FR2805925B1 - Procede de controle de l'uniformite de traitement d'une surface par un faisceau de particules et equipement de mise en oeuvre - Google Patents

Procede de controle de l'uniformite de traitement d'une surface par un faisceau de particules et equipement de mise en oeuvre

Info

Publication number
FR2805925B1
FR2805925B1 FR0002617A FR0002617A FR2805925B1 FR 2805925 B1 FR2805925 B1 FR 2805925B1 FR 0002617 A FR0002617 A FR 0002617A FR 0002617 A FR0002617 A FR 0002617A FR 2805925 B1 FR2805925 B1 FR 2805925B1
Authority
FR
France
Prior art keywords
uniformity
treating
controlling
particle beam
implementing equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0002617A
Other languages
English (en)
Other versions
FR2805925A1 (fr
Inventor
Gilles Borsoni
Roux Vincent Le
Laurence Vallier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
X Ion SA
Original Assignee
X Ion SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by X Ion SA filed Critical X Ion SA
Priority to FR0002617A priority Critical patent/FR2805925B1/fr
Priority to AU35718/01A priority patent/AU3571801A/en
Priority to PCT/FR2001/000486 priority patent/WO2001065596A2/fr
Publication of FR2805925A1 publication Critical patent/FR2805925A1/fr
Application granted granted Critical
Publication of FR2805925B1 publication Critical patent/FR2805925B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/24—Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube
    • H01J2237/2482—Optical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
FR0002617A 2000-03-01 2000-03-01 Procede de controle de l'uniformite de traitement d'une surface par un faisceau de particules et equipement de mise en oeuvre Expired - Fee Related FR2805925B1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR0002617A FR2805925B1 (fr) 2000-03-01 2000-03-01 Procede de controle de l'uniformite de traitement d'une surface par un faisceau de particules et equipement de mise en oeuvre
AU35718/01A AU3571801A (en) 2000-03-01 2001-02-20 Method for controlling uniformity of treatment of a surface with a particle beamand equipment therefor
PCT/FR2001/000486 WO2001065596A2 (fr) 2000-03-01 2001-02-20 Procede de controle de l'uniformite de traitement d'une surface de materiau pour la microelectronique par un faisceau de particules electriquement chargees et equipement de mise en oeuvre

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0002617A FR2805925B1 (fr) 2000-03-01 2000-03-01 Procede de controle de l'uniformite de traitement d'une surface par un faisceau de particules et equipement de mise en oeuvre

Publications (2)

Publication Number Publication Date
FR2805925A1 FR2805925A1 (fr) 2001-09-07
FR2805925B1 true FR2805925B1 (fr) 2004-10-22

Family

ID=8847585

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0002617A Expired - Fee Related FR2805925B1 (fr) 2000-03-01 2000-03-01 Procede de controle de l'uniformite de traitement d'une surface par un faisceau de particules et equipement de mise en oeuvre

Country Status (3)

Country Link
AU (1) AU3571801A (fr)
FR (1) FR2805925B1 (fr)
WO (1) WO2001065596A2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2849266A1 (fr) * 2002-12-18 2004-06-25 Gilles Borsoni Machine de traitement uniforme de surfaces d'echantillons par projection d'ions multicharges
CN106405619A (zh) * 2015-11-19 2017-02-15 南京瑞派宁信息科技有限公司 一种探测器的准直方法与装置
CN108123841B (zh) * 2017-12-22 2020-12-08 成都飞鱼星科技股份有限公司 一种可扩展控制路由器及路由器性能扩充方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63193038A (ja) * 1987-02-06 1988-08-10 Idemitsu Petrochem Co Ltd 固体元素分析方法およびその装置
JPH01179153A (ja) * 1988-01-08 1989-07-17 Seiko Instr & Electron Ltd フォーカスイオンビーム加工装置
JP2760802B2 (ja) * 1988-06-01 1998-06-04 株式会社日立製作所 集束イオンビーム処理装置
JPH02205682A (ja) * 1989-02-02 1990-08-15 Mitsubishi Electric Corp 荷電ビーム式加工装置
JPH0354824A (ja) * 1989-07-24 1991-03-08 Nec Corp 半導体加工方法と半導体加工装置
US5263776A (en) * 1992-09-25 1993-11-23 International Business Machines Corporation Multi-wavelength optical thermometry
DE4421517A1 (de) * 1993-06-28 1995-01-05 Schlumberger Technologies Inc Verfahren zum Abtrag oder Auftrag von Material mittels eines Partikelstrahls und Vorrichtung zu seiner Durchführung
DE19635072C2 (de) * 1996-08-30 1998-10-22 Telefunken Microelectron Verfahren zur Messung und Bewertung der Rauhigkeit einer Halbleiteroberfläche sowie dessen Verwendung

Also Published As

Publication number Publication date
WO2001065596A3 (fr) 2002-04-18
FR2805925A1 (fr) 2001-09-07
AU3571801A (en) 2001-09-12
WO2001065596A2 (fr) 2001-09-07

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Legal Events

Date Code Title Description
ST Notification of lapse
FC Favourable decision of inpi director general on an application for restauration.
RN Application for restoration
ST Notification of lapse

Effective date: 20051130