FR2977947B1 - Exposeuse uv pour plaques d'impression - Google Patents

Exposeuse uv pour plaques d'impression

Info

Publication number
FR2977947B1
FR2977947B1 FR1156284A FR1156284A FR2977947B1 FR 2977947 B1 FR2977947 B1 FR 2977947B1 FR 1156284 A FR1156284 A FR 1156284A FR 1156284 A FR1156284 A FR 1156284A FR 2977947 B1 FR2977947 B1 FR 2977947B1
Authority
FR
France
Prior art keywords
ultraviolet light
lamps
main row
display
printing plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1156284A
Other languages
English (en)
Other versions
FR2977947A1 (fr
Inventor
Denis Bertrand
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PHOTOMECA FRANCE
Original Assignee
PHOTOMECA FRANCE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PHOTOMECA FRANCE filed Critical PHOTOMECA FRANCE
Priority to FR1156284A priority Critical patent/FR2977947B1/fr
Priority to PCT/FR2012/051559 priority patent/WO2013007922A1/fr
Priority to US14/129,627 priority patent/US20140117257A1/en
Priority to EP12738560.7A priority patent/EP2732340A1/fr
Publication of FR2977947A1 publication Critical patent/FR2977947A1/fr
Application granted granted Critical
Publication of FR2977947B1 publication Critical patent/FR2977947B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Supply, Installation And Extraction Of Printed Sheets Or Plates (AREA)
FR1156284A 2011-07-11 2011-07-11 Exposeuse uv pour plaques d'impression Expired - Fee Related FR2977947B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR1156284A FR2977947B1 (fr) 2011-07-11 2011-07-11 Exposeuse uv pour plaques d'impression
PCT/FR2012/051559 WO2013007922A1 (fr) 2011-07-11 2012-07-04 Installation d'insolation de plaques en photopolymère
US14/129,627 US20140117257A1 (en) 2011-07-11 2012-07-04 Facility for exposing photopolymer plates
EP12738560.7A EP2732340A1 (fr) 2011-07-11 2012-07-04 Installation d'insolation de plaques en photopolymère

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1156284A FR2977947B1 (fr) 2011-07-11 2011-07-11 Exposeuse uv pour plaques d'impression

Publications (2)

Publication Number Publication Date
FR2977947A1 FR2977947A1 (fr) 2013-01-18
FR2977947B1 true FR2977947B1 (fr) 2013-07-05

Family

ID=46579221

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1156284A Expired - Fee Related FR2977947B1 (fr) 2011-07-11 2011-07-11 Exposeuse uv pour plaques d'impression

Country Status (4)

Country Link
US (1) US20140117257A1 (fr)
EP (1) EP2732340A1 (fr)
FR (1) FR2977947B1 (fr)
WO (1) WO2013007922A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9372407B2 (en) * 2013-04-18 2016-06-21 E I Du Pont De Nemours And Company Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3197557B2 (ja) * 1990-11-27 2001-08-13 株式会社半導体エネルギー研究所 被膜形成方法
EP1316847A1 (fr) * 2001-11-30 2003-06-04 Degraf s.r.l. Machine pour l'exposition de plaques d'impression flexographiques à la lumière UV
EP1349004B1 (fr) 2002-03-22 2009-05-27 Agfa Graphics N.V. Préparation d une plaque d impression flexographique
DE102004062312B3 (de) * 2004-12-23 2006-06-01 Infineon Technologies Ag Piezoelektrischer Resonator mit verbesserter Temperaturkompensation und Verfahren zum Herstellen desselben
US20060164614A1 (en) * 2005-01-21 2006-07-27 Hua-Kuo Chen Exposing machine for a printed circuit board
JP2007264194A (ja) * 2006-03-28 2007-10-11 Harison Toshiba Lighting Corp 光化学処理装置及び光化学処理方法
US20070287091A1 (en) * 2006-06-12 2007-12-13 Jacobo Victor M System and method for exposing electronic substrates to UV light
DE102007028860A1 (de) * 2007-06-22 2008-12-24 Josef Lindthaler Vorrichtung zur Kontaktbelichtung einer Druckschablone

Also Published As

Publication number Publication date
EP2732340A1 (fr) 2014-05-21
WO2013007922A1 (fr) 2013-01-17
US20140117257A1 (en) 2014-05-01
FR2977947A1 (fr) 2013-01-18

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20160331