JPS56162750A - Defect correcting method for photomask - Google Patents

Defect correcting method for photomask

Info

Publication number
JPS56162750A
JPS56162750A JP6663780A JP6663780A JPS56162750A JP S56162750 A JPS56162750 A JP S56162750A JP 6663780 A JP6663780 A JP 6663780A JP 6663780 A JP6663780 A JP 6663780A JP S56162750 A JPS56162750 A JP S56162750A
Authority
JP
Japan
Prior art keywords
defect part
light
glass substrate
nontransmittable
flaw
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6663780A
Other languages
Japanese (ja)
Inventor
Haruaki Kinoshita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6663780A priority Critical patent/JPS56162750A/en
Publication of JPS56162750A publication Critical patent/JPS56162750A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To make correction possible with ease by condensing the laser beam of short wavelength which a glass substrate absorbs to the less defect part of a light shielding patterns formed on the transparent glass substrate thereby giving a flaw which irregularly reflects ultraviolet rays and makes the defect part nontransmittable to said part. CONSTITUTION:A photomask 10 having the loss defect part 11 of a light shielding pattern 9 formed by vapor-depositing Cr or Cr2O3 on a transparent glass substrate 8 is placed on an XY table 6. laser light of <=300m wavelength which the glass material (soda lime glass) of the substrate 8 can absorb (light of 0.266mu of the 4th higher harmonic wave of Nd-YAG laser) from a light source 1 is passed through the 4th higher harmonic wave generator 2, then through a beam expander 3 and a variable slit 4, whereby a laser beam 5 is changed to shape conforming to the pinhole to be corrected, after which it is irradiated to a defect part 11. Thereby, a flaw which irregularly reflects ultraviolet rays during the use of the mask is given to the defect part 11, and it is made nontransmittable. In this way, the correction is accomplished without using laborious and long-time work as in the conventional art.
JP6663780A 1980-05-20 1980-05-20 Defect correcting method for photomask Pending JPS56162750A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6663780A JPS56162750A (en) 1980-05-20 1980-05-20 Defect correcting method for photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6663780A JPS56162750A (en) 1980-05-20 1980-05-20 Defect correcting method for photomask

Publications (1)

Publication Number Publication Date
JPS56162750A true JPS56162750A (en) 1981-12-14

Family

ID=13321604

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6663780A Pending JPS56162750A (en) 1980-05-20 1980-05-20 Defect correcting method for photomask

Country Status (1)

Country Link
JP (1) JPS56162750A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2547111A1 (en) * 1983-05-31 1984-12-07 American Telephone & Telegraph METHOD FOR CORRECTING LITHOGRAPHIC MASKS
FR2553205A1 (en) * 1983-10-07 1985-04-12 Thomson Csf Method for correcting defects of photolithographic masks and mask obtained by this method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2547111A1 (en) * 1983-05-31 1984-12-07 American Telephone & Telegraph METHOD FOR CORRECTING LITHOGRAPHIC MASKS
FR2553205A1 (en) * 1983-10-07 1985-04-12 Thomson Csf Method for correcting defects of photolithographic masks and mask obtained by this method

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