FR2072172A5 - - Google Patents
Info
- Publication number
- FR2072172A5 FR2072172A5 FR7040285A FR7040285A FR2072172A5 FR 2072172 A5 FR2072172 A5 FR 2072172A5 FR 7040285 A FR7040285 A FR 7040285A FR 7040285 A FR7040285 A FR 7040285A FR 2072172 A5 FR2072172 A5 FR 2072172A5
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US88772569A | 1969-12-23 | 1969-12-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2072172A5 true FR2072172A5 (cg-RX-API-DMAC7.html) | 1971-09-24 |
Family
ID=25391730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7040285A Expired FR2072172A5 (cg-RX-API-DMAC7.html) | 1969-12-23 | 1970-10-27 |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE2061942A1 (cg-RX-API-DMAC7.html) |
| FR (1) | FR2072172A5 (cg-RX-API-DMAC7.html) |
| GB (1) | GB1277862A (cg-RX-API-DMAC7.html) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2455076A1 (fr) * | 1979-04-24 | 1980-11-21 | Rhone Poulenc Ind | Composition pour l'elimination des resines photoresistantes |
| FR2455075A1 (fr) * | 1979-04-24 | 1980-11-21 | Rhone Poulenc Ind | Composition a base de solvants chlores pour l'elimination de resines photoresistantes |
| EP0065977A4 (en) * | 1980-12-08 | 1986-02-13 | Western Electric Co | REMOVE CURED ORGANIC MATERIALS DURING THE PRODUCTION OF INTEGRATED CIRCUITS. |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8712354D0 (en) * | 1987-05-26 | 1987-07-01 | Pyrene Chemical Services Ltd | Paint stripper composition |
-
1970
- 1970-10-27 FR FR7040285A patent/FR2072172A5/fr not_active Expired
- 1970-11-18 GB GB5475470A patent/GB1277862A/en not_active Expired
- 1970-12-16 DE DE19702061942 patent/DE2061942A1/de active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2455076A1 (fr) * | 1979-04-24 | 1980-11-21 | Rhone Poulenc Ind | Composition pour l'elimination des resines photoresistantes |
| FR2455075A1 (fr) * | 1979-04-24 | 1980-11-21 | Rhone Poulenc Ind | Composition a base de solvants chlores pour l'elimination de resines photoresistantes |
| EP0065977A4 (en) * | 1980-12-08 | 1986-02-13 | Western Electric Co | REMOVE CURED ORGANIC MATERIALS DURING THE PRODUCTION OF INTEGRATED CIRCUITS. |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1277862A (en) | 1972-06-14 |
| DE2061942A1 (de) | 1971-06-24 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |