GB2339960B - Charged particle beam exposure apparatus and exposure method capable of highly accurate exposure in the presence of partial surface unevenness of the specimen - Google Patents

Charged particle beam exposure apparatus and exposure method capable of highly accurate exposure in the presence of partial surface unevenness of the specimen

Info

Publication number
GB2339960B
GB2339960B GB9916395A GB9916395A GB2339960B GB 2339960 B GB2339960 B GB 2339960B GB 9916395 A GB9916395 A GB 9916395A GB 9916395 A GB9916395 A GB 9916395A GB 2339960 B GB2339960 B GB 2339960B
Authority
GB
United Kingdom
Prior art keywords
exposure
specimen
charged particle
particle beam
method capable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9916395A
Other versions
GB9916395D0 (en
GB2339960A (en
Inventor
Akio Yamada
Tatsuro Ohkawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Publication of GB9916395D0 publication Critical patent/GB9916395D0/en
Publication of GB2339960A publication Critical patent/GB2339960A/en
Application granted granted Critical
Publication of GB2339960B publication Critical patent/GB2339960B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30455—Correction during exposure
    • H01J2237/30461—Correction during exposure pre-calculated

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
GB9916395A 1998-07-16 1999-07-13 Charged particle beam exposure apparatus and exposure method capable of highly accurate exposure in the presence of partial surface unevenness of the specimen Expired - Fee Related GB2339960B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20179898 1998-07-16

Publications (3)

Publication Number Publication Date
GB9916395D0 GB9916395D0 (en) 1999-09-15
GB2339960A GB2339960A (en) 2000-02-09
GB2339960B true GB2339960B (en) 2001-01-17

Family

ID=16447116

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9916395A Expired - Fee Related GB2339960B (en) 1998-07-16 1999-07-13 Charged particle beam exposure apparatus and exposure method capable of highly accurate exposure in the presence of partial surface unevenness of the specimen

Country Status (4)

Country Link
KR (1) KR100334636B1 (en)
DE (1) DE19934076A1 (en)
GB (1) GB2339960B (en)
TW (1) TW414960B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10147133A1 (en) * 2000-10-03 2002-06-13 Advantest Corp Electron beam exposure apparatus
KR100471057B1 (en) 2001-07-10 2005-03-08 삼성전자주식회사 portable computer and method for reproducing video signal on screen thereof
JP2003142392A (en) * 2001-11-07 2003-05-16 Tokyo Seimitsu Co Ltd Electron beam exposure system
US6946655B2 (en) * 2001-11-07 2005-09-20 Applied Materials, Inc. Spot grid array electron imaging system
DE10239858B4 (en) 2002-08-29 2005-08-11 Infineon Technologies Ag Method and device for compensating for unevenness in the surface of a substrate
GB2412232A (en) 2004-03-15 2005-09-21 Ims Nanofabrication Gmbh Particle-optical projection system
JP2022144237A (en) * 2021-03-18 2022-10-03 キオクシア株式会社 Drawing method, original plate manufacturing method, and drawing apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6079722A (en) * 1983-10-06 1985-05-07 Jeol Ltd Electron beam exposing method
US4678919A (en) * 1983-01-31 1987-07-07 Fujitsu Limited Electron beam exposure method and apparatus
US5166529A (en) * 1990-12-01 1992-11-24 Hitachi, Ltd. Electron beam lithography system
US5757015A (en) * 1995-06-08 1998-05-26 Fujitsu Limited Charged-particle-beam exposure device and charged-particle-beam exposure method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4678919A (en) * 1983-01-31 1987-07-07 Fujitsu Limited Electron beam exposure method and apparatus
JPS6079722A (en) * 1983-10-06 1985-05-07 Jeol Ltd Electron beam exposing method
US5166529A (en) * 1990-12-01 1992-11-24 Hitachi, Ltd. Electron beam lithography system
US5757015A (en) * 1995-06-08 1998-05-26 Fujitsu Limited Charged-particle-beam exposure device and charged-particle-beam exposure method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Patent Abstracts of Japan, vol 9, no 220 [E-341] & JP 60 079 722 A *

Also Published As

Publication number Publication date
GB9916395D0 (en) 1999-09-15
KR100334636B1 (en) 2002-04-27
DE19934076A1 (en) 2000-03-30
GB2339960A (en) 2000-02-09
TW414960B (en) 2000-12-11
KR20000011676A (en) 2000-02-25

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20070713