FR2669442B1 - Procede de transfert d'images topologiques. - Google Patents

Procede de transfert d'images topologiques.

Info

Publication number
FR2669442B1
FR2669442B1 FR9014462A FR9014462A FR2669442B1 FR 2669442 B1 FR2669442 B1 FR 2669442B1 FR 9014462 A FR9014462 A FR 9014462A FR 9014462 A FR9014462 A FR 9014462A FR 2669442 B1 FR2669442 B1 FR 2669442B1
Authority
FR
France
Prior art keywords
transferring
topological images
topological
images
transferring topological
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9014462A
Other languages
English (en)
French (fr)
Other versions
FR2669442A1 (fr
Inventor
Edouard E Blomme
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
VERGER DESPORTE STE NLE ETS J
Original Assignee
VERGER DESPORTE STE NLE ETS J
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by VERGER DESPORTE STE NLE ETS J filed Critical VERGER DESPORTE STE NLE ETS J
Priority to FR9014462A priority Critical patent/FR2669442B1/fr
Priority to JP4500419A priority patent/JPH06502502A/ja
Priority to PCT/FR1991/000894 priority patent/WO1992009012A1/fr
Priority to KR1019930701503A priority patent/KR930703631A/ko
Priority to EP92902063A priority patent/EP0558666A1/fr
Priority to TW080109124A priority patent/TW202503B/zh
Publication of FR2669442A1 publication Critical patent/FR2669442A1/fr
Application granted granted Critical
Publication of FR2669442B1 publication Critical patent/FR2669442B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR9014462A 1990-11-20 1990-11-20 Procede de transfert d'images topologiques. Expired - Fee Related FR2669442B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR9014462A FR2669442B1 (fr) 1990-11-20 1990-11-20 Procede de transfert d'images topologiques.
JP4500419A JPH06502502A (ja) 1990-11-20 1991-11-14 位相幾何学的画像の転写用処理方法
PCT/FR1991/000894 WO1992009012A1 (fr) 1990-11-20 1991-11-14 Procede de transfert d'images topologiques
KR1019930701503A KR930703631A (ko) 1990-11-20 1991-11-14 위상이미지 전송방법
EP92902063A EP0558666A1 (fr) 1990-11-20 1991-11-14 Procede de transfert d'images topologiques
TW080109124A TW202503B (cg-RX-API-DMAC10.html) 1990-11-20 1991-11-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9014462A FR2669442B1 (fr) 1990-11-20 1990-11-20 Procede de transfert d'images topologiques.

Publications (2)

Publication Number Publication Date
FR2669442A1 FR2669442A1 (fr) 1992-05-22
FR2669442B1 true FR2669442B1 (fr) 1996-06-28

Family

ID=9402386

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9014462A Expired - Fee Related FR2669442B1 (fr) 1990-11-20 1990-11-20 Procede de transfert d'images topologiques.

Country Status (6)

Country Link
EP (1) EP0558666A1 (cg-RX-API-DMAC10.html)
JP (1) JPH06502502A (cg-RX-API-DMAC10.html)
KR (1) KR930703631A (cg-RX-API-DMAC10.html)
FR (1) FR2669442B1 (cg-RX-API-DMAC10.html)
TW (1) TW202503B (cg-RX-API-DMAC10.html)
WO (1) WO1992009012A1 (cg-RX-API-DMAC10.html)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56133738A (en) * 1980-03-25 1981-10-20 Mitsubishi Electric Corp Forming method for pattern of photomask
US4308340A (en) * 1980-08-08 1981-12-29 American Hoechst Corporation Aqueous 2-propoxyethanol containing processing composition for lithographic printing plates
JPS5872139A (ja) * 1981-10-26 1983-04-30 Tokyo Ohka Kogyo Co Ltd 感光性材料
JPS58187926A (ja) * 1982-04-28 1983-11-02 Toyo Soda Mfg Co Ltd 放射線ネガ型レジストの現像方法
US4600684A (en) * 1983-02-10 1986-07-15 Oki Electric Industry Co., Ltd. Process for forming a negative resist using high energy beam
US4535054A (en) * 1983-05-05 1985-08-13 Hughes Aircraft Company Wet process for developing styrene polymer resists for submicron lithography
EP0211161B1 (en) * 1985-05-31 1990-02-28 International Business Machines Corporation Lithographic resists and method of using the same
JPS6484248A (en) * 1987-09-28 1989-03-29 Toshiba Corp Resist pattern forming method

Also Published As

Publication number Publication date
JPH06502502A (ja) 1994-03-17
FR2669442A1 (fr) 1992-05-22
EP0558666A1 (fr) 1993-09-08
TW202503B (cg-RX-API-DMAC10.html) 1993-03-21
WO1992009012A1 (fr) 1992-05-29
KR930703631A (ko) 1993-11-30

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Legal Events

Date Code Title Description
ST Notification of lapse