FR2669442B1 - Procede de transfert d'images topologiques. - Google Patents
Procede de transfert d'images topologiques.Info
- Publication number
- FR2669442B1 FR2669442B1 FR9014462A FR9014462A FR2669442B1 FR 2669442 B1 FR2669442 B1 FR 2669442B1 FR 9014462 A FR9014462 A FR 9014462A FR 9014462 A FR9014462 A FR 9014462A FR 2669442 B1 FR2669442 B1 FR 2669442B1
- Authority
- FR
- France
- Prior art keywords
- transferring
- topological images
- topological
- images
- transferring topological
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9014462A FR2669442B1 (fr) | 1990-11-20 | 1990-11-20 | Procede de transfert d'images topologiques. |
PCT/FR1991/000894 WO1992009012A1 (fr) | 1990-11-20 | 1991-11-14 | Procede de transfert d'images topologiques |
EP92902063A EP0558666A1 (fr) | 1990-11-20 | 1991-11-14 | Procede de transfert d'images topologiques |
KR1019930701503A KR930703631A (ko) | 1990-11-20 | 1991-11-14 | 위상이미지 전송방법 |
JP4500419A JPH06502502A (ja) | 1990-11-20 | 1991-11-14 | 位相幾何学的画像の転写用処理方法 |
TW080109124A TW202503B (fr) | 1990-11-20 | 1991-11-21 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9014462A FR2669442B1 (fr) | 1990-11-20 | 1990-11-20 | Procede de transfert d'images topologiques. |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2669442A1 FR2669442A1 (fr) | 1992-05-22 |
FR2669442B1 true FR2669442B1 (fr) | 1996-06-28 |
Family
ID=9402386
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9014462A Expired - Fee Related FR2669442B1 (fr) | 1990-11-20 | 1990-11-20 | Procede de transfert d'images topologiques. |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0558666A1 (fr) |
JP (1) | JPH06502502A (fr) |
KR (1) | KR930703631A (fr) |
FR (1) | FR2669442B1 (fr) |
TW (1) | TW202503B (fr) |
WO (1) | WO1992009012A1 (fr) |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56133738A (en) * | 1980-03-25 | 1981-10-20 | Mitsubishi Electric Corp | Forming method for pattern of photomask |
US4308340A (en) * | 1980-08-08 | 1981-12-29 | American Hoechst Corporation | Aqueous 2-propoxyethanol containing processing composition for lithographic printing plates |
JPS5872139A (ja) * | 1981-10-26 | 1983-04-30 | Tokyo Ohka Kogyo Co Ltd | 感光性材料 |
JPS58187926A (ja) * | 1982-04-28 | 1983-11-02 | Toyo Soda Mfg Co Ltd | 放射線ネガ型レジストの現像方法 |
US4600684A (en) * | 1983-02-10 | 1986-07-15 | Oki Electric Industry Co., Ltd. | Process for forming a negative resist using high energy beam |
US4535054A (en) * | 1983-05-05 | 1985-08-13 | Hughes Aircraft Company | Wet process for developing styrene polymer resists for submicron lithography |
DE3669211D1 (de) * | 1985-05-31 | 1990-04-05 | Ibm | Schutzlack fuer lithographie und anwendungsverfahren. |
JPS6484248A (en) * | 1987-09-28 | 1989-03-29 | Toshiba Corp | Resist pattern forming method |
-
1990
- 1990-11-20 FR FR9014462A patent/FR2669442B1/fr not_active Expired - Fee Related
-
1991
- 1991-11-14 WO PCT/FR1991/000894 patent/WO1992009012A1/fr not_active Application Discontinuation
- 1991-11-14 KR KR1019930701503A patent/KR930703631A/ko not_active Application Discontinuation
- 1991-11-14 JP JP4500419A patent/JPH06502502A/ja active Pending
- 1991-11-14 EP EP92902063A patent/EP0558666A1/fr not_active Withdrawn
- 1991-11-21 TW TW080109124A patent/TW202503B/zh active
Also Published As
Publication number | Publication date |
---|---|
WO1992009012A1 (fr) | 1992-05-29 |
JPH06502502A (ja) | 1994-03-17 |
KR930703631A (ko) | 1993-11-30 |
TW202503B (fr) | 1993-03-21 |
EP0558666A1 (fr) | 1993-09-08 |
FR2669442A1 (fr) | 1992-05-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |