FR2421957A1 - DEVICE FOR THE APPLICATION USING IONS-PLASMA OF COATINGS ON ARTICLES - Google Patents
DEVICE FOR THE APPLICATION USING IONS-PLASMA OF COATINGS ON ARTICLESInfo
- Publication number
- FR2421957A1 FR2421957A1 FR7800955A FR7800955A FR2421957A1 FR 2421957 A1 FR2421957 A1 FR 2421957A1 FR 7800955 A FR7800955 A FR 7800955A FR 7800955 A FR7800955 A FR 7800955A FR 2421957 A1 FR2421957 A1 FR 2421957A1
- Authority
- FR
- France
- Prior art keywords
- slit
- shaped opening
- cathode
- discharge chamber
- incandescent cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
The device can be used for applying thin layers of metals, semiconductors and dielectrics to the surface of various products. The device contains a vacuum chamber (1) in which a discharge chamber (5) having at least one slit-shaped opening (6) in one of its walls is arranged. The plasma flow is generated by an electrical field between an anode (15) and an incandescent cathode (9) which are accommodated in the discharge chamber (5) in such a way that the incandescent cathode (9) is positioned opposite the slit-shaped opening (6) of the discharge chamber (5). The magnet system (21) generates a magnetic field which is directed across the incandescent cathode (9) and the slit-shaped opening (6) perpendicular to the electrical field between the anode (15) and the incandescent cathode (9). A target (19) and a holder (20) for the products to be coated are arranged at different sides of the plasma flow which emerges from the slit-shaped opening (6). In a device of this type the discharge zone is spatially separated from the sputtering zone. This extends the service life of the cathode.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH9478A CH633729A5 (en) | 1978-01-04 | 1978-01-04 | Device for coating products |
FR7800955A FR2421957A1 (en) | 1978-01-04 | 1978-01-13 | DEVICE FOR THE APPLICATION USING IONS-PLASMA OF COATINGS ON ARTICLES |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH9478A CH633729A5 (en) | 1978-01-04 | 1978-01-04 | Device for coating products |
FR7800955A FR2421957A1 (en) | 1978-01-04 | 1978-01-13 | DEVICE FOR THE APPLICATION USING IONS-PLASMA OF COATINGS ON ARTICLES |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2421957A1 true FR2421957A1 (en) | 1979-11-02 |
FR2421957B1 FR2421957B1 (en) | 1980-10-10 |
Family
ID=25683497
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7800955A Granted FR2421957A1 (en) | 1978-01-04 | 1978-01-13 | DEVICE FOR THE APPLICATION USING IONS-PLASMA OF COATINGS ON ARTICLES |
Country Status (2)
Country | Link |
---|---|
CH (1) | CH633729A5 (en) |
FR (1) | FR2421957A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3615361A1 (en) * | 1986-05-06 | 1987-11-12 | Santos Pereira Ribeiro Car Dos | DEVICE FOR THE SURFACE TREATMENT OF WORKPIECES |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1561068A (en) * | 1965-09-22 | 1969-03-28 | ||
DE1515316A1 (en) * | 1964-03-21 | 1969-08-14 | Telefunken Patent | Process carried out in a vacuum space to produce a pattern on an insulating support |
US3583899A (en) * | 1968-12-18 | 1971-06-08 | Norton Co | Sputtering apparatus |
FR2198000A1 (en) * | 1972-08-31 | 1974-03-29 | Cit Alcatel | |
FR2221536A1 (en) * | 1972-08-31 | 1974-10-11 | Cit Alcatel | Vacuum depositing thin layers - using appts. which improves homogeneity of deposited layers |
-
1978
- 1978-01-04 CH CH9478A patent/CH633729A5/en not_active IP Right Cessation
- 1978-01-13 FR FR7800955A patent/FR2421957A1/en active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1515316A1 (en) * | 1964-03-21 | 1969-08-14 | Telefunken Patent | Process carried out in a vacuum space to produce a pattern on an insulating support |
FR1561068A (en) * | 1965-09-22 | 1969-03-28 | ||
US3583899A (en) * | 1968-12-18 | 1971-06-08 | Norton Co | Sputtering apparatus |
FR2198000A1 (en) * | 1972-08-31 | 1974-03-29 | Cit Alcatel | |
FR2221536A1 (en) * | 1972-08-31 | 1974-10-11 | Cit Alcatel | Vacuum depositing thin layers - using appts. which improves homogeneity of deposited layers |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3615361A1 (en) * | 1986-05-06 | 1987-11-12 | Santos Pereira Ribeiro Car Dos | DEVICE FOR THE SURFACE TREATMENT OF WORKPIECES |
US4769101A (en) * | 1986-05-06 | 1988-09-06 | Dos Santos Pereiro Ribeiro C A | Apparatus for surface-treating workpieces |
Also Published As
Publication number | Publication date |
---|---|
FR2421957B1 (en) | 1980-10-10 |
CH633729A5 (en) | 1982-12-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |