FR3004287A1 - ENERGY BEAM IRRADIATION SYSTEM AND WORKPIECE TRANSFER MECHANISM - Google Patents

Abstract

The invention relates to an energy beam irradiation system (100) comprising an energy beam emission mechanism and a workpiece carrier for transferring workpieces (W) to be irradiated by the beam. energy beam between a delivery zone and an energy beam irradiation zone, the delivery zone comprising two delivery zones of workpieces opposite each other with respect to a virtual straight line crossing the irradiation zone, and the workpiece holder comprising a first workpiece carrier movable between a first delivery zone and the irradiation zone and a second displaceable workpiece holder between the other delivery area and the irradiation area.

Description

FIELD OF THE INVENTION The present invention relates to an energy beam irradiation system, such as an ion implantation system and a beam irradiation system. electronics, for irradiating a beam of energy in a workpiece to be irradiated by the energy beam, and a workpiece transfer mechanism for use in such a system.

This type of ion implantation system conventionally comprises an intermediate transfer mechanism used to deliver a wafer between a plate for transferring the wafer into an ion beam irradiation zone and a loading chamber. For example, according to an intermediate transfer mechanism disclosed in Patent Document 1, Japanese Patent No. 4,766,156, right and left transfer arms are structured so as to be able to move simultaneously in order to be able to arrange platelets in two rows. on one platter at a time, which increases the processing performance of the system, i.e., its processing capacity.

However, in the aforementioned structure, after the irradiation (implantation) of an ion beam in a certain wafer, the time lost to irradiation of an ion beam in a subsequent wafer is relatively long. This wasted time is a bottleneck to increase treatment capacity. Specifically, after irradiating an ion beam (the implantation of an ion) into a certain wafer, the following method must be performed before irradiating an ion beam in a subsequent wafer. That is, the method in which the wafer in which ions are implanted is transferred through an airlock to the outside, and a subsequent wafer is mounted on a tray through the airlock and then is transferred to an ion beam irradiation zone. In this method, the time lost is relatively long, which affects the processing capacity. In addition, during the time lost, ion beam consumption is wasted.

These problems are noted not only in the ion implantation system but also in the energy beam irradiation system for irradiating a beam of energy in a workpiece, in general.

The invention aims to solve these problems. An object of the invention is to provide this type of energy beam irradiation system able to significantly increase its processing capacity and to effectively use the energy beam.

An energy beam irradiation system includes a power beam emission mechanism and a workpiece carrier. The energy beam emission mechanism emits a beam of energy to a predetermined irradiation zone. The workpiece carrier transfers the workpieces between a predetermined workpiece delivery area and the irradiation zone. The work pieces are irradiated by the energy beam. The workpiece delivery area includes two workpiece delivery areas opposite each other relative to a virtual straight line traversing the energy beam irradiation zone. The workpiece carrier includes a first workpiece carrier and a second workpiece carrier. The first workpiece carrier transfers the workpieces between a first workpiece delivery area and the irradiation area. The second workpiece carrier transfers workpieces between a second workpiece delivery area and the irradiation area.

According to this system, while a beam of energy is irradiated in workpieces transferred to an irradiation zone by a workpiece carrier, irradiated workpieces may be replaced by workpieces. non-irradiated structures and non-irradiated workpieces may be carried by the other workpiece holder. Thus, after the transfer of the irradiated workpieces by a workpiece carrier, the following workpieces not irradiated by the energy beam can be quickly transferred into the irradiation zone by the other carrier. piece of work, which allows to begin the irradiation of a beam of energy in the following work pieces. According to the invention, it is therefore possible to considerably reduce the time required to go from the end of the energy beam irradiation into workpieces at the beginning of energy beam irradiation in rooms. following works. The processing capacity of the system can thus be considerably increased and the energy beam 10 can be used more efficiently. In order for the system to support different sized workpieces in order to increase its versatility, the respective workpiece holders can be structured so as to be able to transfer workpieces of different dimensions. More specifically, the respective workpiece holders can transfer work pieces of different sizes intermingled. Similarly, workpieces of identical dimensions can be transferred in the same workpiece holder and the dimensions of the workpieces to be transferred by a workpiece holder can also be different from the dimensions of the workpieces. of work to be transferred by the other piece holder 25. When a power beam emitting mechanism and workpiece carriers are arranged in an energy beam irradiation chamber maintained at a predetermined degree of depression, a coin mounting portion is provided. The structure may be arranged in a loading chamber which raises workpieces transferred from outside but not yet irradiated by an energy beam thereon in an intermediate manner and which raises irradiated workpieces to be transferred to outside.

In order to apply the present invention in such a case and to ensure the processing capacity of the system, it is preferred that a first workpiece mounting portion and a second workpiece mounting portion are formed in two portions. opposed to each other with respect to the virtual straight line. It is further preferred that first and second transfer members are formed. The first transfer member transfers work pieces between the first workpiece delivery area and the first workpiece mounting portion and the second transfer member transfers workpieces between the second workpiece delivery region and the first workpiece delivery portion. delivery of workpieces and the second portion of assembly of workpieces.

In a specific embodiment for increasing the processing capacity of the system as far as possible, it is preferred to form an intermediate workpiece mounting portion, a third transfer member, and a fourth transfer member. The intermediate workpiece mounting portion is formed between the first workpiece mounting portion and the second workpiece mounting portion. The third transfer member transfers work pieces between the first workpiece delivery area and the intermediate workpiece mounting portion.

The fourth transfer member transfers work pieces between the second workpiece delivery area and the intermediate workpiece mounting portion.

To simplify the structure of the transfer member, it is preferred that the respective transfer members are capable of transferring work pieces of different sizes. Advantageously, one of the first and second workpiece carriers moves a predetermined distance after receiving workpieces from a transfer member in the corresponding workpiece delivery area and receives other workpieces from said transfer member for mounting several rows of workpieces in a direction of travel. A case in which the energy beam is an ion beam and an ion is implanted in work pieces is a successful example proving the effect of the present invention. According to the invention structured as mentioned above, immediately after the end of the irradiation of a beam of energy in the first work pieces, the irradiation of a beam of energy in rooms of The following workload can be started, which significantly increases the processing capacity of the system. Likewise, since the time lost in wasting energy beam consumption is reduced, the energy beam can be used effectively.

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a typical plan view of the entirety of an ion implantation system according to a first embodiment of the invention; Fig. 2 is a partial perspective view of a wafer transfer mechanism according to this embodiment; Figs. 3 (i) to 3 (vi) are flow diagrams of the platelet transfer steps according to this embodiment; Figs. 4 (vii) to 4 (xii) are flow diagrams of the platelet transfer steps according to this embodiment; Figure 5 is a timing chart of ion implantation and platelet transfer according to this embodiment; Fig. 6 is a timing chart of ion implantation and platelet transfer according to this embodiment; Figure 7 is a typical plan view of an entire ion implantation system according to a second embodiment of the invention; Figs. 8 (i) to 8 (iv) are flow diagrams of the platelet transfer steps according to the second embodiment; Figs. 9 (v) to 9 (viii) are flow diagrams of the platelet transfer steps according to the second embodiment. DETAILED DESCRIPTION First Embodiment Referring to the accompanying drawings, the following description is directed to an ion implantation system 100 serving as a power beam irradiation system according to a first embodiment of the invention. In the description below and in the accompanying drawings, several members and structures of the same type are distinguished by adding (1), (2), etc. at the end of their reference number and using the terms "first", "second", etc. As shown in FIG. 1, the ion implantation system 100 comprises an ion beam emitting apparatus for emitting an ion beam IB into an ion implantation chamber 10 set at a vacuum, and a transfer apparatus of workpieces 20 which transfers work pieces (here wafers) W in an irradiation zone AR to irradiate the ion beam IB in the wafer W and which allows the irradiation of the ion beam IB in the workpieces W The ion beam apparatus is used to emit the ion beam IB, for example in the form of a ribbon, to the irradiation zone AR. Here, the shape of the ion beam IB is not limited to a ribbon shape and a square shape can also be used for example. In Fig. 1, reference numeral 9 designates a beam profiler to monitor the ion beam intensity distribution property IB and to divert the beam IB whose intensity is greater than the range of intensity distribution properties. .

The workpiece transfer apparatus 20 includes a workpiece loading and unloading mechanism 1 for loading and unloading the workpieces W between the inside and the outside of the ion implantation chamber. 10, a workpiece transfer mechanism 2 for transferring workpieces W in the AR beam irradiation zone for implanting ions into the workpieces W, and an intermediate transfer mechanism 10 3 interposed between the mechanism of loading and unloading of workpieces 1 and the workpiece transfer mechanism 2 to deliver the workpieces W therebetween. The respective components of the workpiece transfer apparatus 20 will be described hereinafter. The loading and unloading mechanism of workpiece 1 comprises a loading lock 11 (also called loading chamber 11) disposed adjacent to ion implantation chamber 10, a workpiece mounting table 12 serving of a workpiece mounting portion, and a drive up / down drive (not shown) for raising and lowering the workpiece mounting table 25. a brief description since they are specifically described in patent document 1. The loading lock 11 is interposed between an openable and closed top cover and the workpiece mounting table 12 disposed at a higher position. predetermined. Several workpieces W in a row can be mounted on the workpiece mounting table 12. When the workpiece mounting table 12 is located at the above-mentioned upper position, it serves as a partition to separate hermetically the loading chamber 11 and the ion implantation chamber 10. At a predetermined lower position, it is inside the ion implantation chamber 10 where it is able to deliver the workpieces W relative to to the intermediate transfer mechanism 3, as will be described hereinafter. In the present embodiment, two loading and unloading mechanisms of workpieces 1 (forming a pair) are arranged in linear symmetry with respect to a virtual straight line C traversing the irradiation zone AR in view of the above. The virtual straight line C coincides here with the axis of the ion beam IB. Nevertheless, they are not always necessarily coincidental. The workpiece transfer mechanism 2 comprises, for example, a workpiece carrier plate 21, a base member 22 for supporting the plate 21, and a linear advance and withdrawal mechanism 23 for linearly advancing the base member 22 and linearly removing it. The mechanism 2 is used to receive the workpieces W transferred by the intermediate transfer mechanism 3 (as will be discussed hereinafter) in a predetermined workpiece delivery area and to transfer the workpieces. structure W in the irradiation zone AR. The mechanism 2 is also used to transfer the workpieces W from the irradiation zone AR to the workpiece delivery area, thereby delivering them to the intermediate transfer mechanism 3.

The tray 21 comprises fastening plates (not shown) each having a flat circular shape or the like and being capable of clamping and holding workpieces W in several rows (here 2 rows) on a surface thereof by at 10 electrostatic fixations. In the present embodiment, there are provided two paired trays 21 respectively corresponding to the two mechanisms for loading and unloading paired workpieces 1. The base member 22 is a block-shaped member provided in FIG. Each of the trays 21. In a state in which the surface plate portion of each tray 21 extends parallel to the advancing and retreating direction, the base member 22 rotatably supports the base end portion of the plate 21 by the rotation shaft thereof which extends parallel to the direction of advance and withdrawal. The base member 22 includes, within it, a tilt actuator (not shown) such as a motor, such that the surface plate portion of the tray 21 can be lowered and raised between its horizontal state corresponding to its delivery position and its vertical state corresponding to its beam irradiation position.

The linear advance and retraction mechanism 23 comprises, for example, a common rail member 231 located on a horizontal straight line perpendicular to the axis of the ion beam IB and with which the base members 22 can engage with each other. , so as to be slidable, and a sliding actuator (not shown) for advancing and withdrawing the base members 22 independently of each other along the rail member 231. The sliding actuator is consisting for example of a belt (not shown) provided inside the rail member 231 and a motor for rotating the belt. Thus, as it is pulled by the belt, the base member 22 is made to move forward and retract onto the rail member 231. Here, the linear advance and retract mechanism 23 is not limited to this structure. For example, a structure using a screw feed mechanism can also be used. In the description below, the direction of linear advance and withdrawal is defined as the direction x. The intermediate transfer mechanism 3 comprises a transfer arm 31 consisting of a transfer member whose base end portion is rotatably supported so that the transfer arm 31 can be rotated horizontally, and a pivot actuator (not shown) as a motor for rotating the transfer arm 31 forwards and backwards, so that the mechanism 3 can transfer the workpieces W between the parts mounting table 12 and the delivery area. The transfer arm 31 is in the form of a long plate and has gripping claws (not shown) provided on the underside thereof. By hooking the opposite section to the gripping claws of the lower surface peripheral edge portion of the workpieces W with the claws, the arm 31 can hold the workpieces 10W on the lower side of the transfer arm 31. In this embodiment, the transfer arm 31 can hold a plurality of workpieces W arranged in a row along the extension direction of the transfer bottom 31. In this embodiment, as shown in FIG. In FIG. 1, the paired intermediate transfer mechanisms 3 are provided in linear symmetry with respect to the virtual straight line C. They are respectively arranged to correspond to their respective work piece loading and unloading mechanisms 1. In the description hereinafter, the virtual straight line direction is defined as the y direction and a direction perpendicular to the x direction and the y direction defined as the z direction. In addition to the aforementioned structure, the ion implantation system 100 further comprises a plurality of external storage chambers 4 disposed outside the ion implantation chamber 10, and an external transfer mechanism 5 for transferring the ionic implant parts. the structure W between the external storage chambers 4 and the loading chamber 11. Specifically, the external storage chambers 4 are used to store several multi-storey workpieces W. The interior of the external storage rooms 4 is maintained to a predetermined degree of cleanliness. Here, the external storage chambers 4 are arranged in the x direction. The external transfer mechanism 5 comprises a rail 51 extending in the x direction and a transfer machine main body 52 capable of advancing and retreating along the rail 51. The transfer machine main body 52 comprises a arm 521 for clamping the workpieces W. The transfer machine main body 52 moves along the rail 51 and the arm 521 squeezes the workpieces W and turns. Therefore, the workpieces W are transferred between the external storage chambers 4 and the loading chamber 11. Here, the workpieces W, which were taken in a certain external storage chamber 4 and which have received ion implantation, are returned to the same external storage chamber 4. In the present embodiment, two external transfer mechanisms 5 constituting a pair are disposed at opposite positions to each other with respect to the straight line virtual C median. They are arranged to respectively correspond to the mechanisms for loading and unloading workpieces 1.

The operation of the ion implantation system 100 thus structured will be described hereinafter with reference to FIGS. 3 and 4. For ease of explanation, description 5 begins in the state shown in FIG. 3 (i). In the state shown in Fig. 3 (i), a second plate 21 (2), supporting large diameter workpieces W (2) arranged in two rows, is in a vertical posture (posture 10). beam irradiation mentioned above), and is also in the irradiation zone AR, and ion beams IB are irradiated in the workpieces W (2). On the other hand, a first tray 21 (1) is in a first workpiece delivery area and is waiting in the aforementioned delivery posture (horizontal posture). In this state, a first transfer arm 31 (1) supporting a row of small diameter workpieces W (1) mounted on a first workpiece mounting table 12 (1) has just been turned and moved to a position shown here. This position, corresponding to a zone in which the first transfer arm 31 (1) has been turned towards the rail member 231 to an angle perpendicular to the x-axis, constitutes the first delivery zone for parts of the rail. work in this embodiment. In the state of FIG. 3 (i), when the first transfer arm 31 (1) supporting the workpieces W (1) rotates and is positioned on the first plate 21 (1), the first plate 21 (1) raises lifting pins (not shown) or similar elements from below to slightly raise the workpieces W (1), so that the workpieces W (1) are no longer held by them. grasping claws of the first transfer arm 31 (1). Then, the first transfer arm 31 (1) withdraws from the workpiece delivery area and rotates back to the first workpiece mounting table 12 (1). The workpieces W (1) held by the lifting pins are mounted at the positions of the first row on the first plate 21 (1) down the lifting pins and are held there by electrostatic fasteners. On the other hand, the first workpiece mounting table 12 (1) from which the workpieces W (1) have been removed is brought into the loading chamber 11 again under the effect of the operation of the first mechanism for loading and unloading workpieces 1 (1). After receiving new W workpieces (1) from a first external transfer mechanism 5 (1), it returns to the ion implantation chamber 10 where it remains on hold. The first transfer arm 31 (1) which has returned from the first plate 21 (1) supports new W (1) workpieces without ion implantation and turns again to the first workpiece delivery area.

Meanwhile, the first platen 21 (1) is moved in the x direction by an amount corresponding substantially to the distance between the workpiece support rows W (1) of the linear advance and withdrawal mechanism 23 where he stays waiting. Then, as shown in Fig. 3 (ii), the first transfer arm 31 (1) rotates and reaches this stage. As in the aforementioned operation, the workpieces W (1) are mounted at the positions of the second row on the first plate 21 (1) where they are held by electrostatic fasteners. This state is shown in Figure 3 (iii).

The first plate 21 (1) holding the workpieces W (1) of the two rows in this manner, as shown in FIG. 3 (iv), takes a vertical beam irradiation posture in which it remains in position. waiting.

Then, when the ion implantation in the workpieces W (2) maintained on the second plate 21 (2) is complete, the second plate 21 (2) slides towards the second workpiece mounting table 12 ( 2) beyond the virtual straight line C and thus withdraws from the irradiation zone AR to a second work delivery zone. Almost simultaneously with this withdrawal, the first plate 21 (1) holding the workpieces W (1) moves towards the irradiation zone AR where the irradiation of ion beams IB into the workpieces W (1) begins. ).

The second removed tray 21 (2) moves from the beam irradiation posture to the delivery posture and waits in the second workpiece delivery area. The second delivery area of 5 workpieces constitutes the position at which the second transfer arm 31 (2) rotates to an angle perpendicular to the x-axis and is placed at the opposite position to the first delivery zone. of workpieces relative to the virtual straight line C. Then the second transfer arm 31 (2) rotates at this position and receives the workpieces W (2) of the first row from the second tray 21 (2). As shown in Fig. 3 (v), it transfers and assembles the workpieces W (2) on the second workpiece mounting table 12 (2). Here, the procedure when the second transfer arm 31 (2) receives the workpieces W (2) from the second platen 21 (2) is the reverse of the aforementioned procedure when the workpieces W are delivered from the transfer arm 31 to the plate 21. The specific description of this procedure is therefore omitted here. The ionically implanted workpieces W (2) mounted on the second workpiece mounting table 12 (2) are transferred through the second workpiece loading and unloading mechanism 1 ( 2) and the second external transfer mechanism 5 (2) in the external storage chamber 4 where they were initially stored.

Meanwhile, the second platen 21 (2) moves in the x direction by an amount substantially corresponding to the distance between the workpiece support rows W (1) of the linear advance and withdrawal mechanism 23 where he stays waiting. Then, as shown in FIG. 3 (vi), the second empty transfer arm 31 (2) returns to this position to which it receives the W (2) work pieces of the second row and it raises these W workpieces (2) on the second workpiece mounting table 12 (2). These workpieces W (2) are also transferred through the second mechanism for loading and unloading workpieces 1 (2) and the second external transfer mechanism 5 (2) into the external storage chamber. 4 where they were initially stored. The non-ion implanted workpieces W (2) are newly mounted via the second external transfer mechanism 5 (2) and the second workpiece loading and unloading mechanism 1 (2) on the second workpiece mounting table 12 (2). The second transfer arm 31 (2) transfers these workpieces W (2) to the second plate 21 (2) according to a procedure similar to that of the transfer of the workpieces W (1) by the first arm of FIG. transfer 31 (1) to the first plate 21 (1) (see Figs. 4 (vii) to (ix)). As shown in FIG. 4 (x), the second plate 21 (2) supporting the workpieces W (2) of the two rows takes a vertical beam irradiation posture to which it remains waiting. When the ion implantation in workpieces W (1) supported on the first plate 21 (1) is complete, the first plate 21 (1) slides toward the first workpiece mounting table 12 (1). ) beyond the virtual straight line C and thus withdraws from the irradiation zone AR in the first delivery zone 10 of workpieces. Almost simultaneously with this withdrawal, the second plate 21 (2) supporting the workpieces W (2) moves towards the irradiation zone AR where the irradiation of ion beams IB into the workpieces W (2) begins. ). The first removed tray 21 (1) moves from the beam irradiation posture to the delivery posture in the first workpiece delivery area. The ion implanted workpieces W (1) supported on the first platen 21 (1) are returned through the first transfer arm 31 (1), the first mechanism for loading and unloading workpieces. 1 (1) and the first external transfer mechanism 5 (1) in the external storage chamber where they were initially stored according to a procedure similar to that of the transfer of W-implanted workpieces W (2). ) in the second plate 21 (2) (see Figures 4 (xi) and (xii)). The operation returns to Figure 3 (i) and similar steps are repeated.

According to the above-mentioned structure, as shown by a timing chart in FIG. 5, during ion implantation in workpieces W (1) supported on the first plate 21 (1), the workpieces W (2) ion implanted on the second tray 21 (1) are replaced by non-ion implanted workpieces and the second tray 21 (2) takes a waiting posture of ion implantation in the vicinity of the irradiation zone AR. Therefore, immediately after the end of the ion implantation in the W workpieces (1), the ion implantation in the workpieces W (2) can begin. Since the ion implantations can proceed successively virtually without any interruption, the processing capacity of the system can be considerably increased and the ion beams can be used very efficiently. There may be a case in which the ion implantation time is less than the replacement time of workpieces. In this case, as shown in the timing chart of FIG. 6, since the first plate 21 (1), the first transfer arm 31 (1) and the like, and the second plate 21 (2 ), the second transfer arm 31 (2) and similar elements can be actuated independently without any interference between them, their operation is simultaneous, which can reduce as much as possible the time lost corresponding to the interval between implantation ionic in workpieces W (1) and ion implantation in workpieces W (2).

Second Embodiment According to a second embodiment, as shown in FIG. 7, an ion implantation system comprises, as an intermediate transfer mechanism 3, in addition to the first transfer arm 31 (1) and the second transfer arm 31 (2), a third transfer arm 31 (3) and a fourth transfer arm 31 (4). This system also comprises, as a mechanism for loading and unloading workpieces 1, a third mechanism for loading and unloading workpieces 1 (3) interposed between the first mechanism for loading and unloading workpieces. 1 (1) and the second mechanism for loading and unloading workpieces 1 (2).

Specifically, the third transfer arm 31 (3) is a pair with the first transfer arm 31 (1). In view from above (seen in the z direction), it can be rotated symmetrically with the first transfer arm 31 (1). Its axis of rotation is spaced from that of the first transfer arm 31 (1) by an amount corresponding to the distance between the centers of the workpieces W (1) of two rows to be supported by the first plate 21 (1) .

The fourth transfer arm 31 (4) is a pair with the second transfer arm 31 (2). In view from above (seen in the z direction), it can be rotated symmetrically with the second transfer arm 31 (2). Its axis of rotation is spaced from that of the second transfer arm 31 (2) by an amount corresponding to the distance between the centers of the workpieces W (2) of two rows to be supported by the second plate 21 (2) . The operation of the thus structured ion implantation system 100 will be described hereinafter with reference to FIGS. 8 and 9. For ease of explanation, the description begins in the state shown in FIG. 8 (i). In the state shown in FIG. 8 (i), the second plate 21 (2), supporting large diameter workpieces W (2) arranged in two rows, takes a vertical posture (the irradiation posture above-mentioned beam), it is in the irradiation zone AR, and ion beams IB are irradiated on the workpieces W 20 (2). Furthermore, the first plate 21 (1) is in a first delivery zone of workpieces and it waits in the aforementioned delivery posture (horizontal posture). The first transfer arm 31 (1) supporting a row of small diameter workpieces W (1) mounted on the first workpiece mounting table 12 (1) rotates at an angle perpendicular to the axis. x and is above the first plate 21 (1). The third transfer arm 31 (3) supporting a row of small diameter workpieces W (1) mounted on the third workpiece mounting table 12 (3) rotates at an angle perpendicular to the x axis and is above the first platen 21 (1) extending parallel to the first transfer arm 31 (1). In this state, the first plate 21 (1), without moving, receives the workpieces W (1) of the first transfer arm 31 (1) and the third transfer arm 31 (3) almost simultaneously.

After transferring the workpieces W (1), the first transfer arm 31 (1) and the third transfer arm 31 (3), as shown in Fig. 8 (ii), rotate and withdraw from each other. the first delivery area for workpieces.

Then, the first plate 21 (1) supporting two rows of workpieces W (1), as shown in Fig. 8 (iii), takes a vertical beam irradiation posture to which it remains waiting.

When the ion implantation in the workpieces W (2) maintained on the second plate 21 (2) is complete, the second plate 21 (2) slides towards the second assembly table of workpieces 12 (2) beyond the virtual straight line C and thus withdraws from the irradiation zone AR. Almost simultaneously with this withdrawal, the first plate 21 (1) holding the workpieces W (1) moves towards the irradiation zone AR where the irradiation of ion beams IB into the workpieces W (1) begins. ). The removed second tray 21 (2) moves from the beam irradiation posture to the delivery posture and waits in the second workpiece delivery area. In this state, as shown in Fig. 8 (iv), the second transfer arm 31 (2) and the fourth transfer arm 31 (4) rotate at this position. The second transfer arm 31 (2) receives the work pieces W (2) of the first row and the fourth transfer arm 31 (4) receives the work pieces W (2) of the second row from the second plate 21 (2) almost simultaneously. The second transfer arm 31 (2) transfers the workpieces W (2) from the first row to the second workpiece mounting table 12 (2) and the fourth transfer arm 31 (4) transfers the W (2) work pieces from the second row to the third workpiece mounting table 12 (3) respectively. The workpieces W (2) mounted on the second workpiece mounting table 12 (2) and the third workpiece mounting table 12 (3) are transferred through the second loading mechanism. and unloading workpieces 1 (2), the second external transfer mechanism 5 (2) and the third loading and unloading mechanism of workpieces 1 (3) into the outer storage chamber 4 where they were initially stored. Next, the new non-ion implanted workpieces W (2) are transferred from the external storage chamber 4 through the second external transfer mechanism 5 (2), the second mechanism loading and unloading of workpieces 1 (2) and the third loading and unloading mechanism of workpieces 1 (3) respectively on the second workpiece mounting table 12 (2) and the third workpiece mounting table 12 (3). The second transfer arm 31 (2) and the fourth transfer arm 31 (4), as shown in FIG. 9 (v), support these workpieces W (2), they rotate and they deliver them to the second tray 21 (2) waiting in a delivery position in the second delivery area of workpieces. Then, the second transfer arm 31 (2) and the fourth transfer arm 31 (4), as shown in Fig. 9 (vi), rotate and withdraw from the second delivery area of workpieces. . On the other hand, the second plate 21 (2) supporting the workpieces W (2) of the two rows, as shown in FIG. 9 (vii), takes a vertical beam irradiation posture to which it remains waiting. When the ion implantation in workpieces W (1) supported on the first plate 21 (1) is complete, the first plate 21 (1) slides toward the first workpiece mounting table 12 (1). ) beyond the virtual straight line C and thus withdraws from the irradiation zone AR. Almost simultaneously with this removal, the second plate 21 (2) supporting the workpieces W (2) moves towards the irradiation zone AR where the irradiation of ion beams IB into the workpieces W begins ( 2). The first removed tray 21 (1) moves from the beam irradiation posture to the delivery posture and waits in the first workpiece delivery area. As shown in Fig. 9 (viii), ion implanted workpieces W (1) supported on the first tray 21 (1) are returned through the first transfer arm 31 (1) and the third transfer arm 31 (3), the first loading and unloading mechanism of the workpieces 1 (1) and the third loading and unloading mechanism of the workpieces 1 (3), and the first mechanism external transfer device 5 (1) in the external storage chamber 4 where they were initially stored according to a procedure similar to that of the transfer of ionically implanted workpieces W (2) in the second plate 21 (2).

According to the thus structured ion implantation system 100 of this embodiment, compared to the system of the first embodiment, the workpiece replacement time can be further reduced and the processing capacity of the system can be further reduced. increased. This is mainly due to the fact that the workpieces W of the two rows can be transferred at the same time by the two transfer arms 31 without moving the plate 21. When the workpieces W are mounted in two rows by a single transfer arm 31, during this mounting time, the transfer arm 31 must be moved back and forth and the plate 21 supporting the work pieces of a first row must be slid and moved for delivery parts W of a second row.

During this movement, the system must wait for the workpieces W can be fixed and maintained by electrostatic fasteners. Nevertheless, according to the present embodiment capable of reducing the waiting time, the replacement time of the workpieces can be considerably reduced. Since the third workpiece mounting table 12 is used in conjunction with the workpieces W (1) and the workpieces W (2), in comparison with the ion implantation system of the first embodiment of FIG. realization, the size is substantially the same. Nevertheless, the invention is not limited to the embodiments described above. For example, transfer arms may also be provided at several vertical stages on a single shaft. In the case of two stages, namely an upper stage and a lower stage, in the first embodiment there is a total of four transfer arms and in the second embodiment there is a total of eight transfer arm. In this case, for example, an operation of receiving the processed workpieces from a platen by one of the upper and lower transfer arms and of transferring them to a workpiece mounting table. a workpiece and a receiving operation of untreated workpieces from a workpiece mounting table by the other of the upper and lower transfer arms and transferring thereof to the work platform can be performed simultaneously, which can increase the processing speed of the system. Specifically, in the case of the first embodiment, the operations of Figure 3 (v) and Figure 4 (viii), the operations of Figure 4 (xi) and Figure 3 (ii), the operations of Figure 3 (vi) and Figure 4 (vii) and the operations of Figure 4 (xii) and Figure 3 (i) can be performed simultaneously. In the case of the second embodiment, the operations of Fig. 8 (iv) and Fig. 9 (v), and the operations of Fig. 9 (viii) and Fig. 8 (i) can be performed simultaneously. The number of rows of workpieces to be supported by a workpiece carrier may be one, three or more.

In the case where the number of transfer arms (in this case, the number of transfer arms having different axes) is equal to the number of rows, as in the second embodiment, the processing capacity of the system can be considerably 25 increased. For three rows or more, the heights of the transfer arms can be adjusted differently so that the transfer arms can rotate independently. The workpiece transfer sequence is not limited to that of the above embodiments and various sequences can also be used.

The arrangement of the workpieces on the tray can also be zigzagged. In this case, the size of the system in the x direction can be reduced. The direction of movement of the plate does not have to be perpendicular to the direction of beam irradiation. A torsion mechanism for adjusting the torsion angles of the workpieces can also be provided and the torsion adjustment of the workpieces can be made before or after the entry of the workpieces into the loading chamber. The structure of the ion beam irradiation mechanism side of the system is not limited to a specific structure. For example, a structure comprising a mass analysis magnet may also be employed to analyze the mass of a beam emitted from an ion source. The structures of the workpiece loading and unloading mechanism, the workpiece transfer mechanism, the intermediate transfer mechanism and the like are not limited to those shown in the aforementioned embodiments. For example, a treadmill system structure or a structure having a multi-axis articulated arm may also be used. Pair mechanisms do not have to be arranged symmetrically with respect to the virtual straight line and one of them can be located in one of two zones divided by the virtual straight line and the other one can be located in the other area. The term "opposing to each other" used in the claims corresponds to the aforementioned expanded concept, of course including a symmetrical arrangement. The intermediate transfer mechanism is not necessarily necessary. The workpiece carrier can also be structured to directly transfer work pieces transferred into a chamber from a workpiece mounting portion to an irradiation zone. In this case, the workpiece mounting portion serves as a delivery area for workpieces. The workpiece is not limited to a wafer and may be a metal substrate or a block member made of a predetermined material. The shape of the workpiece is not limited to a circular shape and it may be a rectangular shape. The energy beam to be irradiated is not limited to an ion beam and may also be an electron beam, a quantum beam, an electromagnetic wave, or the like. For example, the invention can be applied to an electron beam irradiation system, a cathode sputtering instrument, a plasma doping system and the like. The invention is not limited to the embodiments discussed above and may be varied in a variety of ways without departing from the spirit thereof and without departing from the perimeter thereof.

Claims (7)

REVENDICATIONS1. An energy beam irradiation system (100), characterized in that it comprises: an energy beam emitting mechanism which emits a beam of energy to a predetermined irradiation zone; and a workpiece carrier which transfers work pieces (W) between a predetermined workpiece delivery zone and the irradiation zone, the workpieces (W) being irradiated by the beam 10 in which the workpiece delivery zone comprises two workpiece delivery zones opposite each other with respect to a virtual straight line crossing the irradiation zone. energy beam, and the workpiece carrier comprises: a first workpiece carrier which transfers the workpieces (W) between a first workpiece delivery area and the workpiece area; irradiation; And a second workpiece carrier which transfers the workpieces (W) between a second workpiece delivery area and the irradiation area. 25 The energy beam irradiation system (100) of claim 1, wherein the first and second workpiece holders are adapted to transfer work pieces (W) of different sizes. The energy beam irradiation system (100) according to claim 1 or 2, further comprising: a first workpiece mounting portion and a second workpiece mounting portion which are formed in two portions opposed to each other with respect to the virtual straight line; a first transfer member which transfers work pieces (W) between the first workpiece delivery area and the first workpiece mount portion; and a second transfer member which transfers work pieces (W) between the second workpiece delivery area and the second workpiece mount portion. The energy beam irradiation system (100) of claim 3, further comprising: a third workpiece mounting portion which is formed between the first workpiece mounting portion and the workpiece mounting portion; second portion of assembly of work pieces; A third transfer member which transfers work pieces (W) between the first workpiece delivery area and the third workpiece mount portion; and a fourth transfer member which transfers workpieces (W) between the second workpiece delivery zone and the third workpiece mounting portion. An energy beam irradiation system (100) according to claim 3 or 4, wherein the respective transfer members are adapted to transfer work pieces (W) of different sizes. The energy beam irradiation system (100) according to any one of claims 1 to 5, wherein one of the first and second workpiece carriers moves a predetermined distance after receiving of work pieces (W) from a transfer member in the corresponding workpiece delivery area and receives other work pieces (W) from said transfer member to assemble several rows of work pieces (W) in a direction of travel. 20 The energy beam irradiation system (100) according to any one of claims 1 to 6, wherein the energy beam is an ion beam (IB) and an ion is implanted in parts of the body. work (W).