TW200801829A - Photomask and method for using the same - Google Patents
Photomask and method for using the sameInfo
- Publication number
- TW200801829A TW200801829A TW95123488A TW95123488A TW200801829A TW 200801829 A TW200801829 A TW 200801829A TW 95123488 A TW95123488 A TW 95123488A TW 95123488 A TW95123488 A TW 95123488A TW 200801829 A TW200801829 A TW 200801829A
- Authority
- TW
- Taiwan
- Prior art keywords
- photomask
- image regions
- substrate
- alignment marks
- same
- Prior art date
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention is directed to a photomask for a photolithography process. The photomask comprises a substrate, at least one image regions are located and a plurality of alignment marks.The image regions are located on the substrate and at least an image center of one of the image regions non-overlap with a substrate center. The alignment marks are located on the substrate and surrounding each of the image regions. Each of the image regions is surrounded by at least four alignment marks.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW95123488A TW200801829A (en) | 2006-06-29 | 2006-06-29 | Photomask and method for using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW95123488A TW200801829A (en) | 2006-06-29 | 2006-06-29 | Photomask and method for using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200801829A true TW200801829A (en) | 2008-01-01 |
Family
ID=44765206
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW95123488A TW200801829A (en) | 2006-06-29 | 2006-06-29 | Photomask and method for using the same |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW200801829A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI667531B (en) * | 2017-07-31 | 2019-08-01 | 台灣積體電路製造股份有限公司 | Photomasks, masks and multiple-mask multiple-exposure lithography |
US11726408B2 (en) | 2017-07-31 | 2023-08-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multiple-mask multiple-exposure lithography and masks |
-
2006
- 2006-06-29 TW TW95123488A patent/TW200801829A/en unknown
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI667531B (en) * | 2017-07-31 | 2019-08-01 | 台灣積體電路製造股份有限公司 | Photomasks, masks and multiple-mask multiple-exposure lithography |
US10620530B2 (en) | 2017-07-31 | 2020-04-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multiple-mask multiple-exposure lithography and masks |
US10996558B2 (en) | 2017-07-31 | 2021-05-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multiple-mask multiple-exposure lithography and masks |
US11402747B2 (en) | 2017-07-31 | 2022-08-02 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multiple-mask multiple-exposure lithography and masks |
US11726408B2 (en) | 2017-07-31 | 2023-08-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multiple-mask multiple-exposure lithography and masks |
US12044977B2 (en) | 2017-07-31 | 2024-07-23 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multiple-mask multiple-exposure lithography and masks |
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