FR2551233B1 - Dispositif pour deposer en regime continu une couche de silicium polycristallin sur un ruban de carbone - Google Patents

Dispositif pour deposer en regime continu une couche de silicium polycristallin sur un ruban de carbone

Info

Publication number
FR2551233B1
FR2551233B1 FR8313834A FR8313834A FR2551233B1 FR 2551233 B1 FR2551233 B1 FR 2551233B1 FR 8313834 A FR8313834 A FR 8313834A FR 8313834 A FR8313834 A FR 8313834A FR 2551233 B1 FR2551233 B1 FR 2551233B1
Authority
FR
France
Prior art keywords
silicon layer
polycrystalline silicon
carbon tape
continuously depositing
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8313834A
Other languages
English (en)
Other versions
FR2551233A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel Lucent SAS
Original Assignee
Compagnie Generale dElectricite SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Compagnie Generale dElectricite SA filed Critical Compagnie Generale dElectricite SA
Priority to FR8313834A priority Critical patent/FR2551233B1/fr
Priority to FR8319212A priority patent/FR2556109B2/fr
Priority to CA000461389A priority patent/CA1224026A/fr
Priority to AT84110062T priority patent/ATE37449T1/de
Priority to EP84110062A priority patent/EP0141114B1/fr
Priority to DE8484110062T priority patent/DE3474222D1/de
Priority to JP59178202A priority patent/JPS60108311A/ja
Priority to AU32469/84A priority patent/AU564654B2/en
Priority to US06/644,910 priority patent/US4577588A/en
Publication of FR2551233A1 publication Critical patent/FR2551233A1/fr
Application granted granted Critical
Publication of FR2551233B1 publication Critical patent/FR2551233B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
    • H01L31/182—Special manufacturing methods for polycrystalline Si, e.g. Si ribbon, poly Si ingots, thin films of polycrystalline Si
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C3/00—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
    • B05C3/02—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material
    • B05C3/12—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material for treating work of indefinite length
    • B05C3/125—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material for treating work of indefinite length the work being a web, band, strip or the like
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/002—Continuous growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/007—Pulling on a substrate
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
    • C30B29/605—Products containing multiple oriented crystallites, e.g. columnar crystallites
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0368—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors
    • H01L31/03682—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors including only elements of Group IV of the Periodic System
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/546—Polycrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
FR8313834A 1983-08-29 1983-08-29 Dispositif pour deposer en regime continu une couche de silicium polycristallin sur un ruban de carbone Expired FR2551233B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR8313834A FR2551233B1 (fr) 1983-08-29 1983-08-29 Dispositif pour deposer en regime continu une couche de silicium polycristallin sur un ruban de carbone
FR8319212A FR2556109B2 (fr) 1983-08-29 1983-12-01 Dispositif pour deposer en regime continu une couche de silicium polycristallin sur un ruban de carbone
CA000461389A CA1224026A (fr) 1983-08-29 1984-08-20 Dispositif pour deposer en regime continu une couche de silicium polycristallin sur un ruban de carbone
EP84110062A EP0141114B1 (fr) 1983-08-29 1984-08-23 Dispositif pour déposer en régime continu une couche de silicium polycristallin sur un ruban de carbone
AT84110062T ATE37449T1 (de) 1983-08-29 1984-08-23 Vorrichtung zum kontinuierlichen niederschlagen einer schicht aus polykristallinem silizium auf einem kohlenstoffband.
DE8484110062T DE3474222D1 (en) 1983-08-29 1984-08-23 Apparatus for the continuous deposition of a polycrystalline silicon layer on a carbon ribbon
JP59178202A JPS60108311A (ja) 1983-08-29 1984-08-27 炭素リボン上に多結晶ケイ素層を連続的に堆積させるための装置
AU32469/84A AU564654B2 (en) 1983-08-29 1984-08-28 Coating
US06/644,910 US4577588A (en) 1983-08-29 1984-08-28 Device for process-type deposition of polycrystalline silicon on carbon film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8313834A FR2551233B1 (fr) 1983-08-29 1983-08-29 Dispositif pour deposer en regime continu une couche de silicium polycristallin sur un ruban de carbone

Publications (2)

Publication Number Publication Date
FR2551233A1 FR2551233A1 (fr) 1985-03-01
FR2551233B1 true FR2551233B1 (fr) 1985-10-25

Family

ID=9291853

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8313834A Expired FR2551233B1 (fr) 1983-08-29 1983-08-29 Dispositif pour deposer en regime continu une couche de silicium polycristallin sur un ruban de carbone

Country Status (2)

Country Link
JP (1) JPS60108311A (fr)
FR (1) FR2551233B1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0291310U (fr) * 1988-12-28 1990-07-19
NL1026043C2 (nl) * 2004-04-26 2005-10-27 Stichting Energie Werkwijze en inrichting voor het fabriceren van metalen folies.
FR3008329A1 (fr) * 2013-07-11 2015-01-16 Solarforce Dispositif pour la formation d'une couche de silicium sur un ruban de carbone

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3730962A (en) * 1971-08-24 1973-05-01 Airco Inc Electron beam furance with material-evaporant equilibrium control
US3738312A (en) * 1971-12-28 1973-06-12 Bethlehem Steel Corp Molten metal bath level maintenance system
US3998598A (en) * 1973-11-23 1976-12-21 Semimetals, Inc. Automatic diameter control for crystal growing facilities
GB1532424A (en) * 1975-09-15 1978-11-15 Pilkington Brothers Ltd Controlled method for the production of clad glass rod
JPS5429843A (en) * 1977-08-10 1979-03-06 Nippon Steel Corp Controlling method for composition and thickness of plated multicomponent alloy films
US4217165A (en) * 1978-04-28 1980-08-12 Ciszek Theodore F Method of growing a ribbon crystal particularly suited for facilitating automated control of ribbon width
US4242589A (en) * 1979-01-15 1980-12-30 Mobil Tyco Solar Energy Corporation Apparatus for monitoring crystal growth

Also Published As

Publication number Publication date
JPS6144803B2 (fr) 1986-10-04
FR2551233A1 (fr) 1985-03-01
JPS60108311A (ja) 1985-06-13

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