FR2497603A1 - Transistor a faible temps de commutation, de type normalement bloquant - Google Patents
Transistor a faible temps de commutation, de type normalement bloquant Download PDFInfo
- Publication number
- FR2497603A1 FR2497603A1 FR8100096A FR8100096A FR2497603A1 FR 2497603 A1 FR2497603 A1 FR 2497603A1 FR 8100096 A FR8100096 A FR 8100096A FR 8100096 A FR8100096 A FR 8100096A FR 2497603 A1 FR2497603 A1 FR 2497603A1
- Authority
- FR
- France
- Prior art keywords
- layer
- field effect
- effect transistor
- gate
- transistor according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000000903 blocking effect Effects 0.000 title claims description 12
- 230000005669 field effect Effects 0.000 claims abstract description 27
- 239000004065 semiconductor Substances 0.000 claims abstract description 25
- 239000000203 mixture Substances 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims abstract description 5
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 238000001465 metallisation Methods 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims 2
- 239000000956 alloy Substances 0.000 claims 2
- 230000010287 polarization Effects 0.000 abstract description 10
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 23
- 238000009825 accumulation Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 108091006146 Channels Proteins 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000009413 insulation Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000005036 potential barrier Methods 0.000 description 2
- 230000005641 tunneling Effects 0.000 description 2
- 102000004129 N-Type Calcium Channels Human genes 0.000 description 1
- 108090000699 N-Type Calcium Channels Proteins 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000005465 channeling Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000009830 intercalation Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/473—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having confinement of carriers by multiple heterojunctions, e.g. quantum well HEMT
- H10D30/4732—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having confinement of carriers by multiple heterojunctions, e.g. quantum well HEMT using Group III-V semiconductor material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/475—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/475—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
- H10D30/4755—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs having wide bandgap charge-carrier supplying layers, e.g. modulation doped HEMTs such as n-AlGaAs/GaAs HEMTs
Landscapes
- Junction Field-Effect Transistors (AREA)
- Bipolar Transistors (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8100096A FR2497603A1 (fr) | 1981-01-06 | 1981-01-06 | Transistor a faible temps de commutation, de type normalement bloquant |
| EP81402096A EP0055968A3 (fr) | 1981-01-06 | 1981-12-31 | Transistor à effet de champ à faible temps de commutation du type normalement bloquant |
| JP57000555A JPS57136375A (en) | 1981-01-06 | 1982-01-05 | Normal off type field effect transistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8100096A FR2497603A1 (fr) | 1981-01-06 | 1981-01-06 | Transistor a faible temps de commutation, de type normalement bloquant |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2497603A1 true FR2497603A1 (fr) | 1982-07-09 |
| FR2497603B1 FR2497603B1 (enExample) | 1984-08-10 |
Family
ID=9253889
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8100096A Granted FR2497603A1 (fr) | 1981-01-06 | 1981-01-06 | Transistor a faible temps de commutation, de type normalement bloquant |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0055968A3 (enExample) |
| JP (1) | JPS57136375A (enExample) |
| FR (1) | FR2497603A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4583105A (en) * | 1982-12-30 | 1986-04-15 | International Business Machines Corporation | Double heterojunction FET with ohmic semiconductor gate and controllable low threshold voltage |
| JPS60136380A (ja) * | 1983-12-26 | 1985-07-19 | Hitachi Ltd | 半導体装置 |
| EP0162541A1 (en) * | 1984-03-28 | 1985-11-27 | International Standard Electric Corporation | Integrated heterojunction FET and photodiode |
| EP0160377A1 (en) * | 1984-03-28 | 1985-11-06 | International Standard Electric Corporation | Heterojunction photo-FET and method of making the same |
| JPS613465A (ja) * | 1984-06-18 | 1986-01-09 | Fujitsu Ltd | 半導体装置及びその製造方法 |
| JPS61161773A (ja) * | 1985-01-11 | 1986-07-22 | Matsushita Electric Ind Co Ltd | 電界効果トランジスタ |
| GB2172742B (en) * | 1985-03-21 | 1988-08-24 | Stc Plc | Photoconductor |
| JPS6254474A (ja) * | 1985-05-20 | 1987-03-10 | Sumitomo Electric Ind Ltd | 電界効果トランジスタ |
| JPH031547A (ja) * | 1989-05-29 | 1991-01-08 | Mitsubishi Electric Corp | 化合物半導体mis・fetおよびその製造方法 |
| ES2298877T3 (es) | 2000-09-12 | 2008-05-16 | Filligent Limited | Filtro para humo de tabaco. |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4160261A (en) * | 1978-01-13 | 1979-07-03 | Bell Telephone Laboratories, Incorporated | Mis heterojunction structures |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2465317A2 (fr) * | 1979-03-28 | 1981-03-20 | Thomson Csf | Transistor a effet de champ a frequence de coupure elevee |
| FR2469002A1 (fr) * | 1979-10-26 | 1981-05-08 | Thomson Csf | Dispositif semiconducteur a effet de champ pour hautes frequences et transistor et dispositif a transfert de charges utilisant un tel semiconducteur |
| CA1145482A (en) * | 1979-12-28 | 1983-04-26 | Takashi Mimura | High electron mobility single heterojunction semiconductor device |
| FR2489045A1 (fr) * | 1980-08-20 | 1982-02-26 | Thomson Csf | Transistor a effet de champ gaas a memoire non volatile |
-
1981
- 1981-01-06 FR FR8100096A patent/FR2497603A1/fr active Granted
- 1981-12-31 EP EP81402096A patent/EP0055968A3/fr not_active Withdrawn
-
1982
- 1982-01-05 JP JP57000555A patent/JPS57136375A/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4160261A (en) * | 1978-01-13 | 1979-07-03 | Bell Telephone Laboratories, Incorporated | Mis heterojunction structures |
Non-Patent Citations (3)
| Title |
|---|
| EXBK/77 * |
| EXBK/79 * |
| EXBK/80 * |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2497603B1 (enExample) | 1984-08-10 |
| EP0055968A2 (fr) | 1982-07-14 |
| EP0055968A3 (fr) | 1982-08-04 |
| JPS57136375A (en) | 1982-08-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |