FR2404052A1 - Procede de controle d'un depot par pulverisation cathodique d'un film d'oxyde metallique, notamment d'oxyde d'indium - Google Patents

Procede de controle d'un depot par pulverisation cathodique d'un film d'oxyde metallique, notamment d'oxyde d'indium

Info

Publication number
FR2404052A1
FR2404052A1 FR7827045A FR7827045A FR2404052A1 FR 2404052 A1 FR2404052 A1 FR 2404052A1 FR 7827045 A FR7827045 A FR 7827045A FR 7827045 A FR7827045 A FR 7827045A FR 2404052 A1 FR2404052 A1 FR 2404052A1
Authority
FR
France
Prior art keywords
chamber
controlling
pressure
deposit
mmhg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7827045A
Other languages
English (en)
Other versions
FR2404052B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PPG Industries Inc
Original Assignee
PPG Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PPG Industries Inc filed Critical PPG Industries Inc
Publication of FR2404052A1 publication Critical patent/FR2404052A1/fr
Application granted granted Critical
Publication of FR2404052B1 publication Critical patent/FR2404052B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/211—SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/215—In2O3
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/229—Non-specific enumeration
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C03C2217/231—In2O3/SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C03C2217/244—Doped oxides with Sb
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

On contrôle le dépôt d'un film contenant un oxyde d'un métal ayant un numéro atomique compris enfin 48 et 51. On fait le vide dans une chambre de revêtement jusqu'à une pression inférieure à 10**-1 mmHg ; on maintient dans la chambre une atmosphère composée d'O2 et un gaz chimiquement neutre à une pression totale inférieure à 10**-1 mmHg; on chauffe un support de verre ou autre matériau réfractaire, à 200 degrés C au moins, dans la chambre mise en dépression; on applique une tension suffisante à une cathode espacée du support et se trouvant face à face avec celui-ci, cette cathode étant garnie du métal choisi; on contrôle le courant de décharge et la pression du gaz dans la chambre pendant l'opération de pulvérisation; on augmente le débit d'O2 et on diminue celui du gaz inerte dans la chambre en fonction des besoins pour maintenir un courant de décharge constant à une pression constante.
FR7827045A 1977-09-26 1978-09-21 Procede de controle d'un depot par pulverisation cathodique d'un film d'oxyde metallique, notamment d'oxyde d'indium Granted FR2404052A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/836,269 US4113599A (en) 1977-09-26 1977-09-26 Sputtering technique for the deposition of indium oxide

Publications (2)

Publication Number Publication Date
FR2404052A1 true FR2404052A1 (fr) 1979-04-20
FR2404052B1 FR2404052B1 (fr) 1981-10-02

Family

ID=25271591

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7827045A Granted FR2404052A1 (fr) 1977-09-26 1978-09-21 Procede de controle d'un depot par pulverisation cathodique d'un film d'oxyde metallique, notamment d'oxyde d'indium

Country Status (4)

Country Link
US (1) US4113599A (fr)
CA (1) CA1112601A (fr)
FR (1) FR2404052A1 (fr)
GB (1) GB2005309B (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2425480A1 (fr) * 1978-05-13 1979-12-07 Leybold Heraeus Gmbh & Co Kg Procede et dispositif de regulation de la decharge dans un equipement de pulverisation cathodique
FR2503190A1 (fr) * 1981-03-31 1982-10-08 Nippon Sheet Glass Co Ltd Procede et appareillage pour la formation d'une couche d'oxyde sur un support par une technique de pulverisation avec reaction

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4201649A (en) * 1978-11-29 1980-05-06 Ppg Industries, Inc. Low resistance indium oxide coatings
US4345000A (en) * 1979-12-15 1982-08-17 Nitto Electric Industrial Co., Ltd. Transparent electrically conductive film
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
US4336119A (en) * 1981-01-29 1982-06-22 Ppg Industries, Inc. Method of and apparatus for control of reactive sputtering deposition
US4379040A (en) * 1981-01-29 1983-04-05 Ppg Industries, Inc. Method of and apparatus for control of reactive sputtering deposition
US4421622A (en) * 1982-09-20 1983-12-20 Advanced Coating Technology, Inc. Method of making sputtered coatings
US4650557A (en) * 1982-11-03 1987-03-17 Donnelly Corporation Process for making a conductively coated glass member and the product thereof
US4622120A (en) * 1984-01-31 1986-11-11 Ppg Industries, Inc. Sputtered indium oxide films
US4948677A (en) * 1984-01-31 1990-08-14 Ppg Industries, Inc. High transmittance, low emissivity article and method of preparation
US4565616A (en) * 1984-04-30 1986-01-21 Ppg Industries, Inc. Method for producing a photoelectroforming mandrel
AU561315B2 (en) * 1984-10-29 1987-05-07 Ppg Industries Ohio, Inc. Sputtering films of metal alloy oxide
US4610771A (en) * 1984-10-29 1986-09-09 Ppg Industries, Inc. Sputtered films of metal alloy oxides and method of preparation thereof
US4716086A (en) * 1984-12-19 1987-12-29 Ppg Industries, Inc. Protective overcoat for low emissivity coated article
US4655811A (en) * 1985-12-23 1987-04-07 Donnelly Corporation Conductive coating treatment of glass sheet bending process
US4898790A (en) * 1986-12-29 1990-02-06 Ppg Industries, Inc. Low emissivity film for high temperature processing
US4806220A (en) * 1986-12-29 1989-02-21 Ppg Industries, Inc. Method of making low emissivity film for high temperature processing
US5270517A (en) * 1986-12-29 1993-12-14 Ppg Industries, Inc. Method for fabricating an electrically heatable coated transparency
US5028759A (en) * 1988-04-01 1991-07-02 Ppg Industries, Inc. Low emissivity film for a heated windshield
US5059295A (en) * 1986-12-29 1991-10-22 Ppg Industries, Inc. Method of making low emissivity window
US4806221A (en) * 1987-03-26 1989-02-21 Ppg Industries, Inc. Sputtered films of bismuth/tin oxide
US5178966A (en) * 1987-03-26 1993-01-12 Ppg Industries, Inc. Composite with sputtered films of bismuth/tin oxide
DE68909618T2 (de) * 1988-01-09 1994-05-05 Sumitomo Bakelite Co Verfahren zur Herstellung eines mit einer Dünnschicht aus Metalloxid überzogenen durchsichtigen leitenden Films.
DE3901046A1 (de) * 1988-01-22 1989-08-03 Ppg Industries Inc Verfahren und vorrichtung zum herstellen einer isolierten mehrscheibeneinheit
US4902580A (en) * 1988-04-01 1990-02-20 Ppg Industries, Inc. Neutral reflecting coated articles with sputtered multilayer films of metal oxides
US4834857A (en) * 1988-04-01 1989-05-30 Ppg Industries, Inc. Neutral sputtered films of metal alloy oxides
US5902505A (en) * 1988-04-04 1999-05-11 Ppg Industries, Inc. Heat load reduction windshield
US4898789A (en) * 1988-04-04 1990-02-06 Ppg Industries, Inc. Low emissivity film for automotive heat load reduction
US4962049A (en) * 1989-04-13 1990-10-09 Applied Materials, Inc. Process for the plasma treatment of the backside of a semiconductor wafer
US5213650A (en) * 1989-08-25 1993-05-25 Applied Materials, Inc. Apparatus for removing deposits from backside and end edge of semiconductor wafer while preventing removal of materials from front surface of wafer
US5075256A (en) * 1989-08-25 1991-12-24 Applied Materials, Inc. Process for removing deposits from backside and end edge of semiconductor wafer while preventing removal of materials from front surface of wafer
EP0429905B1 (fr) * 1989-11-30 1995-06-14 Siemens Aktiengesellschaft Procédé pour réduire la réflectivité de couches pulvérisées
ATE171732T1 (de) * 1992-07-02 1998-10-15 Balzers Hochvakuum Verfahren zur herstellung einer metalloxidschicht, vakuumbehandlungsanlage hierfür sowie mit mindestens einer metalloxidschicht beschichteter teil
US5840429A (en) * 1996-11-05 1998-11-24 Ppg Industries, Inc. Aircraft transparency
US5994452A (en) * 1996-11-05 1999-11-30 Ppg Industries Ohio, Inc. Primer for promoting adhesion of electroconductive metal oxide coating to plastic substrates
US5776548A (en) * 1996-11-05 1998-07-07 Ppg Industries, Inc. Primer for promoting adhesion of polyurethane to a metal oxide coating
JP2004200146A (ja) * 2002-12-05 2004-07-15 Seiko Epson Corp エレクトロルミネッセンス表示装置及びその製造方法並びに電子機器
US7169431B2 (en) * 2003-04-29 2007-01-30 Stuart Lasdon Low fat peanut butter-like product made with tapioca syrup
EP1548157A1 (fr) * 2003-12-22 2005-06-29 Henkel KGaA Protection contre la corrosion par des couches d'oxide de métal électrochimiquement déposées sur des substrats métalliques

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB732891A (en) * 1949-03-25 1955-06-29 Megatron Ltd Improvements in and relating to the production of thin layers of chemical compounds on surfaces
FR2099098A5 (fr) * 1970-05-20 1972-03-10 Triplex Safety Glass Co
FR2099718A1 (fr) * 1970-07-31 1972-03-17 Ppg Industries Inc
FR2125075A5 (fr) * 1971-02-05 1972-09-22 Triplex Safety Glass Co
US4043889A (en) * 1976-01-02 1977-08-23 Sperry Rand Corporation Method of and apparatus for the radio frequency sputtering of a thin film

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3907660A (en) * 1970-07-31 1975-09-23 Ppg Industries Inc Apparatus for coating glass

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB732891A (en) * 1949-03-25 1955-06-29 Megatron Ltd Improvements in and relating to the production of thin layers of chemical compounds on surfaces
FR2099098A5 (fr) * 1970-05-20 1972-03-10 Triplex Safety Glass Co
FR2099718A1 (fr) * 1970-07-31 1972-03-17 Ppg Industries Inc
FR2125075A5 (fr) * 1971-02-05 1972-09-22 Triplex Safety Glass Co
US4043889A (en) * 1976-01-02 1977-08-23 Sperry Rand Corporation Method of and apparatus for the radio frequency sputtering of a thin film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2425480A1 (fr) * 1978-05-13 1979-12-07 Leybold Heraeus Gmbh & Co Kg Procede et dispositif de regulation de la decharge dans un equipement de pulverisation cathodique
FR2503190A1 (fr) * 1981-03-31 1982-10-08 Nippon Sheet Glass Co Ltd Procede et appareillage pour la formation d'une couche d'oxyde sur un support par une technique de pulverisation avec reaction

Also Published As

Publication number Publication date
GB2005309B (en) 1982-03-17
US4113599A (en) 1978-09-12
CA1112601A (fr) 1981-11-17
GB2005309A (en) 1979-04-19
FR2404052B1 (fr) 1981-10-02

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