FR2510772B1 - - Google Patents

Info

Publication number
FR2510772B1
FR2510772B1 FR7930067A FR7930067A FR2510772B1 FR 2510772 B1 FR2510772 B1 FR 2510772B1 FR 7930067 A FR7930067 A FR 7930067A FR 7930067 A FR7930067 A FR 7930067A FR 2510772 B1 FR2510772 B1 FR 2510772B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7930067A
Other versions
FR2510772A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of FR2510772A1 publication Critical patent/FR2510772A1/fr
Application granted granted Critical
Publication of FR2510772B1 publication Critical patent/FR2510772B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
FR7930067A 1978-12-08 1979-12-07 Composition photosensible contenant un 2-trihalomethyl-5-aryl-1, 3, 4-oxadiazole Granted FR2510772A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15215078A JPS5577742A (en) 1978-12-08 1978-12-08 Photosensitive composition

Publications (2)

Publication Number Publication Date
FR2510772A1 FR2510772A1 (fr) 1983-02-04
FR2510772B1 true FR2510772B1 (fr) 1983-11-25

Family

ID=15534117

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7930067A Granted FR2510772A1 (fr) 1978-12-08 1979-12-07 Composition photosensible contenant un 2-trihalomethyl-5-aryl-1, 3, 4-oxadiazole

Country Status (5)

Country Link
US (1) US4279982A (fr)
JP (1) JPS5577742A (fr)
DE (1) DE2949396A1 (fr)
FR (1) FR2510772A1 (fr)
GB (1) GB2039073B (fr)

Families Citing this family (79)

* Cited by examiner, † Cited by third party
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US4350753A (en) * 1981-06-15 1982-09-21 Polychrome Corporation Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff
JPS58147735A (ja) * 1982-02-27 1983-09-02 Nippon Hoso Kyokai <Nhk> エネルギー線カラー記録体および記録方法
JPS58211141A (ja) * 1982-06-02 1983-12-08 Fuji Photo Film Co Ltd ネガ型感光性平版印刷版
JPS5978339A (ja) * 1982-10-28 1984-05-07 Fuji Photo Film Co Ltd 光重合性組成物
JPS59148784A (ja) * 1983-02-10 1984-08-25 Konishiroku Photo Ind Co Ltd ５―置換―２―ハロメチル―１，３，４―オキサジアゾール化合物及び該化合物を含有する光反応開始剤
DE3482215D1 (de) * 1983-07-01 1990-06-13 Fuji Photo Film Co Ltd Photopolymerisierbare zusammensetzung.
JPS6063532A (ja) * 1983-08-16 1985-04-11 Fuji Photo Film Co Ltd 光重合性組成物
JPS60177340A (ja) * 1984-02-24 1985-09-11 Fuji Photo Film Co Ltd 感光性組成物
JPH067263B2 (ja) * 1985-08-19 1994-01-26 富士写真フイルム株式会社 光可溶化組成物
JPS6261045A (ja) * 1985-09-11 1987-03-17 Fuji Photo Film Co Ltd 光重合性組成物
AU590671B2 (en) * 1986-02-28 1989-11-09 Minnesota Mining And Manufacturing Company One-part visible light-curable dentin and enamel adhesive
DE3613632A1 (de) * 1986-04-23 1987-10-29 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
DE3710282A1 (de) * 1987-03-28 1988-10-13 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3710281A1 (de) * 1987-03-28 1988-10-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3716848A1 (de) * 1987-05-20 1988-12-01 Hoechst Ag Verfahren zur bebilderung lichtempfindlichen materials
DE3725949A1 (de) * 1987-08-05 1989-02-16 Hoechst Ag Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von negativen reliefkopien
DE3743455A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JP2623309B2 (ja) * 1988-02-22 1997-06-25 ユーシービー ソシエテ アノニム レジストパターンを得る方法
JPH0820733B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 ドライフイルムレジスト用光重合性組成物
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DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3930086A1 (de) * 1989-09-09 1991-03-21 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
WO1991005290A1 (fr) * 1989-09-28 1991-04-18 Polychrome Corporation Composition de revetement photoconducteur durable ameliore
DE4006190A1 (de) * 1990-02-28 1991-08-29 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JPH0446344A (ja) * 1990-06-14 1992-02-17 Mitsubishi Kasei Corp ネガ型感光性組成物
EP0458325B1 (fr) * 1990-05-25 1998-08-19 Mitsubishi Chemical Corporation Composition photosensible négative et procédé pour réaliser une structure de réserve
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
CA2120838A1 (fr) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Substance a couleur en aplat variable a l'ultraviolet
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US5865471A (en) 1993-08-05 1999-02-02 Kimberly-Clark Worldwide, Inc. Photo-erasable data processing forms
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US5685754A (en) * 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
DE69506970T2 (de) * 1994-09-06 1999-06-10 Fuji Photo Film Co Ltd Lichtempfindliche Bis(halogenmethyloxadiazol)-Verbindung und lichtempfindliches Übertragungsblatt, das diese Verbindung verwendet
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
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US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5849411A (en) 1995-06-05 1998-12-15 Kimberly-Clark Worldwide, Inc. Polymer film, nonwoven web and fibers containing a photoreactor composition
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
AU6378696A (en) 1995-06-05 1996-12-24 Kimberly-Clark Worldwide, Inc. Novel pre-dyes
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
BR9609295A (pt) 1995-06-28 1999-05-18 Kimberly Clark Co Novas substâncias corantes e modificadores de substância corante
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
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WO2006077995A1 (fr) 2005-01-18 2006-07-27 Fujifilm Corporation Film transparent et son procédé de fabrication, plaque polarisée et dispositif d'affichage d'une image
JP5238292B2 (ja) 2007-03-23 2013-07-17 三菱製紙株式会社 水現像可能な感光性平版印刷版材料
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
CN105082725B (zh) 2009-09-24 2018-05-04 富士胶片株式会社 平版印刷版原版
WO2011122473A1 (fr) 2010-03-29 2011-10-06 三菱製紙株式会社 Composition photosensible et matériau de plaque d'impression lithographique photosensible
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

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NL291628A (fr) * 1962-04-17
US3418118A (en) * 1965-06-03 1968-12-24 Du Pont Photographic processes and products
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US4040922A (en) * 1975-10-06 1977-08-09 Eastman Kodak Company Photopolymerizable polymeric compositions containing halogen containing heterocyclic compound

Also Published As

Publication number Publication date
GB2039073A (en) 1980-07-30
US4279982A (en) 1981-07-21
JPS6151788B2 (fr) 1986-11-10
FR2510772A1 (fr) 1983-02-04
GB2039073B (en) 1983-07-27
DE2949396A1 (de) 1980-06-26
JPS5577742A (en) 1980-06-11

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Legal Events

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