FR2553205B1 - Procede de correction de defauts de masques de photo-lithographie et masque obtenu par ce procede - Google Patents

Procede de correction de defauts de masques de photo-lithographie et masque obtenu par ce procede

Info

Publication number
FR2553205B1
FR2553205B1 FR8316027A FR8316027A FR2553205B1 FR 2553205 B1 FR2553205 B1 FR 2553205B1 FR 8316027 A FR8316027 A FR 8316027A FR 8316027 A FR8316027 A FR 8316027A FR 2553205 B1 FR2553205 B1 FR 2553205B1
Authority
FR
France
Prior art keywords
photo
mask obtained
correcting defects
lithography masks
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8316027A
Other languages
English (en)
Other versions
FR2553205A1 (fr
Inventor
Dominique Malgouyres
Jean-Pierre Suat
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR8316027A priority Critical patent/FR2553205B1/fr
Publication of FR2553205A1 publication Critical patent/FR2553205A1/fr
Application granted granted Critical
Publication of FR2553205B1 publication Critical patent/FR2553205B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR8316027A 1983-10-07 1983-10-07 Procede de correction de defauts de masques de photo-lithographie et masque obtenu par ce procede Expired FR2553205B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR8316027A FR2553205B1 (fr) 1983-10-07 1983-10-07 Procede de correction de defauts de masques de photo-lithographie et masque obtenu par ce procede

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8316027A FR2553205B1 (fr) 1983-10-07 1983-10-07 Procede de correction de defauts de masques de photo-lithographie et masque obtenu par ce procede

Publications (2)

Publication Number Publication Date
FR2553205A1 FR2553205A1 (fr) 1985-04-12
FR2553205B1 true FR2553205B1 (fr) 1985-12-27

Family

ID=9292943

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8316027A Expired FR2553205B1 (fr) 1983-10-07 1983-10-07 Procede de correction de defauts de masques de photo-lithographie et masque obtenu par ce procede

Country Status (1)

Country Link
FR (1) FR2553205B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4548883A (en) * 1983-05-31 1985-10-22 At&T Bell Laboratories Correction of lithographic masks

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2946235C3 (de) * 1979-11-16 1982-04-08 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Verfahren zur Erzeugung einer Belichtungsmaske zur Herstellung von mattstreuenden Strukturen neben opaken und/oder transparenten Strukturen
JPS56162750A (en) * 1980-05-20 1981-12-14 Nec Corp Defect correcting method for photomask

Also Published As

Publication number Publication date
FR2553205A1 (fr) 1985-04-12

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Legal Events

Date Code Title Description
ST Notification of lapse
CD Change of name or company name