FR2517330B1 - Appareil de projection de metal sur un substrat, en particulier du type a magnetron - Google Patents

Appareil de projection de metal sur un substrat, en particulier du type a magnetron

Info

Publication number
FR2517330B1
FR2517330B1 FR8219696A FR8219696A FR2517330B1 FR 2517330 B1 FR2517330 B1 FR 2517330B1 FR 8219696 A FR8219696 A FR 8219696A FR 8219696 A FR8219696 A FR 8219696A FR 2517330 B1 FR2517330 B1 FR 2517330B1
Authority
FR
France
Prior art keywords
substrate
metal onto
magnetron type
projecting metal
projecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8219696A
Other languages
English (en)
Other versions
FR2517330A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP19236081A external-priority patent/JPS5893872A/ja
Priority claimed from JP57102260A external-priority patent/JPS58221275A/ja
Application filed by Anelva Corp filed Critical Anelva Corp
Publication of FR2517330A1 publication Critical patent/FR2517330A1/fr
Application granted granted Critical
Publication of FR2517330B1 publication Critical patent/FR2517330B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3497—Temperature of target

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR8219696A 1981-11-30 1982-11-24 Appareil de projection de metal sur un substrat, en particulier du type a magnetron Expired FR2517330B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP19236081A JPS5893872A (ja) 1981-11-30 1981-11-30 スパツタリング装置
JP57102260A JPS58221275A (ja) 1982-06-16 1982-06-16 スパツタリング装置

Publications (2)

Publication Number Publication Date
FR2517330A1 FR2517330A1 (fr) 1983-06-03
FR2517330B1 true FR2517330B1 (fr) 1985-06-28

Family

ID=26442974

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8219696A Expired FR2517330B1 (fr) 1981-11-30 1982-11-24 Appareil de projection de metal sur un substrat, en particulier du type a magnetron

Country Status (3)

Country Link
DE (1) DE3244691C3 (fr)
FR (1) FR2517330B1 (fr)
GB (1) GB2110719B (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4515675A (en) * 1983-07-06 1985-05-07 Leybold-Heraeus Gmbh Magnetron cathode for cathodic evaportion apparatus
DE3442206A1 (de) * 1983-12-05 1985-07-11 Leybold-Heraeus GmbH, 5000 Köln Magnetronkatode zum zerstaeuben ferromagnetischer targets
DE3480145D1 (en) * 1983-12-05 1989-11-16 Leybold Ag Magnetron cathode for the sputtering of ferromagnetic targets
DE3429988A1 (de) * 1983-12-05 1985-06-13 Leybold-Heraeus GmbH, 5000 Köln Magnetronkatode zum zerstaeuben ferromagnetischer targets
CH664303A5 (de) * 1985-04-03 1988-02-29 Balzers Hochvakuum Haltevorrichtung fuer targets fuer kathodenzerstaeubung.
DE19535894A1 (de) * 1995-09-27 1997-04-03 Leybold Materials Gmbh Target für die Sputterkathode einer Vakuumbeschichtungsanlage und Verfahren zu seiner Herstellung
DE19648390A1 (de) * 1995-09-27 1998-05-28 Leybold Materials Gmbh Target für die Sputterkathode einer Vakuumbeschichtungsanlage
DE19735469A1 (de) * 1997-08-16 1999-02-18 Leybold Materials Gmbh Target für die Sputterkathode einer Vakuumbeschichtungsanlage und Verfahren zu seiner Herstellung
AU9410498A (en) * 1997-11-26 1999-06-17 Vapor Technologies, Inc. Apparatus for sputtering or arc evaporation
US6569294B1 (en) * 1999-07-15 2003-05-27 Seagate Technology Llc Sputtering target assembly and method for depositing a thickness gradient layer with narrow transition zone
DE10047440B4 (de) * 1999-09-21 2004-04-29 Sli Lichtsysteme Gmbh Trägermaterial

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4094761A (en) * 1977-07-25 1978-06-13 Motorola, Inc. Magnetion sputtering of ferromagnetic material
JPS5534689A (en) * 1978-09-04 1980-03-11 Anelva Corp Sputtering device
JPS5554570A (en) * 1978-10-16 1980-04-21 Anelva Corp Sputtering apparatus for magnetic thin film formation
JPS5580221A (en) * 1978-12-13 1980-06-17 Mitsubishi Electric Corp Key switch
GB2051877B (en) * 1979-04-09 1983-03-02 Vac Tec Syst Magnetically enhanced sputtering device and method
JPS5616671A (en) * 1979-07-17 1981-02-17 Fujitsu Ltd Sputtering apparatus
US4299678A (en) * 1979-07-23 1981-11-10 Spin Physics, Inc. Magnetic target plate for use in magnetron sputtering of magnetic films
JPS5952957B2 (ja) * 1980-06-16 1984-12-22 日電アネルバ株式会社 マグネトロン型スパッタ装置のカソ−ド部
JPH01293463A (ja) * 1988-05-20 1989-11-27 Sharp Corp 文字処理装置

Also Published As

Publication number Publication date
GB2110719A (en) 1983-06-22
DE3244691C2 (fr) 1991-05-29
FR2517330A1 (fr) 1983-06-03
DE3244691A1 (de) 1983-06-23
GB2110719B (en) 1985-10-30
DE3244691C3 (de) 1997-04-03

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Legal Events

Date Code Title Description
ST Notification of lapse