FR2464495B1 - Filtre spatial directionnel a coupure haute pour appareil d'inspection de defauts - Google Patents

Filtre spatial directionnel a coupure haute pour appareil d'inspection de defauts

Info

Publication number
FR2464495B1
FR2464495B1 FR8018592A FR8018592A FR2464495B1 FR 2464495 B1 FR2464495 B1 FR 2464495B1 FR 8018592 A FR8018592 A FR 8018592A FR 8018592 A FR8018592 A FR 8018592A FR 2464495 B1 FR2464495 B1 FR 2464495B1
Authority
FR
France
Prior art keywords
inspection apparatus
defect inspection
spatial filter
directional spatial
cut
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8018592A
Other languages
English (en)
French (fr)
Other versions
FR2464495A1 (fr
Inventor
Yoshinobu Mitsuhashi
Shunsuke Mukasa
Junichi Shimada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Publication of FR2464495A1 publication Critical patent/FR2464495A1/fr
Application granted granted Critical
Publication of FR2464495B1 publication Critical patent/FR2464495B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/46—Systems using spatial filters

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Image Processing (AREA)
  • Optical Head (AREA)
FR8018592A 1979-08-28 1980-08-27 Filtre spatial directionnel a coupure haute pour appareil d'inspection de defauts Expired FR2464495B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10864779A JPS6027964B2 (ja) 1979-08-28 1979-08-28 方向性ハイカツト空間周波数フイルタ

Publications (2)

Publication Number Publication Date
FR2464495A1 FR2464495A1 (fr) 1981-03-06
FR2464495B1 true FR2464495B1 (fr) 1986-05-16

Family

ID=14490098

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8018592A Expired FR2464495B1 (fr) 1979-08-28 1980-08-27 Filtre spatial directionnel a coupure haute pour appareil d'inspection de defauts

Country Status (4)

Country Link
JP (1) JPS6027964B2 (enrdf_load_stackoverflow)
DE (1) DE3031816A1 (enrdf_load_stackoverflow)
FR (1) FR2464495B1 (enrdf_load_stackoverflow)
GB (1) GB2058395B (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58158921A (ja) * 1982-03-16 1983-09-21 Dainippon Printing Co Ltd 規則性パタ−ンの欠陥検査装置
JPS608823A (ja) * 1983-06-29 1985-01-17 Hamamatsu Photonics Kk 空間光変調装置
JPH0827443B2 (ja) * 1986-10-16 1996-03-21 オリンパス光学工業株式会社 シユリ−レン光学装置
JPH0682102B2 (ja) * 1987-02-27 1994-10-19 三菱電機株式会社 パターン欠陥検査装置及びパターン欠陥検査方法
FR2641928B1 (fr) * 1989-01-17 1996-09-13 Thomson Csf Dispositif de projection d'images
JPH0755741Y2 (ja) * 1991-01-25 1995-12-20 富士通テン株式会社 ディスク再生装置のフローティングロック機構

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3614232A (en) * 1968-11-25 1971-10-19 Ibm Pattern defect sensing using error free blocking spacial filter
US4000949A (en) * 1969-09-15 1977-01-04 Western Electric Company, Inc. Photomask inspection by optical spatial filtering
US3790280A (en) * 1972-05-03 1974-02-05 Western Electric Co Spatial filtering system utilizing compensating elements
JPS5324301B2 (enrdf_load_stackoverflow) * 1974-09-09 1978-07-20
JPS5276088A (en) * 1975-12-22 1977-06-25 Toshiba Corp System for inspecting defects of pattern having directivity

Also Published As

Publication number Publication date
JPS5633621A (en) 1981-04-04
FR2464495A1 (fr) 1981-03-06
GB2058395A (en) 1981-04-08
GB2058395B (en) 1983-04-27
DE3031816A1 (de) 1981-03-19
DE3031816C2 (enrdf_load_stackoverflow) 1990-06-28
JPS6027964B2 (ja) 1985-07-02

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