FR2683395A1 - Dispositif d'amende de tension sur une piece conductrice. - Google Patents

Dispositif d'amende de tension sur une piece conductrice. Download PDF

Info

Publication number
FR2683395A1
FR2683395A1 FR9113686A FR9113686A FR2683395A1 FR 2683395 A1 FR2683395 A1 FR 2683395A1 FR 9113686 A FR9113686 A FR 9113686A FR 9113686 A FR9113686 A FR 9113686A FR 2683395 A1 FR2683395 A1 FR 2683395A1
Authority
FR
France
Prior art keywords
conductive
base
rod
connector according
connector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR9113686A
Other languages
English (en)
French (fr)
Other versions
FR2683395B1 (enExample
Inventor
Claude Richard
Daviet Jean-Francois
Montmayeul Philippe
Peccoud Louise
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR9113686A priority Critical patent/FR2683395A1/fr
Priority to EP92402982A priority patent/EP0545748B1/fr
Priority to DE69217187T priority patent/DE69217187T2/de
Publication of FR2683395A1 publication Critical patent/FR2683395A1/fr
Application granted granted Critical
Publication of FR2683395B1 publication Critical patent/FR2683395B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02—Contact members
    • H01R13/22—Contacts for co-operating by abutting
    • H01R13/24—Contacts for co-operating by abutting resilient; resiliently-mounted
    • H01R13/2407—Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means
    • H01R13/2421—Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means using coil springs
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H10P72/72—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Multi-Conductor Connections (AREA)
FR9113686A 1991-11-06 1991-11-06 Dispositif d'amende de tension sur une piece conductrice. Granted FR2683395A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR9113686A FR2683395A1 (fr) 1991-11-06 1991-11-06 Dispositif d'amende de tension sur une piece conductrice.
EP92402982A EP0545748B1 (fr) 1991-11-06 1992-11-04 Dispositif d'amenée de tension sur un porte-substrat
DE69217187T DE69217187T2 (de) 1991-11-06 1992-11-04 Anordnung zur Zuführung einer Spannung auf einen Substrathalter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9113686A FR2683395A1 (fr) 1991-11-06 1991-11-06 Dispositif d'amende de tension sur une piece conductrice.

Publications (2)

Publication Number Publication Date
FR2683395A1 true FR2683395A1 (fr) 1993-05-07
FR2683395B1 FR2683395B1 (enExample) 1995-04-28

Family

ID=9418669

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9113686A Granted FR2683395A1 (fr) 1991-11-06 1991-11-06 Dispositif d'amende de tension sur une piece conductrice.

Country Status (3)

Country Link
EP (1) EP0545748B1 (enExample)
DE (1) DE69217187T2 (enExample)
FR (1) FR2683395A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0701319A1 (fr) 1994-09-06 1996-03-13 Commissariat A L'energie Atomique Porte-substrat électrostatique
WO2000030149A1 (en) * 1998-11-16 2000-05-25 Applied Materials, Inc. Apparatus for providing rf return current path control in a semiconductor wafer processing system

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11651986B2 (en) * 2021-01-27 2023-05-16 Applied Materials, Inc. System for isolating electrodes at cryogenic temperatures

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3012491A1 (de) * 1980-03-31 1981-10-08 Feinmetall Gmbh, 7033 Herrenberg Kontaktbaustein
EP0121936A2 (en) * 1983-04-12 1984-10-17 Fuji Photo Film Co., Ltd. Connection terminal assembly employable for ionic activity detector
EP0256541A2 (de) * 1986-08-19 1988-02-24 Feinmetall Gesellschaft mit beschrÀ¤nkter Haftung Kontaktiervorrichtung

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4777908A (en) * 1986-11-26 1988-10-18 Optical Coating Laboratory, Inc. System and method for vacuum deposition of thin films

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3012491A1 (de) * 1980-03-31 1981-10-08 Feinmetall Gmbh, 7033 Herrenberg Kontaktbaustein
EP0121936A2 (en) * 1983-04-12 1984-10-17 Fuji Photo Film Co., Ltd. Connection terminal assembly employable for ionic activity detector
EP0256541A2 (de) * 1986-08-19 1988-02-24 Feinmetall Gesellschaft mit beschrÀ¤nkter Haftung Kontaktiervorrichtung

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0701319A1 (fr) 1994-09-06 1996-03-13 Commissariat A L'energie Atomique Porte-substrat électrostatique
WO2000030149A1 (en) * 1998-11-16 2000-05-25 Applied Materials, Inc. Apparatus for providing rf return current path control in a semiconductor wafer processing system
US6221221B1 (en) 1998-11-16 2001-04-24 Applied Materials, Inc. Apparatus for providing RF return current path control in a semiconductor wafer processing system

Also Published As

Publication number Publication date
DE69217187T2 (de) 1997-07-17
DE69217187D1 (de) 1997-03-13
EP0545748A1 (fr) 1993-06-09
FR2683395B1 (enExample) 1995-04-28
EP0545748B1 (fr) 1997-01-29

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