FR2535344A1 - Procede de depot selectif d'une couche de metal refractaire sur une piece en graphite - Google Patents
Procede de depot selectif d'une couche de metal refractaire sur une piece en graphite Download PDFInfo
- Publication number
- FR2535344A1 FR2535344A1 FR8218246A FR8218246A FR2535344A1 FR 2535344 A1 FR2535344 A1 FR 2535344A1 FR 8218246 A FR8218246 A FR 8218246A FR 8218246 A FR8218246 A FR 8218246A FR 2535344 A1 FR2535344 A1 FR 2535344A1
- Authority
- FR
- France
- Prior art keywords
- refractory metal
- layer
- deposition
- metal layer
- tungsten
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003870 refractory metal Substances 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims abstract description 25
- 230000008021 deposition Effects 0.000 title claims abstract description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 19
- 229910002804 graphite Inorganic materials 0.000 title abstract description 10
- 239000010439 graphite Substances 0.000 title abstract description 10
- 229910052721 tungsten Inorganic materials 0.000 claims description 26
- 239000010937 tungsten Substances 0.000 claims description 26
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 25
- 230000008030 elimination Effects 0.000 claims description 6
- 238000003379 elimination reaction Methods 0.000 claims description 6
- 238000003754 machining Methods 0.000 claims description 6
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 2
- 238000000926 separation method Methods 0.000 claims description 2
- 230000035939 shock Effects 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 21
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000001464 adherent effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003657 tungsten Chemical class 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
- C04B41/5133—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal with a composition mainly composed of one or more of the refractory metals
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/88—Metals
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Structural Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Electrochemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8218246A FR2535344A1 (fr) | 1982-10-29 | 1982-10-29 | Procede de depot selectif d'une couche de metal refractaire sur une piece en graphite |
| US06/540,557 US4571286A (en) | 1982-10-29 | 1983-10-11 | Process for selectively depositing a refractory metal layer on a graphite piece |
| DE19833338740 DE3338740A1 (de) | 1982-10-29 | 1983-10-25 | Verfahren zur selektiven abscheidung einer schicht eines hochschmelzenden metalls auf einem werkstueck aus graphit |
| AT0380983A AT381601B (de) | 1982-10-29 | 1983-10-27 | Verfahren zur selektiven abscheidung einer schicht von hochschmelzendem metall auf einem werkstueck aus graphit, insbesondere zur herstellung von anoden fuer roentgenroehren |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8218246A FR2535344A1 (fr) | 1982-10-29 | 1982-10-29 | Procede de depot selectif d'une couche de metal refractaire sur une piece en graphite |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2535344A1 true FR2535344A1 (fr) | 1984-05-04 |
| FR2535344B1 FR2535344B1 (enExample) | 1985-02-01 |
Family
ID=9278776
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8218246A Granted FR2535344A1 (fr) | 1982-10-29 | 1982-10-29 | Procede de depot selectif d'une couche de metal refractaire sur une piece en graphite |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4571286A (enExample) |
| AT (1) | AT381601B (enExample) |
| DE (1) | DE3338740A1 (enExample) |
| FR (1) | FR2535344A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2655191A1 (fr) * | 1989-11-28 | 1991-05-31 | Genral Electric Cgr Sa | Anode pour tube a rayons x. |
| FR2655192A1 (fr) * | 1989-11-28 | 1991-05-31 | Gen Electric Cgr | Anode pour tube a rayons x a corps de base composite. |
| US6710259B2 (en) | 1993-05-17 | 2004-03-23 | Electrochemicals, Inc. | Printed wiring boards and methods for making them |
| US5476580A (en) * | 1993-05-17 | 1995-12-19 | Electrochemicals Inc. | Processes for preparing a non-conductive substrate for electroplating |
| US5725807A (en) * | 1993-05-17 | 1998-03-10 | Electrochemicals Inc. | Carbon containing composition for electroplating |
| US6303181B1 (en) | 1993-05-17 | 2001-10-16 | Electrochemicals Inc. | Direct metallization process employing a cationic conditioner and a binder |
| US5690805A (en) * | 1993-05-17 | 1997-11-25 | Electrochemicals Inc. | Direct metallization process |
| US6171468B1 (en) | 1993-05-17 | 2001-01-09 | Electrochemicals Inc. | Direct metallization process |
| KR100324623B1 (ko) * | 2000-02-22 | 2002-02-27 | 박호군 | 다공성 금속박막이 피복된 탄소전극 및 그 제조방법, 이를이용한 리튬 이차전지 |
| US7194066B2 (en) * | 2004-04-08 | 2007-03-20 | General Electric Company | Apparatus and method for light weight high performance target |
| WO2012080958A2 (en) * | 2010-12-16 | 2012-06-21 | Koninklijke Philips Electronics N.V. | Anode disk element with refractory interlayer and vps focal track |
| JP2015180859A (ja) * | 2014-03-05 | 2015-10-15 | 株式会社東芝 | フォトンカウンティングct装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE743727C (de) * | 1942-04-09 | 1944-12-18 | Bosch Gmbh Robert | Verfahren zur Herstellung von Metallisierungsmustern durch Metallbedampfung im Vacuum |
| FR1341047A (fr) * | 1961-10-27 | 1963-10-25 | Ibm | Dépôt de circuits de film mince sans utilisation de masques |
| FR2093868A5 (enExample) * | 1970-05-28 | 1972-01-28 | Philips Nv | |
| FR2166625A5 (enExample) * | 1971-12-31 | 1973-08-17 | Thomson Csf | |
| FR2388401A1 (fr) * | 1977-04-18 | 1978-11-17 | Gen Electric | Disque perfectionne pour structure d'anode de tube a rayons x |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4424271A (en) * | 1982-09-15 | 1984-01-03 | Magnetic Peripherals Inc. | Deposition process |
-
1982
- 1982-10-29 FR FR8218246A patent/FR2535344A1/fr active Granted
-
1983
- 1983-10-11 US US06/540,557 patent/US4571286A/en not_active Expired - Fee Related
- 1983-10-25 DE DE19833338740 patent/DE3338740A1/de not_active Withdrawn
- 1983-10-27 AT AT0380983A patent/AT381601B/de not_active IP Right Cessation
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE743727C (de) * | 1942-04-09 | 1944-12-18 | Bosch Gmbh Robert | Verfahren zur Herstellung von Metallisierungsmustern durch Metallbedampfung im Vacuum |
| FR1341047A (fr) * | 1961-10-27 | 1963-10-25 | Ibm | Dépôt de circuits de film mince sans utilisation de masques |
| FR2093868A5 (enExample) * | 1970-05-28 | 1972-01-28 | Philips Nv | |
| FR2166625A5 (enExample) * | 1971-12-31 | 1973-08-17 | Thomson Csf | |
| FR2388401A1 (fr) * | 1977-04-18 | 1978-11-17 | Gen Electric | Disque perfectionne pour structure d'anode de tube a rayons x |
Non-Patent Citations (1)
| Title |
|---|
| IBM TECHNICAL DISCLOSURE BULLETIN, vol. 11, no. 11, avril 1969, NEW YORK (US) * |
Also Published As
| Publication number | Publication date |
|---|---|
| ATA380983A (de) | 1986-03-15 |
| FR2535344B1 (enExample) | 1985-02-01 |
| DE3338740A1 (de) | 1984-05-03 |
| AT381601B (de) | 1986-11-10 |
| US4571286A (en) | 1986-02-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse | ||
| CD | Change of name or company name |