FR2413934A1 - PROCESS FOR MAKING A GAS-TIGHT WELD BETWEEN VERY PURE SILICON MOLDED PARTS - Google Patents
PROCESS FOR MAKING A GAS-TIGHT WELD BETWEEN VERY PURE SILICON MOLDED PARTSInfo
- Publication number
- FR2413934A1 FR2413934A1 FR7900146A FR7900146A FR2413934A1 FR 2413934 A1 FR2413934 A1 FR 2413934A1 FR 7900146 A FR7900146 A FR 7900146A FR 7900146 A FR7900146 A FR 7900146A FR 2413934 A1 FR2413934 A1 FR 2413934A1
- Authority
- FR
- France
- Prior art keywords
- gas
- making
- pure silicon
- molded parts
- tight weld
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 3
- 229910052710 silicon Inorganic materials 0.000 title abstract 3
- 239000010703 silicon Substances 0.000 title abstract 3
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/08—Reaction chambers; Selection of materials therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/28—Selection of soldering or welding materials proper with the principal constituent melting at less than 950 degrees C
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/10—Reaction chambers; Selection of materials therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Silicon Compounds (AREA)
- Ceramic Products (AREA)
- Arc Welding In General (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
PROCEDE POUR REALISER UNE JONCTION ETANCHE AUX GAZ ENTRE DES PIECES MOULEES EN SILICIUM TRES PUR. CE PROCEDE EST CARACTERISE EN CE QU'ON INTRODUIT DU GERMANIUM ENTRE LES PIECES MOULEES DE SILICIUM A ASSEMBLER ET ON CHAUFFE LA JOINTURE A UNE TEMPERATURE COMPRISE ENTRE 937 ET 1400 C. APPLICATION A LA FABRICATION D'APPAREILS DE LABORATOIRE POUR DES OPERATIONS A EFFECTUER SUR DU SILICIUM TRES PUR, PAR EXEMPLE DANS LA TECHNIQUE DES SEMI-CONDUCTEURS.PROCESS FOR MAKING A GAS-TIGHT JUNCTION BETWEEN VERY PURE SILICON MOLDED PARTS. THIS PROCESS IS CHARACTERIZED IN THAT GERMANIUM IS INTRODUCED BETWEEN THE MOLDED SILICON PARTS TO BE ASSEMBLED AND THE JOINT IS HEATED TO A TEMPERATURE BETWEEN 937 AND 1400 C. APPLICATION TO THE MANUFACTURE OF LABORATORY EQUIPMENT FOR OPERATIONS TO BE PERFORMED ON VERY PURE SILICON, FOR EXAMPLE IN SEMICONDUCTOR TECHNOLOGY.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19782800507 DE2800507A1 (en) | 1978-01-05 | 1978-01-05 | PROCESS FOR GAS SEALING CONNECTING HIGHLY PURE SILICON MOLDED PARTS |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2413934A1 true FR2413934A1 (en) | 1979-08-03 |
Family
ID=6029060
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7900146A Withdrawn FR2413934A1 (en) | 1978-01-05 | 1979-01-04 | PROCESS FOR MAKING A GAS-TIGHT WELD BETWEEN VERY PURE SILICON MOLDED PARTS |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS5495182A (en) |
BE (1) | BE873323A (en) |
DE (1) | DE2800507A1 (en) |
DK (1) | DK4079A (en) |
FR (1) | FR2413934A1 (en) |
GB (1) | GB2014891B (en) |
IT (1) | IT1114308B (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2038160A1 (en) * | 1969-04-02 | 1971-01-08 | Siemens Ag |
-
1978
- 1978-01-05 DE DE19782800507 patent/DE2800507A1/en not_active Withdrawn
- 1978-12-19 JP JP15589378A patent/JPS5495182A/en active Granted
-
1979
- 1979-01-03 IT IT47518/79A patent/IT1114308B/en active
- 1979-01-04 FR FR7900146A patent/FR2413934A1/en not_active Withdrawn
- 1979-01-04 DK DK4079A patent/DK4079A/en not_active Application Discontinuation
- 1979-01-05 BE BE0/192773A patent/BE873323A/en unknown
- 1979-01-05 GB GB7900458A patent/GB2014891B/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2038160A1 (en) * | 1969-04-02 | 1971-01-08 | Siemens Ag |
Non-Patent Citations (1)
Title |
---|
EXBK/71 * |
Also Published As
Publication number | Publication date |
---|---|
JPS5495182A (en) | 1979-07-27 |
IT1114308B (en) | 1986-01-27 |
GB2014891B (en) | 1982-05-06 |
DE2800507A1 (en) | 1979-07-19 |
DK4079A (en) | 1979-07-06 |
GB2014891A (en) | 1979-09-05 |
BE873323A (en) | 1979-07-05 |
IT7947518A0 (en) | 1979-01-03 |
JPS6128427B2 (en) | 1986-06-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |