) * 2008-03-21 2013-04-23 Micron Technology, Inc. Methods of improving long range order in self-assembly of block copolymer films with ionic liquids
US8304493B2 (en) 2010-08-20 2012-11-06 Micron Technology, Inc. Methods of forming block copolymers
FR2974094A1 (fr) 2011-04-15 2012-10-19 Arkema France Procede de preparation de surfaces
US9580534B2 (en) 2011-07-29 2017-02-28 Wisconsin Alumni Research Foundation Block copolymer materials for directed assembly of thin films

Also Published As

Publication number Publication date
JP2019173019A (ja) 2019-10-10
JP2017501270A (ja) 2017-01-12
EP3083488A1 (fr) 2016-10-26
FR3014877A1 (fr) 2015-06-19
TW201536825A (zh) 2015-10-01
WO2015092241A1 (fr) 2015-06-25
TWI548657B (zh) 2016-09-11
KR20160100351A (ko) 2016-08-23
SG11201604475WA (en) 2016-07-28
CN105829239A (zh) 2016-08-03
US10011675B2 (en) 2018-07-03
US20170002127A1 (en) 2017-01-05
KR101840960B1 (ko) 2018-03-21

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