FR2747840B1 - Appareil d'irradiation combinee par un faisceau d'ions et un rayonnement micro-onde, et procede associe - Google Patents
Appareil d'irradiation combinee par un faisceau d'ions et un rayonnement micro-onde, et procede associeInfo
- Publication number
- FR2747840B1 FR2747840B1 FR9605005A FR9605005A FR2747840B1 FR 2747840 B1 FR2747840 B1 FR 2747840B1 FR 9605005 A FR9605005 A FR 9605005A FR 9605005 A FR9605005 A FR 9605005A FR 2747840 B1 FR2747840 B1 FR 2747840B1
- Authority
- FR
- France
- Prior art keywords
- ion beam
- microwave radiation
- irradiation apparatus
- associated process
- apparatus combined
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title 1
- 230000005855 radiation Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9605005A FR2747840B1 (fr) | 1996-04-22 | 1996-04-22 | Appareil d'irradiation combinee par un faisceau d'ions et un rayonnement micro-onde, et procede associe |
EP97103478A EP0803894A1 (fr) | 1996-04-22 | 1997-03-03 | Moyens et méthode pour l'irradiation combinée par faisceau d'ions et par microonde |
JP9114254A JPH1055775A (ja) | 1996-04-22 | 1997-04-16 | 組み合わされたイオンビームおよびマイクロ波照射手段および方法 |
KR1019970014888A KR970072073A (ko) | 1996-04-22 | 1997-04-22 | 결합된 이온 빔 및 마이크로파 조사 수단 및 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9605005A FR2747840B1 (fr) | 1996-04-22 | 1996-04-22 | Appareil d'irradiation combinee par un faisceau d'ions et un rayonnement micro-onde, et procede associe |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2747840A1 FR2747840A1 (fr) | 1997-10-24 |
FR2747840B1 true FR2747840B1 (fr) | 1998-09-11 |
Family
ID=9491430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9605005A Expired - Fee Related FR2747840B1 (fr) | 1996-04-22 | 1996-04-22 | Appareil d'irradiation combinee par un faisceau d'ions et un rayonnement micro-onde, et procede associe |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0803894A1 (fr) |
JP (1) | JPH1055775A (fr) |
KR (1) | KR970072073A (fr) |
FR (1) | FR2747840B1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012186465A (ja) * | 2011-02-18 | 2012-09-27 | Hitachi Kokusai Electric Inc | 基板処理装置 |
EP2765596B1 (fr) * | 2013-02-12 | 2018-07-11 | Infineon Technologies Americas Corp. | Implantation d'ions à des conditions d'équilibre de surface à haute température |
CN105977124A (zh) * | 2016-07-29 | 2016-09-28 | 上海华力微电子有限公司 | 半导体衬底的承载台、离子注入设备及工艺 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2670950B1 (fr) * | 1990-12-20 | 1993-04-16 | Motorola Semiconducteurs | Procede et appareil pour le traitement de recuit des dispositifs a semiconducteur. |
EP0707757B1 (fr) * | 1994-05-06 | 1999-12-29 | Koninklijke Philips Electronics N.V. | Systeme de transmission par faisceaux hertziens |
-
1996
- 1996-04-22 FR FR9605005A patent/FR2747840B1/fr not_active Expired - Fee Related
-
1997
- 1997-03-03 EP EP97103478A patent/EP0803894A1/fr not_active Withdrawn
- 1997-04-16 JP JP9114254A patent/JPH1055775A/ja active Pending
- 1997-04-22 KR KR1019970014888A patent/KR970072073A/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR970072073A (ko) | 1997-11-07 |
EP0803894A1 (fr) | 1997-10-29 |
JPH1055775A (ja) | 1998-02-24 |
FR2747840A1 (fr) | 1997-10-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |