FR2455075A1 - Composition a base de solvants chlores pour l'elimination de resines photoresistantes - Google Patents
Composition a base de solvants chlores pour l'elimination de resines photoresistantesInfo
- Publication number
- FR2455075A1 FR2455075A1 FR7910290A FR7910290A FR2455075A1 FR 2455075 A1 FR2455075 A1 FR 2455075A1 FR 7910290 A FR7910290 A FR 7910290A FR 7910290 A FR7910290 A FR 7910290A FR 2455075 A1 FR2455075 A1 FR 2455075A1
- Authority
- FR
- France
- Prior art keywords
- acid
- compsn
- pref
- chlorobenzene
- ortho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011347 resin Substances 0.000 title abstract 4
- 229920005989 resin Polymers 0.000 title abstract 4
- 239000002253 acid Substances 0.000 title abstract 3
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 title 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 title 1
- 239000005977 Ethylene Substances 0.000 title 1
- 125000001309 chloro group Chemical group Cl* 0.000 title 1
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 abstract 2
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 abstract 1
- BGTFCAQCKWKTRL-YDEUACAXSA-N chembl1095986 Chemical compound C1[C@@H](N)[C@@H](O)[C@H](C)O[C@H]1O[C@@H]([C@H]1C(N[C@H](C2=CC(O)=CC(O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O)=C2C=2C(O)=CC=C(C=2)[C@@H](NC(=O)[C@@H]2NC(=O)[C@@H]3C=4C=C(C(=C(O)C=4)C)OC=4C(O)=CC=C(C=4)[C@@H](N)C(=O)N[C@@H](C(=O)N3)[C@H](O)C=3C=CC(O4)=CC=3)C(=O)N1)C(O)=O)=O)C(C=C1)=CC=C1OC1=C(O[C@@H]3[C@H]([C@H](O)[C@@H](O)[C@H](CO[C@@H]5[C@H]([C@@H](O)[C@H](O)[C@@H](C)O5)O)O3)O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O[C@@H]3[C@H]([C@H](O)[C@@H](CO)O3)O)C4=CC2=C1 BGTFCAQCKWKTRL-YDEUACAXSA-N 0.000 abstract 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 abstract 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N cinnamic acid Chemical class OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 abstract 1
- 229920001195 polyisoprene Polymers 0.000 abstract 1
- 230000001988 toxicity Effects 0.000 abstract 1
- 231100000419 toxicity Toxicity 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Detergent Compositions (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7910290A FR2455075A1 (fr) | 1979-04-24 | 1979-04-24 | Composition a base de solvants chlores pour l'elimination de resines photoresistantes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7910290A FR2455075A1 (fr) | 1979-04-24 | 1979-04-24 | Composition a base de solvants chlores pour l'elimination de resines photoresistantes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2455075A1 true FR2455075A1 (fr) | 1980-11-21 |
| FR2455075B1 FR2455075B1 (cg-RX-API-DMAC7.html) | 1983-02-18 |
Family
ID=9224637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7910290A Granted FR2455075A1 (fr) | 1979-04-24 | 1979-04-24 | Composition a base de solvants chlores pour l'elimination de resines photoresistantes |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2455075A1 (cg-RX-API-DMAC7.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5374500A (en) * | 1993-04-02 | 1994-12-20 | International Business Machines Corporation | Positive photoresist composition containing photoacid generator and use thereof |
| EP0939344A1 (en) * | 1998-02-27 | 1999-09-01 | Kanto Kagaku Kabushiki Kaisha | Photoresist stripping liquid composition |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1419726A (fr) * | 1963-10-04 | 1965-12-03 | Kalle Ag | Solutions détersives pour formes d'imprimerie planes |
| US3582401A (en) * | 1967-11-15 | 1971-06-01 | Mallinckrodt Chemical Works | Photosensitive resist remover compositions and methods |
| FR2072172A5 (cg-RX-API-DMAC7.html) * | 1969-12-23 | 1971-09-24 | Ibm | |
| US3871929A (en) * | 1974-01-30 | 1975-03-18 | Allied Chem | Polymeric etch resist strippers and method of using same |
| US4078102A (en) * | 1976-10-29 | 1978-03-07 | International Business Machines Corporation | Process for stripping resist layers from substrates |
| FR2366350A1 (fr) * | 1976-10-04 | 1978-04-28 | Allied Chem | Compositions organiques pour retirer des substances organiques polymeres a partir de substrats mineraux et procede d'utilisation de ces compositions |
| FR2370089A2 (fr) * | 1976-11-08 | 1978-06-02 | Allied Chem | Produits a base d'acides arylsulfoniques et de composes aryliques chlores ou alkylaryliques, pour l'enlevement de substances polymeres organiques |
-
1979
- 1979-04-24 FR FR7910290A patent/FR2455075A1/fr active Granted
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1419726A (fr) * | 1963-10-04 | 1965-12-03 | Kalle Ag | Solutions détersives pour formes d'imprimerie planes |
| US3582401A (en) * | 1967-11-15 | 1971-06-01 | Mallinckrodt Chemical Works | Photosensitive resist remover compositions and methods |
| FR2072172A5 (cg-RX-API-DMAC7.html) * | 1969-12-23 | 1971-09-24 | Ibm | |
| US3871929A (en) * | 1974-01-30 | 1975-03-18 | Allied Chem | Polymeric etch resist strippers and method of using same |
| FR2366350A1 (fr) * | 1976-10-04 | 1978-04-28 | Allied Chem | Compositions organiques pour retirer des substances organiques polymeres a partir de substrats mineraux et procede d'utilisation de ces compositions |
| US4078102A (en) * | 1976-10-29 | 1978-03-07 | International Business Machines Corporation | Process for stripping resist layers from substrates |
| FR2370089A2 (fr) * | 1976-11-08 | 1978-06-02 | Allied Chem | Produits a base d'acides arylsulfoniques et de composes aryliques chlores ou alkylaryliques, pour l'enlevement de substances polymeres organiques |
Non-Patent Citations (1)
| Title |
|---|
| EXBK/77 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5374500A (en) * | 1993-04-02 | 1994-12-20 | International Business Machines Corporation | Positive photoresist composition containing photoacid generator and use thereof |
| EP0939344A1 (en) * | 1998-02-27 | 1999-09-01 | Kanto Kagaku Kabushiki Kaisha | Photoresist stripping liquid composition |
| US6231677B1 (en) | 1998-02-27 | 2001-05-15 | Kanto Kagaku Kabushiki Kaisha | Photoresist stripping liquid composition |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2455075B1 (cg-RX-API-DMAC7.html) | 1983-02-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |