KR850005176A - 노출 마스크와 대상물을 얼라인먼트하는 노출장치 및 그 방법 - Google Patents

노출 마스크와 대상물을 얼라인먼트하는 노출장치 및 그 방법

Info

Publication number
KR850005176A
KR850005176A KR1019840008344A KR840008344A KR850005176A KR 850005176 A KR850005176 A KR 850005176A KR 1019840008344 A KR1019840008344 A KR 1019840008344A KR 840008344 A KR840008344 A KR 840008344A KR 850005176 A KR850005176 A KR 850005176A
Authority
KR
South Korea
Prior art keywords
exposure
aligning
mask
exposure device
exposure mask
Prior art date
Application number
KR1019840008344A
Other languages
English (en)
Other versions
KR900001269B1 (ko
Inventor
요시따다 오시다
마사따까 시바
도시히꼬 나까다
미쯔요시 고이즈미
나오또 나까지마
Original Assignee
가부시끼가이샤 히다찌세이사꾸쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP58243866A external-priority patent/JPH0612753B2/ja
Priority claimed from JP59222010A external-priority patent/JPS61100931A/ja
Application filed by 가부시끼가이샤 히다찌세이사꾸쇼 filed Critical 가부시끼가이샤 히다찌세이사꾸쇼
Publication of KR850005176A publication Critical patent/KR850005176A/ko
Application granted granted Critical
Publication of KR900001269B1 publication Critical patent/KR900001269B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1019840008344A 1983-12-26 1984-12-26 노출 마스크와 대상물을 얼라인먼트하는 노출장치 및 그 방법 KR900001269B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP58243866A JPH0612753B2 (ja) 1983-12-26 1983-12-26 パターン検出方法及びその装置
JP58-243866 1983-12-26
JP59222010A JPS61100931A (ja) 1984-10-24 1984-10-24 縮小投影式アライメント方法
JP59-222010 1984-10-24

Publications (2)

Publication Number Publication Date
KR850005176A true KR850005176A (ko) 1985-08-21
KR900001269B1 KR900001269B1 (ko) 1990-03-05

Family

ID=26524628

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840008344A KR900001269B1 (ko) 1983-12-26 1984-12-26 노출 마스크와 대상물을 얼라인먼트하는 노출장치 및 그 방법

Country Status (4)

Country Link
US (1) US4668089A (ko)
EP (1) EP0148477B1 (ko)
KR (1) KR900001269B1 (ko)
DE (1) DE3485022D1 (ko)

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JPH0685387B2 (ja) * 1986-02-14 1994-10-26 株式会社東芝 位置合わせ方法
JPH0785466B2 (ja) * 1986-07-04 1995-09-13 キヤノン株式会社 位置合せ装置
US4943733A (en) * 1987-05-15 1990-07-24 Nikon Corporation Projection optical apparatus capable of measurement and compensation of distortion affecting reticle/wafer alignment
JPH065663B2 (ja) * 1987-06-30 1994-01-19 株式会社日立製作所 半導体露光方法及びその装置
JPH01189503A (ja) * 1988-01-25 1989-07-28 Hitachi Ltd パターン検出方法及びその装置
US5340992A (en) * 1988-02-16 1994-08-23 Canon Kabushiki Kaisha Apparatus and method of detecting positional relationship using a weighted coefficient
US5260771A (en) * 1988-03-07 1993-11-09 Hitachi, Ltd. Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same
US5094539A (en) * 1988-03-07 1992-03-10 Hitachi, Ltd. Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same
US5155370A (en) * 1988-09-09 1992-10-13 Canon Kabushiki Kaisha Device for detecting the relative position of first and second objects
JP2650396B2 (ja) * 1989-02-07 1997-09-03 キヤノン株式会社 位置検出装置及び位置検出方法
JPH032504A (ja) * 1989-05-30 1991-01-08 Nikon Corp 位置合わせ装置
US5053628A (en) * 1989-07-13 1991-10-01 Matsushita Electric Industrial Co., Ltd. Position signal producing apparatus for water alignment
FR2656700B1 (fr) * 1989-12-28 1992-08-07 Aerospatiale Procede de restitution du mouvement d'un mobile par observation d'un symbole forme sur ce dernier et dispositifs pour la mise en óoeuvre du procede.
US5357311A (en) * 1991-02-25 1994-10-18 Nikon Corporation Projection type light exposure apparatus and light exposure method
JP3210123B2 (ja) * 1992-03-27 2001-09-17 キヤノン株式会社 結像方法及び該方法を用いたデバイス製造方法
US5274420A (en) * 1992-04-20 1993-12-28 International Business Machines Corporation Beamsplitter type lens elements with pupil-plane stops for lithographic systems
US5446587A (en) * 1992-09-03 1995-08-29 Samsung Electronics Co., Ltd. Projection method and projection system and mask therefor
JP3195200B2 (ja) * 1994-12-09 2001-08-06 キヤノン株式会社 半導体露光装置および異物検出方法
JP3450509B2 (ja) * 1995-04-13 2003-09-29 キヤノン株式会社 投影露光装置及び該装置を用いて素子を製造する方法
US6270947B2 (en) * 1999-04-30 2001-08-07 Infineon Technologies Ag Method and apparatus for reducing non-uniformity area effects in the manufacture of semiconductor devices
GB2356786B (en) * 1999-11-29 2003-09-03 Marconi Electronic Syst Ltd Method and apparatus for aligning a crystalline substrate
JP4414535B2 (ja) * 2000-01-13 2010-02-10 進 野田 半導体装置の製造方法
US6700096B2 (en) * 2001-10-30 2004-03-02 Semiconductor Energy Laboratory Co., Ltd. Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment
TWI289896B (en) * 2001-11-09 2007-11-11 Semiconductor Energy Lab Laser irradiation apparatus, laser irradiation method, and method of manufacturing a semiconductor device
TWI291729B (en) 2001-11-22 2007-12-21 Semiconductor Energy Lab A semiconductor fabricating apparatus
TWI267145B (en) * 2001-11-30 2006-11-21 Semiconductor Energy Lab Manufacturing method for a semiconductor device
JP3949564B2 (ja) * 2001-11-30 2007-07-25 株式会社半導体エネルギー研究所 レーザ照射装置及び半導体装置の作製方法
US7133737B2 (en) * 2001-11-30 2006-11-07 Semiconductor Energy Laboratory Co., Ltd. Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer
US7214573B2 (en) * 2001-12-11 2007-05-08 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device that includes patterning sub-islands
JP4282985B2 (ja) * 2002-12-27 2009-06-24 株式会社半導体エネルギー研究所 表示装置の作製方法
KR100531416B1 (ko) * 2003-09-17 2005-11-29 엘지.필립스 엘시디 주식회사 Ｓｌｓ 장비 및 이를 이용한 실리콘 결정화 방법
US7385671B2 (en) * 2004-05-28 2008-06-10 Azores Corporation High speed lithography machine and method
JP2007142275A (ja) * 2005-11-21 2007-06-07 Toshiba Corp フォトマスクの判定方法、半導体装置の製造方法及びプログラム
DE102006003535A1 (de) * 2006-01-24 2007-08-02 Schott Ag Verfahren zur Temperaturbeeinflussung einer Schmelze
DE102008048660B4 (de) * 2008-09-22 2015-06-18 Carl Zeiss Sms Gmbh Verfahren und Vorrichtung zur Vermessung von Strukturen auf Photolithographiemasken
NL2005975A (en) 2010-03-03 2011-09-06 Asml Netherlands Bv Imprint lithography.
JP6096515B2 (ja) * 2013-01-15 2017-03-15 株式会社アドテックエンジニアリング Ｉｔｏパターン露光装置
CN103412428B (zh) * 2013-07-24 2016-01-27 北京京东方光电科技有限公司 一种对位系统
GB201604940D0 (en) 2016-03-23 2016-05-04 Stfc Science & Technology Laser-chain alignment
WO2019067809A2 (en) 2017-09-29 2019-04-04 Rudolph Technologies, Inc. SYSTEM AND METHOD FOR OPTIMIZING LITHOGRAPHIC EXPOSURE METHOD
CN107844025A (zh) * 2017-12-11 2018-03-27 京东方科技集团股份有限公司 掩膜版、曝光装置及曝光方法
WO2021168359A1 (en) 2020-02-21 2021-08-26 Onto Innovation, Inc. System and method for correcting overlay errors in a lithographic process

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US3989385A (en) * 1974-09-16 1976-11-02 International Business Machines Corporation Part locating, mask alignment and mask alignment verification system
JPS5212577A (en) * 1975-07-21 1977-01-31 Nippon Kogaku Kk <Nikon> Automatic location device
DE2539206A1 (de) * 1975-09-03 1977-03-17 Siemens Ag Verfahren zur automatischen justierung von halbleiterscheiben
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit
JPS5369063A (en) * 1976-12-01 1978-06-20 Hitachi Ltd Detector of position alignment patterns
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren
DE2900921C2 (de) * 1979-01-11 1981-06-04 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren zum Projektionskopieren von Masken auf ein Werkstück
DE2905636C2 (de) * 1979-02-14 1985-06-20 Censor Patent- Und Versuchs-Anstalt, Vaduz Verfahren zum Kopieren von Masken auf ein Werkstück
DE2905635A1 (de) * 1979-02-14 1980-08-21 Censor Patent Versuch Verfahren und vorrichtung zum ausrichten der bild- und/oder objektflaechen bei optischen kopiereinrichtungen
US4353087A (en) * 1979-03-12 1982-10-05 The Perkin-Elmer Corporation Automatic mask alignment
US4362389A (en) * 1980-02-19 1982-12-07 Hitachi, Ltd. Method and apparatus for projection type mask alignment
JPS56122128A (en) * 1980-02-29 1981-09-25 Telmec Co Ltd Positioning system for printing device of semiconductor or the like

Also Published As

Publication number Publication date
EP0148477B1 (en) 1991-09-04
DE3485022D1 (de) 1991-10-10
US4668089A (en) 1987-05-26
KR900001269B1 (ko) 1990-03-05
EP0148477A3 (en) 1985-09-04
EP0148477A2 (en) 1985-07-17

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