FI123170B - Järjestely substraatin käsittelemiseksi sekä asennusalusta substraattia varten - Google Patents

Järjestely substraatin käsittelemiseksi sekä asennusalusta substraattia varten Download PDF

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Publication number
FI123170B
FI123170B FI20095578A FI20095578A FI123170B FI 123170 B FI123170 B FI 123170B FI 20095578 A FI20095578 A FI 20095578A FI 20095578 A FI20095578 A FI 20095578A FI 123170 B FI123170 B FI 123170B
Authority
FI
Finland
Prior art keywords
substrates
substrate
treating
mounting plate
carrier
Prior art date
Application number
FI20095578A
Other languages
English (en)
Swedish (sv)
Other versions
FI20095578A (fi
FI20095578A0 (fi
Inventor
Jarmo Maula
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Publication of FI20095578A0 publication Critical patent/FI20095578A0/fi
Priority to FI20095578A priority Critical patent/FI123170B/fi
Priority to CN201080022843.1A priority patent/CN102449189B/zh
Priority to EP10726140.6A priority patent/EP2435597B1/en
Priority to PCT/FI2010/050408 priority patent/WO2010136644A1/en
Priority to US13/318,919 priority patent/US20120055407A1/en
Priority to TW099116633A priority patent/TWI500808B/zh
Publication of FI20095578A publication Critical patent/FI20095578A/fi
Application granted granted Critical
Publication of FI123170B publication Critical patent/FI123170B/fi
Priority to US15/613,532 priority patent/US20170268106A1/en
Priority to US16/298,207 priority patent/US20190203356A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate

Abstract

Keksintö liittyy järjestelyyn substraatin käsittelemiseksi kaasukasvatuslaitteistossa altistamalla substraatti vuoroittaisille lähtöaineiden pintareaktioille, joka järjestely käsittää latausvälineet substraatin lataamiseksi kaasukasvatuslaitteistoon substraatin kannattimella. Keksinnön mukaisesti substraatti on sovitettu kiinnitettäväksi irrotettavasti substraatin kannattimeen liima-aineen avulla.
FI20095578A 2009-05-26 2009-05-26 Järjestely substraatin käsittelemiseksi sekä asennusalusta substraattia varten FI123170B (fi)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FI20095578A FI123170B (fi) 2009-05-26 2009-05-26 Järjestely substraatin käsittelemiseksi sekä asennusalusta substraattia varten
US13/318,919 US20120055407A1 (en) 2009-05-26 2010-05-21 Arrangement for processing substrate and substrate carrier
EP10726140.6A EP2435597B1 (en) 2009-05-26 2010-05-21 Arrangement for processing substrate and substrate carrier
PCT/FI2010/050408 WO2010136644A1 (en) 2009-05-26 2010-05-21 Arrangement for processing substrate and substrate carrier
CN201080022843.1A CN102449189B (zh) 2009-05-26 2010-05-21 用来处理基质的装置和基质载体
TW099116633A TWI500808B (zh) 2009-05-26 2010-05-25 製程基板的配置及基板載具
US15/613,532 US20170268106A1 (en) 2009-05-26 2017-06-05 Arrangement for processing substrate and substrate carrier
US16/298,207 US20190203356A1 (en) 2009-05-26 2019-03-11 Arrangement for processing substrate and substrate carrier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20095578A FI123170B (fi) 2009-05-26 2009-05-26 Järjestely substraatin käsittelemiseksi sekä asennusalusta substraattia varten

Publications (3)

Publication Number Publication Date
FI20095578A0 FI20095578A0 (fi) 2009-05-26
FI20095578A FI20095578A (fi) 2010-11-27
FI123170B true FI123170B (fi) 2012-11-30

Family

ID=40680757

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20095578A FI123170B (fi) 2009-05-26 2009-05-26 Järjestely substraatin käsittelemiseksi sekä asennusalusta substraattia varten

Country Status (6)

Country Link
US (3) US20120055407A1 (fi)
EP (1) EP2435597B1 (fi)
CN (1) CN102449189B (fi)
FI (1) FI123170B (fi)
TW (1) TWI500808B (fi)
WO (1) WO2010136644A1 (fi)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI491755B (zh) * 2011-12-13 2015-07-11 聯華電子股份有限公司 基材載具及其應用
WO2014191622A1 (en) * 2013-05-29 2014-12-04 Beneq Oy Barrier, carrier arrangement and method for preventing material growth
US9499908B2 (en) * 2015-02-13 2016-11-22 Eastman Kodak Company Atomic layer deposition apparatus
FI3733928T3 (fi) * 2019-03-29 2023-04-03 Picosun Oy Näytteensuojus

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Publication number Priority date Publication date Assignee Title
US3602192A (en) * 1969-05-19 1971-08-31 Ibm Semiconductor wafer processing
US3814051A (en) * 1972-11-29 1974-06-04 L Lewison Contact lens and apparatus for producing same
US4610748A (en) * 1984-12-10 1986-09-09 Advanced Semiconductor Materials Of America, Inc. Apparatus for processing semiconductor wafers or the like
US5618388A (en) * 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
US4949669A (en) * 1988-12-20 1990-08-21 Texas Instruments Incorporated Gas flow systems in CCVD reactors
US5122391A (en) * 1991-03-13 1992-06-16 Watkins-Johnson Company Method for producing highly conductive and transparent films of tin and fluorine doped indium oxide by APCVD
JP3571785B2 (ja) * 1993-12-28 2004-09-29 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
JP3081122B2 (ja) * 1994-07-18 2000-08-28 シャープ株式会社 基板搬送用治具及びそれを用いた液晶表示素子の製造方法
US5972152A (en) * 1997-05-16 1999-10-26 Micron Communications, Inc. Methods of fixturing flexible circuit substrates and a processing carrier, processing a flexible circuit and processing a flexible circuit substrate relative to a processing carrier
TW462946B (en) * 2000-04-21 2001-11-11 Ritdisplay Corp Substrate transfer method of OLED process
US6867539B1 (en) * 2000-07-12 2005-03-15 3M Innovative Properties Company Encapsulated organic electronic devices and method for making same
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KR101420285B1 (ko) * 2008-01-09 2014-07-17 삼성전자주식회사 반도체 제조설비 그의 웨이퍼 로딩/언로딩 방법

Also Published As

Publication number Publication date
FI20095578A (fi) 2010-11-27
EP2435597A1 (en) 2012-04-04
US20190203356A1 (en) 2019-07-04
US20170268106A1 (en) 2017-09-21
EP2435597B1 (en) 2018-10-17
TW201109466A (en) 2011-03-16
CN102449189A (zh) 2012-05-09
WO2010136644A1 (en) 2010-12-02
CN102449189B (zh) 2016-02-10
FI20095578A0 (fi) 2009-05-26
US20120055407A1 (en) 2012-03-08
TWI500808B (zh) 2015-09-21

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