FR2453392A1 - Optical surface thickness measuring technique - uses separation of point source and secondary image to determine thickness of semiconductor at primary image point - Google Patents
Optical surface thickness measuring technique - uses separation of point source and secondary image to determine thickness of semiconductor at primary image pointInfo
- Publication number
- FR2453392A1 FR2453392A1 FR7908373A FR7908373A FR2453392A1 FR 2453392 A1 FR2453392 A1 FR 2453392A1 FR 7908373 A FR7908373 A FR 7908373A FR 7908373 A FR7908373 A FR 7908373A FR 2453392 A1 FR2453392 A1 FR 2453392A1
- Authority
- FR
- France
- Prior art keywords
- point
- semiconductor
- image
- optical surface
- measuring technique
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The surface (E) to be studied is situated at right angles to the optical axis of an objective lens (1). A point light source (S0) situated on the axis forms an illuminated area which is a function of the distance (h) between a reference plane passing through a point (S1) and the surface (E). The surface is at least partially reflecting and returns through the objective a fraction of the radiation forming an image (S3) of the point (S2) on the test surface. The distance between the source and final image (S0-S3) is a function of the magnification of the objective (1) and the thickness (h) of the relief of the surface, measured relative to the reference plane (SO-S3=2RG squared).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7908373A FR2453392A1 (en) | 1979-04-03 | 1979-04-03 | Optical surface thickness measuring technique - uses separation of point source and secondary image to determine thickness of semiconductor at primary image point |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7908373A FR2453392A1 (en) | 1979-04-03 | 1979-04-03 | Optical surface thickness measuring technique - uses separation of point source and secondary image to determine thickness of semiconductor at primary image point |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2453392A1 true FR2453392A1 (en) | 1980-10-31 |
FR2453392B1 FR2453392B1 (en) | 1981-11-20 |
Family
ID=9223893
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7908373A Granted FR2453392A1 (en) | 1979-04-03 | 1979-04-03 | Optical surface thickness measuring technique - uses separation of point source and secondary image to determine thickness of semiconductor at primary image point |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2453392A1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4798469A (en) * | 1985-10-02 | 1989-01-17 | Burke Victor B | Noncontact gage system utilizing reflected light |
EP0342864A2 (en) * | 1988-05-20 | 1989-11-23 | Fujitsu Limited | Wiring pattern detection method and apparatus |
CN116952148B (en) * | 2023-09-18 | 2023-12-01 | 无锡华天燃气轮机有限公司 | Surface adhesion layer thickness measuring method and sample block |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2048750A5 (en) * | 1969-05-23 | 1971-03-19 | Morvue Inc | |
US4023033A (en) * | 1974-01-15 | 1977-05-10 | Thomson-Brandt | Optical focussing device |
-
1979
- 1979-04-03 FR FR7908373A patent/FR2453392A1/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2048750A5 (en) * | 1969-05-23 | 1971-03-19 | Morvue Inc | |
US3671726A (en) * | 1969-05-23 | 1972-06-20 | Morvue Inc | Electro-optical apparatus for precise on-line measurement of the thickness of moving strip material |
US3671726B1 (en) * | 1969-05-23 | 1984-02-21 | ||
US4023033A (en) * | 1974-01-15 | 1977-05-10 | Thomson-Brandt | Optical focussing device |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4798469A (en) * | 1985-10-02 | 1989-01-17 | Burke Victor B | Noncontact gage system utilizing reflected light |
EP0342864A2 (en) * | 1988-05-20 | 1989-11-23 | Fujitsu Limited | Wiring pattern detection method and apparatus |
EP0342864A3 (en) * | 1988-05-20 | 1989-12-27 | Fujitsu Limited | Wiring pattern detection method and apparatus |
US5011960A (en) * | 1988-05-20 | 1991-04-30 | Fujitsu Limited | Wiring pattern detection method and apparatus |
CN116952148B (en) * | 2023-09-18 | 2023-12-01 | 无锡华天燃气轮机有限公司 | Surface adhesion layer thickness measuring method and sample block |
Also Published As
Publication number | Publication date |
---|---|
FR2453392B1 (en) | 1981-11-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |