TW200801829A - Photomask and method for using the same - Google Patents

Photomask and method for using the same

Info

Publication number
TW200801829A
TW200801829A TW95123488A TW95123488A TW200801829A TW 200801829 A TW200801829 A TW 200801829A TW 95123488 A TW95123488 A TW 95123488A TW 95123488 A TW95123488 A TW 95123488A TW 200801829 A TW200801829 A TW 200801829A
Authority
TW
Taiwan
Prior art keywords
photomask
image regions
substrate
alignment marks
same
Prior art date
Application number
TW95123488A
Other languages
Chinese (zh)
Inventor
Chi-Ching Huang
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW95123488A priority Critical patent/TW200801829A/en
Publication of TW200801829A publication Critical patent/TW200801829A/en

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention is directed to a photomask for a photolithography process. The photomask comprises a substrate, at least one image regions are located and a plurality of alignment marks.The image regions are located on the substrate and at least an image center of one of the image regions non-overlap with a substrate center. The alignment marks are located on the substrate and surrounding each of the image regions. Each of the image regions is surrounded by at least four alignment marks.
TW95123488A 2006-06-29 2006-06-29 Photomask and method for using the same TW200801829A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW95123488A TW200801829A (en) 2006-06-29 2006-06-29 Photomask and method for using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW95123488A TW200801829A (en) 2006-06-29 2006-06-29 Photomask and method for using the same

Publications (1)

Publication Number Publication Date
TW200801829A true TW200801829A (en) 2008-01-01

Family

ID=44765206

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95123488A TW200801829A (en) 2006-06-29 2006-06-29 Photomask and method for using the same

Country Status (1)

Country Link
TW (1) TW200801829A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI667531B (en) * 2017-07-31 2019-08-01 台灣積體電路製造股份有限公司 Photomasks, masks and multiple-mask multiple-exposure lithography
US11726408B2 (en) 2017-07-31 2023-08-15 Taiwan Semiconductor Manufacturing Co., Ltd. Multiple-mask multiple-exposure lithography and masks

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI667531B (en) * 2017-07-31 2019-08-01 台灣積體電路製造股份有限公司 Photomasks, masks and multiple-mask multiple-exposure lithography
US10620530B2 (en) 2017-07-31 2020-04-14 Taiwan Semiconductor Manufacturing Co., Ltd. Multiple-mask multiple-exposure lithography and masks
US10996558B2 (en) 2017-07-31 2021-05-04 Taiwan Semiconductor Manufacturing Co., Ltd. Multiple-mask multiple-exposure lithography and masks
US11402747B2 (en) 2017-07-31 2022-08-02 Taiwan Semiconductor Manufacturing Co., Ltd. Multiple-mask multiple-exposure lithography and masks
US11726408B2 (en) 2017-07-31 2023-08-15 Taiwan Semiconductor Manufacturing Co., Ltd. Multiple-mask multiple-exposure lithography and masks
US12044977B2 (en) 2017-07-31 2024-07-23 Taiwan Semiconductor Manufacturing Co., Ltd. Multiple-mask multiple-exposure lithography and masks

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