FR2415823A1 - Composition photoreticulable contenant un polymere a groupe carbonyle, produit photosensible obtenu a partir de cette composition et procede de formation d'image qui utilise ce produit - Google Patents

Composition photoreticulable contenant un polymere a groupe carbonyle, produit photosensible obtenu a partir de cette composition et procede de formation d'image qui utilise ce produit

Info

Publication number
FR2415823A1
FR2415823A1 FR7901909A FR7901909A FR2415823A1 FR 2415823 A1 FR2415823 A1 FR 2415823A1 FR 7901909 A FR7901909 A FR 7901909A FR 7901909 A FR7901909 A FR 7901909A FR 2415823 A1 FR2415823 A1 FR 2415823A1
Authority
FR
France
Prior art keywords
polymer
composition
product
image formation
carbonyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7901909A
Other languages
English (en)
French (fr)
Other versions
FR2415823B1 (ja
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2415823A1 publication Critical patent/FR2415823A1/fr
Application granted granted Critical
Publication of FR2415823B1 publication Critical patent/FR2415823B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
FR7901909A 1978-01-27 1979-01-25 Composition photoreticulable contenant un polymere a groupe carbonyle, produit photosensible obtenu a partir de cette composition et procede de formation d'image qui utilise ce produit Granted FR2415823A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US87285278A 1978-01-27 1978-01-27
US91886578A 1978-06-26 1978-06-26

Publications (2)

Publication Number Publication Date
FR2415823A1 true FR2415823A1 (fr) 1979-08-24
FR2415823B1 FR2415823B1 (ja) 1981-04-10

Family

ID=27128264

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7901909A Granted FR2415823A1 (fr) 1978-01-27 1979-01-25 Composition photoreticulable contenant un polymere a groupe carbonyle, produit photosensible obtenu a partir de cette composition et procede de formation d'image qui utilise ce produit

Country Status (4)

Country Link
JP (1) JPS54113326A (ja)
DE (1) DE2902860A1 (ja)
FR (1) FR2415823A1 (ja)
GB (1) GB2013214B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2432008A1 (fr) * 1978-07-26 1980-02-22 Eastman Kodak Co Compose vinylique polymerisable, procede pour sa preparation et polymere obtenu a partir de ce compose

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02173752A (ja) * 1988-12-27 1990-07-05 Japan Synthetic Rubber Co Ltd 感放射線性組成物
KR100395904B1 (ko) * 1999-04-23 2003-08-27 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2052198A1 (de) * 1969-10-24 1971-05-06 Imperial Chemical Industries Ltd , London, Ilford Ltd , Ilford, Essex, (Großbritannien) Verfahren zur Bildaufzeichnung und lichtempfindliches Material hierfür
US4045221A (en) * 1975-09-08 1977-08-30 Eastman Kodak Company Process of amplifying image in image recording layer by releasing reactant from image forming layer containing cobalt(III)complex

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2052198A1 (de) * 1969-10-24 1971-05-06 Imperial Chemical Industries Ltd , London, Ilford Ltd , Ilford, Essex, (Großbritannien) Verfahren zur Bildaufzeichnung und lichtempfindliches Material hierfür
US4045221A (en) * 1975-09-08 1977-08-30 Eastman Kodak Company Process of amplifying image in image recording layer by releasing reactant from image forming layer containing cobalt(III)complex

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2432008A1 (fr) * 1978-07-26 1980-02-22 Eastman Kodak Co Compose vinylique polymerisable, procede pour sa preparation et polymere obtenu a partir de ce compose

Also Published As

Publication number Publication date
GB2013214B (en) 1982-08-18
JPS54113326A (en) 1979-09-04
DE2902860A1 (de) 1979-08-02
GB2013214A (en) 1979-08-08
FR2415823B1 (ja) 1981-04-10

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Legal Events

Date Code Title Description
ST Notification of lapse