FR2396411B2 - - Google Patents

Info

Publication number
FR2396411B2
FR2396411B2 FR7818541A FR7818541A FR2396411B2 FR 2396411 B2 FR2396411 B2 FR 2396411B2 FR 7818541 A FR7818541 A FR 7818541A FR 7818541 A FR7818541 A FR 7818541A FR 2396411 B2 FR2396411 B2 FR 2396411B2
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7818541A
Other languages
French (fr)
Other versions
FR2396411A2 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of FR2396411A2 publication Critical patent/FR2396411A2/fr
Application granted granted Critical
Publication of FR2396411B2 publication Critical patent/FR2396411B2/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/01Manufacture or treatment
    • H10D10/051Manufacture or treatment of vertical BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/177Base regions of bipolar transistors, e.g. BJTs or IGBTs
    • H10W10/0126
    • H10W10/13
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/965Shaped junction formation
FR7818541A 1977-06-27 1978-06-21 Expired FR2396411B2 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772728845 DE2728845A1 (de) 1977-06-27 1977-06-27 Verfahren zum herstellen eines hochfrequenztransistors

Publications (2)

Publication Number Publication Date
FR2396411A2 FR2396411A2 (enExample) 1979-01-26
FR2396411B2 true FR2396411B2 (enExample) 1983-08-05

Family

ID=6012432

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7818541A Expired FR2396411B2 (enExample) 1977-06-27 1978-06-21

Country Status (6)

Country Link
US (1) US4175983A (enExample)
JP (1) JPS5411683A (enExample)
DE (1) DE2728845A1 (enExample)
FR (1) FR2396411B2 (enExample)
GB (1) GB1577405A (enExample)
IT (1) IT1108801B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5577172A (en) * 1978-12-06 1980-06-10 Oki Electric Ind Co Ltd Semiconductor device
US4269636A (en) * 1978-12-29 1981-05-26 Harris Corporation Method of fabricating self-aligned bipolar transistor process and device utilizing etching and self-aligned masking
JPS5852339B2 (ja) * 1979-03-20 1983-11-22 富士通株式会社 半導体装置の製造方法
US4261761A (en) * 1979-09-04 1981-04-14 Tektronix, Inc. Method of manufacturing sub-micron channel width MOS transistor
US4261763A (en) * 1979-10-01 1981-04-14 Burroughs Corporation Fabrication of integrated circuits employing only ion implantation for all dopant layers
JPS57149770A (en) * 1981-03-11 1982-09-16 Mitsubishi Electric Corp Manufacture of semiconductor device
DE3175429D1 (en) * 1981-11-28 1986-11-06 Itt Ind Gmbh Deutsche Process for producing a monolithic integrated circuit having at least one pair of complementary field-effect transistors and at least one bipolar transistor
US4961102A (en) * 1982-01-04 1990-10-02 Shideler Jay A Junction programmable vertical transistor with high performance transistor
US4624046A (en) * 1982-01-04 1986-11-25 Fairchild Camera & Instrument Corp. Oxide isolation process for standard RAM/PROM and lateral PNP cell RAM
JPS5941877A (ja) * 1982-08-31 1984-03-08 Junichi Nishizawa フオトトランジスタ
SE461428B (sv) * 1988-06-16 1990-02-12 Ericsson Telefon Ab L M Foerfarande foer att paa ett underlag av halvledarmaterial framstaella en bipolaer transistor eller en bipolaer transistor och en faelteffekttransistor eller en bipolaer transistor och en faelteffekttransistor med en komplementaer faelteffekttransistor och anordningar framstaellda enligt foerfarandena
JP2748420B2 (ja) * 1988-08-12 1998-05-06 ソニー株式会社 バイポーラトランジスタ及びその製造方法
DE69323614T2 (de) * 1992-11-12 1999-06-17 National Semiconductor Corp., Santa Clara, Calif. Schmale Basis-Effekte vermeidendes Verfahren für einen Transistor

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1457139A (en) * 1973-09-27 1976-12-01 Hitachi Ltd Method of manufacturing semiconductor device
JPS5214594B2 (enExample) * 1973-10-17 1977-04-22
NL180466C (nl) * 1974-03-15 1987-02-16 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting met een halfgeleiderlichaam voorzien van een in het halfgeleiderlichaam verzonken patroon van isolerend materiaal.
US3904450A (en) * 1974-04-26 1975-09-09 Bell Telephone Labor Inc Method of fabricating injection logic integrated circuits using oxide isolation
JPS50153873A (enExample) * 1974-05-30 1975-12-11
US4066473A (en) * 1976-07-15 1978-01-03 Fairchild Camera And Instrument Corporation Method of fabricating high-gain transistors

Also Published As

Publication number Publication date
DE2728845C2 (enExample) 1987-07-16
GB1577405A (en) 1980-10-22
DE2728845A1 (de) 1979-01-18
IT7824720A0 (it) 1978-06-20
US4175983A (en) 1979-11-27
IT1108801B (it) 1985-12-09
FR2396411A2 (enExample) 1979-01-26
JPS5411683A (en) 1979-01-27

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