FR2574319B1 - Appareil pour le traitement de puces a semi-conducteurs et articles similaires - Google Patents

Appareil pour le traitement de puces a semi-conducteurs et articles similaires

Info

Publication number
FR2574319B1
FR2574319B1 FR858518726A FR8518726A FR2574319B1 FR 2574319 B1 FR2574319 B1 FR 2574319B1 FR 858518726 A FR858518726 A FR 858518726A FR 8518726 A FR8518726 A FR 8518726A FR 2574319 B1 FR2574319 B1 FR 2574319B1
Authority
FR
France
Prior art keywords
treatment
semiconductor chips
chips
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR858518726A
Other languages
English (en)
Other versions
FR2574319A1 (fr
Inventor
George Martin Engle
Richard Stephen Rosler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASM America Inc
Original Assignee
ASM America Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASM America Inc filed Critical ASM America Inc
Publication of FR2574319A1 publication Critical patent/FR2574319A1/fr
Application granted granted Critical
Publication of FR2574319B1 publication Critical patent/FR2574319B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00—Means for manipulating or holding work, e.g. for separate articles
    • B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
    • H01L21/67316—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements characterized by a material, a roughness, a coating or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
FR858518726A 1984-12-10 1985-12-09 Appareil pour le traitement de puces a semi-conducteurs et articles similaires Expired - Fee Related FR2574319B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/679,898 US4610748A (en) 1984-12-10 1984-12-10 Apparatus for processing semiconductor wafers or the like

Publications (2)

Publication Number Publication Date
FR2574319A1 FR2574319A1 (fr) 1986-06-13
FR2574319B1 true FR2574319B1 (fr) 1990-01-19

Family

ID=24728843

Family Applications (1)

Application Number Title Priority Date Filing Date
FR858518726A Expired - Fee Related FR2574319B1 (fr) 1984-12-10 1985-12-09 Appareil pour le traitement de puces a semi-conducteurs et articles similaires

Country Status (6)

Country Link
US (1) US4610748A (fr)
JP (1) JPS61203634A (fr)
DE (1) DE3543588A1 (fr)
FR (1) FR2574319B1 (fr)
GB (2) GB2169443B (fr)
NL (1) NL8503386A (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4799451A (en) * 1987-02-20 1989-01-24 Asm America, Inc. Electrode boat apparatus for processing semiconductor wafers or the like
EP0306967B1 (fr) * 1987-09-11 1997-04-16 Hitachi, Ltd. Dispositif pour réaliser un traitement par chauffage sur des plaquettes semi-conducteurs
US4882028A (en) * 1988-01-22 1989-11-21 Micron Technology, Inc. R-F electrodes for removably providing electrical energy to an apparatus during R-F energy reactive treatment processes
US4873942A (en) * 1988-06-08 1989-10-17 The Stackpole Corporation Plasma enhanced chemical vapor deposition wafer holding fixture
US5421891A (en) * 1989-06-13 1995-06-06 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US5175021A (en) * 1990-02-01 1992-12-29 Advanced Semiconductor Materials America, Inc. Transmission line for providing power to an electrode boat in a plasma enhanced chemical vapor deposition system
JPH05209279A (ja) * 1991-10-29 1993-08-20 Canon Inc 金属膜形成装置および金属膜形成法
JP2631434B2 (ja) * 1992-02-06 1997-07-16 義知 村田 エアーフラッシャー
US5355832A (en) * 1992-12-15 1994-10-18 Advanced Surface Technology, Inc. Polymerization reactor
US6461980B1 (en) 2000-01-28 2002-10-08 Applied Materials, Inc. Apparatus and process for controlling the temperature of a substrate in a plasma reactor chamber
FI123170B (fi) * 2009-05-26 2012-11-30 Beneq Oy Järjestely substraatin käsittelemiseksi sekä asennusalusta substraattia varten
DE102015004352A1 (de) * 2015-04-02 2016-10-06 Centrotherm Photovoltaics Ag Waferboot und Behandlungsvorrichtung für Wafer

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4233109A (en) * 1976-01-16 1980-11-11 Zaidan Hojin Handotai Kenkyu Shinkokai Dry etching method
JPS53112066A (en) * 1977-03-11 1978-09-30 Fujitsu Ltd Plasma treatment apparatus
US4223048A (en) * 1978-08-07 1980-09-16 Pacific Western Systems Plasma enhanced chemical vapor processing of semiconductive wafers
US4222839A (en) * 1978-09-21 1980-09-16 Motorola, Inc. Workpiece holder and method for plasma reactor apparatus
US4287851A (en) * 1980-01-16 1981-09-08 Dozier Alfred R Mounting and excitation system for reaction in the plasma state
US4282077A (en) * 1980-07-03 1981-08-04 General Dynamics, Pomona Division Uniform plasma etching system
US4381965A (en) * 1982-01-06 1983-05-03 Drytek, Inc. Multi-planar electrode plasma etching
US4424096A (en) * 1982-12-23 1984-01-03 Western Electric Co., Inc. R-F Electrode type workholder and methods of supporting workpieces during R-F powered reactive treatment

Also Published As

Publication number Publication date
GB2201547B (en) 1989-07-05
DE3543588C2 (fr) 1991-10-10
GB8530304D0 (en) 1986-01-22
JPS61203634A (ja) 1986-09-09
GB8803604D0 (en) 1988-03-16
DE3543588A1 (de) 1986-07-17
GB2201547A (en) 1988-09-01
GB2169443A (en) 1986-07-09
US4610748A (en) 1986-09-09
NL8503386A (nl) 1986-07-01
FR2574319A1 (fr) 1986-06-13
GB2169443B (en) 1989-07-12

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Legal Events

Date Code Title Description
ST Notification of lapse